Patents by Inventor Gerhard Luhn

Gerhard Luhn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • REAL-TIME INFORMATION SYSTEMS AND METHODOLOGY BASED ON CONTINUOUS HOMOMORPHIC PROCESSING IN LINEAR INFORMATION SPACES
    Publication number: 20170032016
    Abstract: The present invention relates to the field of information system technology. More particularly, the present invention relates to methods and systems for Real-Time information processing, including Real-Time Data Warehousing, using Real-Time in-formation aggregation (including calculation of the performance indicators and the like) based on continuous homomorphic processing, thus preserving the linearity of the underlying structures. The present invention further relates to a computer program product adapted to perform the method of the invention, to a computer-readable storage medium comprising said computer program product and a data processing system, which enables Real-Time information processing according to the methods of the invention.
    Type: Application
    Filed: June 13, 2014
    Publication date: February 2, 2017
    Inventors: Martin Zinner, Gerhard Luhn, Michael Ertelt, Manfred Austen
  • INFORMATION STORAGE AND RETRIEVAL SYSTEM
    Publication number: 20100057685
    Abstract: An information storage and retrieval system includes a first data structure and a second data structure. The first data structure is configured to store documents. Each document includes a plurality of data portions. The second data structure is configured to store addresses to each document and data portion stored in the first data structure at addresses defined by an identity of each data portion.
    Type: Application
    Filed: September 2, 2008
    Publication date: March 4, 2010
    Applicant: Qimonda AG
    Inventors: Gerhard Luhn, Johann Harter, Franz Kreupl
  • Control system and methods for photolithographic processes
    Patent number: 6645683
    Abstract: In the control method for photolithographic processes, line width errors and/or positional errors measured on processed semiconductor wafers are used to calculate correction values for the exposure intensity and/or the xy positioning of the semiconductor wafer. Optimized correction values for a subsequent batch of semiconductor wafers to be processed are calculated by averaging correction values over a number of previously calculated correction values. Only those correction values which lie within a predetermined value range are used in the average.
    Type: Grant
    Filed: July 31, 2001
    Date of Patent: November 11, 2003
    Assignee: Infineon Technologies AG
    Inventors: Gerhard Luhn, Daniel Sarlette
  • Control system for photolithographic processes
    Publication number: 20020012861
    Abstract: In the control method for photolithographic processes, line width errors and/or positional errors measured on processed semiconductor wafers are used to calculate correction values for the exposure intensity and/or the xy positioning of the semiconductor wafer. Optimized correction values for a subsequent batch of semiconductor wafers to be processed are calculated by averaging correction values over a number of previously calculated correction values. Only those correction values which lie within a predetermined value range are used in the average.
    Type: Application
    Filed: July 31, 2001
    Publication date: January 31, 2002
    Inventors: Gerhard Luhn, Daniel Sarlette