Patents by Inventor Gerhard Niederhofer

Gerhard Niederhofer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for treatment of semiconductor substrates
    Publication number: 20010000160
    Abstract: A gas pipe system for a process reactor is described, which may be, for example, a vertical oven for depositing an As-doped SiO2 layer onto wafers. The gas pipe system has a TEAS bubbler which is connected on the input side to a carrier gas source and, on the output side, is connected via at least one heated pipe to the process reactor. Furthermore, a TEOS evaporator is provided, which is connected on the input side to a gas source and, on the output side, is connected via at least one heated pipe to the process reactor. Furthermore, a vertical oven and a method for deposition of an As-doped SiO2 layer onto wafers are described, with the gas pipe system being used in each case.
    Type: Application
    Filed: December 5, 2000
    Publication date: April 5, 2001
    Applicant: Infineon Technologies AG
    Inventors: Josef Schwaiger, Gerhard Niederhofer, Gerhard Ott, Michael Melzl