Abstract: A material deposition unit includes a radiation unit designed to emit electromagnetic radiation in a directed manner onto a workpiece along a beam axis, and a powder discharge device that has multiple powder discharge units configured to discharge powder in a directed form onto the workpiece through powder-outlet openings. The material deposition unit further includes a powder division unit having multiple powder channels. A number of powder channels corresponds to a number of powder discharge units. The powder division unit is designed to distribute a central powder stream guided to a feed channel uniformly over the powder channels. Each respective powder channel is connected to a respective powder discharge unit by an exchangeable connecting element. At least one powder discharge unit has an exchangeable powder discharge element, which is elongate, has a first end and a second end, and is arranged at least partially within the corresponding powder discharge unit.

Abstract: A laser processing machine is provided which has a machine frame and a laser generator fastened to the machine frame. The laser generator is movable relative to the machine frame.

Abstract: A laser processing machine having a laser processing head that is open to a workpiece has a device for providing gas to the laser beam guide that introduces a first gas through a first gas inlet into the laser beam guide and introduces a second gas through a second gas inlet into the laser beam guide.

Abstract: ABSTRACT A laser processing machine having a laser processing head that is open to a workpiece has a device for providing gas to the laser beam guide that introduces a first gas through a first gas inlet into the laser beam guide and introduces a second gas through a second gas inlet into the laser beam guide.

Abstract: A laser processing machine is provided which has a machine frame and a laser generator fastened to the machine frame. The laser generator is movable relative to the machine frame.

Abstract: A laser processing head collision protection apparatus includes a carrier member, and a laser processing head detachably coupled to the carrier member by a plurality of pairs of truncated cones.

Abstract: A laser processing head collision protection apparatus includes a carrier member, and a laser processing head detachably coupled to the carrier member by a plurality of pairs of truncated cones.

Abstract: The hot, vinyl chloride-containing gases leaving the cracking furnace heat liquid 1,2-dichloroethane in a first container to the boiling point or to its immediate vicinity, and the 1,2-dichloroethane is transferred into a second container in which it is partly evaporated under a lower pressure than in the first container. The evaporated 1,2-dichloroethane is fed into the cracking furnace, and the nonevaporated 1,2-dichloroethane is fed back into the first container. By supplying fresh, optionally prewarmed 1,2-dichloroethane into the second container, the amount of product evaporated therein is replaced, the prewarming advantageously being regulated through the level of the liquid 1,2-dichloroethane in the second container. The prewarming of the 1,2-dichloroethane can take place in the convection zone of the cracking furnace or by means of a temperature-control medium, for example steam, which has been heated in the convection zone of the cracking furnace.

Abstract: The inventive combination provides for a profitable and efficient utilization of low-pressure waste heat in conjunction with medium-pressure steam. The combination of mechanical and thermodynamic compression for the generation of superheated low-pressure steam is a method that has better results regarding energy and cost than any other known configuration.

Abstract: The description covers a process for the manufacture of vinyl chloride by thermal cracking of 1,2-dichloroethane. The hot gas leaving the reaction furnace is cooled to the inlet temperature of the column in which the hydrogen chloride is separated from the products of thermal cracking of the 1,2-dichloroethane. Within the range of 560.degree. to 480.degree. C. and of 220.degree. to 120.degree. C., one or more cooling stages are applied through which the reaction gas mixture passes at high flow velocity, the cooling device being preferably a single-tube cooler. Starting from about 220.degree. C., a liquid substantially consisting of 1,2-dichloroethane may be added intermittently. The heat transferred to the coolant in the stages of indirect cooling is preferably reused within the vinyl chloride manufacturing process.