Patents by Inventor Gerhard Schlueter

Gerhard Schlueter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Test mask for optical and electron optical systems
    Patent number: 7416819
    Abstract: A test mask 1 for microscopy is disclosed, which is formed on a substrate of quartz. The test mask 1 comprises a multiplicity of sub-masks 4, which are implemented such that each sub-mask 4 comprises structures which differ within a sub-mask 4 with regard to form and size. In addition, the structures of the individual sub-masks 4 are designed for optical or particle optical measurements according to size.
    Type: Grant
    Filed: June 15, 2006
    Date of Patent: August 26, 2008
    Assignee: Vistec Semiconductor Systems GmbH
    Inventors: Walter Steinberg, Gerhard Schlueter, Michael Ferber
  • Test mask for optical and electron optical systems.
    Publication number: 20070031739
    Abstract: A test mask 1 for microscopy is disclosed, which is formed on a substrate of quartz. The test mask 1 comprises a multiplicity of sub-masks 4, which are implemented such that each sub-mask 4 comprises structures which differ within a sub-mask 4 with regard to form and size. In addition, the structures of the individual sub-masks 4 are designed for optical or particle optical measurements according to size.
    Type: Application
    Filed: June 15, 2006
    Publication date: February 8, 2007
    Applicant: Vistec Semiconductor Systems GmbH
    Inventors: Walter Steinberg, Gerhard Schlueter, Michael Ferber