Patents by Inventor German E. Rylov
German E. Rylov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8126027Abstract: An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the apparatus may be used as a line narrowing module for a laser light source.Type: GrantFiled: April 14, 2011Date of Patent: February 28, 2012Assignee: Cymer, Inc.Inventors: J. Martin Algots, Robert A. Bergstedt, William N. Partlo, German E. Rylov, Richard L. Sandstrom
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Publication number: 20110194580Abstract: An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the apparatus may be used as a line narrowing module for a laser light source.Type: ApplicationFiled: April 14, 2011Publication date: August 11, 2011Applicant: CYMER, INC.Inventors: J. Martin Algots, Robert A. Bergstedt, William N. Partlo, German E. Rylov, Richard L. Sandstrom
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Publication number: 20100097704Abstract: An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the apparatus may be used as a line narrowing module for a laser light source.Type: ApplicationFiled: December 14, 2009Publication date: April 22, 2010Applicant: Cymer, Inc.Inventors: J. Martin Algots, Robert A. Bergstedt, Walter D. Gillespie, Vladimir A. Kulgeyko, William N. Partlo, German E. Rylov, Richard L. Sandstrom, Brian Strate, Timothy S. Dyer
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Patent number: 7653095Abstract: In a first aspect, a lithography apparatus may comprise a mask designed using optical proximity correction (OPC), a pulsed laser source, and an active bandwidth control system configured to increase the bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is below a predetermined bandwidth range and increase a bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is above the predetermined bandwidth range. In another aspect an active bandwidth control system may include an optic for altering a wavefront of a laser beam in a laser cavity of the laser source to selectively adjust an output laser bandwidth in response to the control signal. In yet another aspect, the bandwidth of a laser having a wavelength variation across an aperture may be actively controlled by an aperture blocking element that is moveable to adjust a size of the aperture.Type: GrantFiled: June 30, 2005Date of Patent: January 26, 2010Assignee: Cymer, Inc.Inventors: Daniel J. Reiley, German E. Rylov, Robert A. Bergstedt
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Publication number: 20080151944Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic.Type: ApplicationFiled: February 28, 2008Publication date: June 26, 2008Applicant: Cymer, Inc.Inventors: J. Martin Algots, Robert A. Bergstedt, Walter D. Gillespie, Vladimir A. Kulgeyko, William N. Partlo, German E. Rylov, Richard L. Sandstrom, Brian Strate, Timothy S. Dyer
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Patent number: 7366219Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light puType: GrantFiled: November 30, 2004Date of Patent: April 29, 2008Assignee: Cymer, Inc.Inventors: J. Martin Algots, Robert A. Bergstedt, Walter D. Gillespie, Vladimir A. Kulgeyko, William N. Partlo, German E. Rylov, Richard L. Sandstrom, Brian Strate, Timothy S. Dyer
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Patent number: 7218661Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses.Type: GrantFiled: May 25, 2004Date of Patent: May 15, 2007Assignee: Cymer, Inc.Inventors: David S. Knowles, Daniel J. W. Brown, Richard L. Sandstrom, German E. Rylov, Eckehard D. Onkels, Herve A. Besaucele, David W. Myers, Alexander I. Ershov, William N. Partlo, Igor V. Fomenkov, Richard C. Ujazdowski, Richard M. Ness, Scot T. Smith, William G. Hulburd
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Patent number: 7088758Abstract: An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a pluraType: GrantFiled: October 1, 2004Date of Patent: August 8, 2006Assignee: Cymer, Inc.Inventors: Richard L. Sandstrom, William N. Partlo, Daniel J. W. Brown, Thomas A. Yager, Alexander I. Ershov, Robert J. Rafac, German E. Rylov
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Patent number: 7058107Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses.Type: GrantFiled: March 18, 2004Date of Patent: June 6, 2006Assignee: Cymer, Inc.Inventors: David S. Knowles, Daniel J. W. Brown, Richard L. Sandstrom, German E. Rylov, Eckehard D. Onkels, Herve A. Besaucele, David W. Myers, Alexander I. Ershov, William N. Partlo, Igor V. Fomenkov, Richard C. Ujazdowski, Richard M. Ness, Scott T. Smith, William G. Hulburd
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Publication number: 20040258122Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses.Type: ApplicationFiled: May 25, 2004Publication date: December 23, 2004Inventors: David S. Knowles, Daniel J. W. Brown, Richard L. Sandstrom, German E. Rylov, Eckehard D. Onkels, Herve A. Besaucele, David W. Myers, Alexander I. Ershov, William N. Partlo, Igor V. Fomenkov, Richard C. Ujazdowski, Richard M. Ness, Scot T. Smith, William G. Hulburd
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Patent number: 6801560Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses.Type: GrantFiled: January 23, 2002Date of Patent: October 5, 2004Assignee: Cymer, Inc.Inventors: David S. Knowles, Daniel J. W. Brown, Richard L. Sandstrom, German E. Rylov, Eckehard D. Onkels, Herve A. Besaucele, David W. Myers, Alexander I. Ershov, William N. Partlo, Igor V. Fomenkov, Richard C. Ujazdowski, Richard M. Ness, Scott T. Smith, William G. Hulburd
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Patent number: 6798812Abstract: The present invention provides an injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The parameters chamber can be controlled separately permitting optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment is a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In this preferred embodiment, both of the chambers and the laser optics are mounted on a vertical optical table within a laser enclosure.Type: GrantFiled: September 13, 2002Date of Patent: September 28, 2004Assignee: Cymer, Inc.Inventors: German E. Rylov, Thomas Hofmann, Richard L. Sandstrom
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Publication number: 20040174919Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses.Type: ApplicationFiled: March 18, 2004Publication date: September 9, 2004Inventors: David S. Knowles, Daniel J. W. Brown, Richard L. Sandstrom, German E. Rylov, Eckehard D. Onkels, Herve A. Besaucele, David W. Myers, Alexander I. Ershov, William N. Partlo, Igor V. Fomenkov, Richard C. Ujazdowski, Richard M. Ness, Scott T. Smith, William G. Hulburd
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Publication number: 20030138019Abstract: The present invention provides an injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The parameters chamber can be controlled separately permitting optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment is a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In this preferred embodiment, both of the chambers and the laser optics are mounted on a vertical optical table within a laser enclosure.Type: ApplicationFiled: September 13, 2002Publication date: July 24, 2003Inventors: German E. Rylov, Thomas Hofmann, Richard L. Sandstrom
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Publication number: 20020154671Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses.Type: ApplicationFiled: January 23, 2002Publication date: October 24, 2002Inventors: David S. Knowles, Daniel J.W. Brown, Richard L. Sandstrom, German E. Rylov, Eckehard D. Onkels, Herve A. Besaucele, David W. Myers, Alexander I. Ershov, William N. Partlo, Igor V. Fomenkov, Richard C. Ujazdowski, Richard M. Ness, Scott T. Smith, William G. Hulburd