Patents by Inventor Gerhard Polhers

Gerhard Polhers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymer composition and photoresist comprising the polymer
    Patent number: 8603728
    Abstract: A copolymer comprises the polymerized product of a base-soluble monomer of formula (I): wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising ?-diketone, ?-ester-ketone, ?-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).
    Type: Grant
    Filed: May 29, 2012
    Date of Patent: December 10, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Gregory P. Prokopowicz, Gerhard Polhers, Mingqi Li, Chunyi Wu, Cong Liu, Cheng-bai Xu