Abstract: Apparatus in a vacuum deposition system positions a workpiece holder in substantial alignment with a source of material to be deposited onto a work piece affixed to the workpiece holder. The apparatus also rotates the workpiece holder about the deposition source and linearly drives the workpiece holder to varying distances from the deposition source. The apparatus used to drive the workpiece holder is sealably mounted atop an opening in the vacuum chamber. The apparatus enables multiple source depositions to be carried out consecutively without accessing the vacuum chamber. By aligning the workpiece holder over the deposition source, nonuniform deposition onto the workpiece is substantially eliminated.

Abstract: Briefly, the apparatus in accordance with this invention features an energy coaxial feedthrough fix-mounted in the wall of the vacuum chamber for supplying electrical and mechanical energy from sources located externally of the vacuum chamber to within the vacuum chamber. Additionally, the apparatus includes a movable coaxial coupler capable of releasably engaging the coaxial feedthrough and additionally releasably latching a substrate holder. Finally, the apparatus includes a linkage assembly located within the chamber connected to the coupler so that the coupler may be located in a first position proximate an access port in the chamber wall to facilitate quick and convenient loading of a substrate holder and a second position in which the coupler may be connected to the feedthrough for uniformly transmitting electrical and mechanical energy to the substrate holder and the substrates thereon.

Abstract: A vapor deposition method of coating substrates with a material involves evaporating the end of a wire or rod made of that same material. The end of the wire is inductively or radiantly heated to form a molten convex miniscus thereon which serves as the coating source for the substrates.