Abstract: A hard film to be formed on a substrate satisfying the composition represented by formula (1): TiaCrbAlcZrdLe(BxCyNz), wherein: L represented one or more elements of Si and Y; a, b, c, d, e, x, y, and z are atomic ratios of Ti, Cr, Al, Zr, L, B, C, and N, respectively; and the atomic ratios satisfy the following ranges: 0?a?0.30, 0.10?b ?0.30, 0.40?c?0.70, 0.03?d?0.20, 0?e?0.10, 0?x?0.15, 0?y?0.10, 0.80?z?1, a+b+c+d+e=1 and x+y+z=1.

Abstract: A member covered with a hard coating having good wear resistance, a tool using the member, and a target for forming the hard coating are provided. A hard-coating-coated member has a hard coating on a substrate, in which the hard coating has a composition of (TiaCrbAlcSidYeRf)(CyNz), the R being at least one element selected from Ho, Sm, Dy and La, and when the subscripts a, b, c, d, e, f, y and z denote atomic ratios respectively, 0.05?a?0.3, 0.05?b?0.3, 0.4?c?0.65, 0?d?0.05, 0?e?0.05, 0.005?f?0.05, a+b+c+d+e+f=1, 0?y?0.3, 0.7?z?1, and y+z=1 are satisfied.

Abstract: Disclosed are a hard film and a method useful for manufacturing the hard film wherein the hard film is obviously excellent in wear resistance, and exhibits excellent oxidation resistance even under a condition where hot heat generation tends to occur due to friction heating, consequently exhibits excellent properties compared with a usual hard-film including TiAlN, TiCrAlN, TiCrAlSiBN, CrAlSiBN, or NbCrAlSiBN. The hard film includes (M)aCrbAlcSidBeYfZ (however, M is at least one element selected from a group 4A element, a group 5A element, and a group 6A element (except for Cr) in the periodic table, and Z shows one of N, CN, NO and CNO), wherein a+b+c+d+e+f=1, and 0<a?0.3, 0.05?b?0.4, 0.4?c?0.8, 0?d?0.2, 0?e?0.2, and 0.01?f?0.1, (a, b, c, d, e and f show atomic ratios of M, Cr, Al, Si, B and Y respectively).

Abstract: A hard coating film having oxidation resistance and wear resistance superior to those of conventional coating films formed of TiAlN, TiCrAlN, TiCrAlSiBN, CrAlSiBN, NbCrAlSiBN, or the like. The hard coating film of the present invention has a component composition represented by the formula: (TiaCrbAlcMdBe)(CxN1-x), wherein 0?a?0.2, 0.05?b?0.4, 0.45?c?0.65, 0.005?d?0.05, 0?e?0.15, a+b+c+d+e=1, and 0?x?0.5; where M denotes at least one species selected from the group consisting of Ce, Pr, and Sc; variables a, b, c, d, and e indicate the atomic ratios of Ti, Cr, Al, M, and B respectively; and variable x indicates the atomic ratio of C.

Abstract: A member covered with a hard coating having good wear resistance, a tool using the member, and a target for forming the hard coating are provided. A hard-coating-coated member has a hard coating on a substrate, in which the hard coating has a composition of (TiaCrbAlcSidYeRf)(CyNz), the R being at least one element selected from Ho, Sm, Dy and La, and when the subscripts a, b, c, d, e, f, y and z denote atomic ratios respectively, 0.05?a?0.3, 0.05?b?0.3, 0.4?c?0.65, 0?d?0.05, 0?e?0.05, 0.005?f?0.05, a+b+c+d+e+f=1, 0?y?0.3, 0.7?z?1, and y+z=1 are satisfied.

Abstract: For superior wear resistance to conventional TiN hard films and TiAlN hard films, a hard film contains (Zr1-a, Hfa) (C1-xNx), wherein “a” and “x” are the atomic ratios of Hf and N, respectively, and satisfy the following conditions: 0.05?a?0.4 and 0?x?1. Another hard film contains (Zr1-a-b, Hfa, Mb) (C1-xNx), wherein M is at least one of W and Mo; and “a”, “b”, and “x” are the atomic ratios of Hf, M, and N, respectively, and satisfy the following conditions: 0?1?a?b, 0?a, 0.03?b?0.35, and 0?x?1.

Abstract: A hard coating film having oxidation resistance and wear resistance superior to those of conventional coating films formed of TiAlN, TiCrAlN, TiCrAlSiBN, CrAlSiBN, NbCrAlSiBN, or the like. The hard coating film of the present invention has a component composition represented by the formula: (TiaCrbAlcMdBe)(CxN1-x), wherein 0?a?0.2, 0.05?b?0.4, 0.45?c?0.65, 0.005?d?0.05, 0?e?0.15, a+b+c+d+e=1, and 0?x?0.5; where M denotes at least one species selected from the group consisting of Ce, Pr, and Sc; variables a, b, c, d, and e indicate the atomic ratios of Ti, Cr, Al, M, and B respectively; and variable x indicates the atomic ratio of C.

Abstract: For superior wear resistance to conventional TiN hard films and TiAlN hard films, a hard film contains (Zr1-a, Hfa) (C1-xNx), wherein “a” and “x” are the atomic ratios of Hf and N, respectively, and satisfy the following conditions: 0.05?a?0.4 and 0?x?1. Another hard film contains (Zr1-a-b, Hfa, Mb) (C1-xNx) , wherein M is at least one of W and Mo; and “a”, “b”, and “x” are the atomic ratios of Hf, M, and N, respectively, and satisfy the following conditions: 0?1-a-b, 0?a, 0.03?b?0.35, and 0?x?1.

Abstract: For superior wear resistance to conventional TiN hard films and TiAlN hard films, a hard film contains (Zr1-a, Hfa) (C1-xNx), wherein “a” and “x” are the atomic ratios of Hf and N, respectively, and satisfy the following conditions: 0.05?a?0.4 and 0?x?1. Another hard film contains (Zr1-a-b, Hfa, Mb) (C1-xNx), wherein M is at least one of W and Me; and “a”, “b”, and “x” are the atomic ratios of Hf, M, and N, respectively, and satisfy the following conditions: 0?1-a-b, 0?a, 0.03?b?0.35, and 0?x?1.

Abstract: Disclosed are a hard film and a method useful for manufacturing the hard film wherein the hard film is obviously excellent in wear resistance, and exhibits excellent oxidation resistance even under a condition where hot heat generation tends to occur due to friction heating, consequently exhibits excellent properties compared with a usual hard-film including TiAlN, TiCrAlN, TiCrAlSiBN, CrAlSiBN, or NbCrAlSiBN. The hard film includes (M)aCrbAlcSidBeYfZ (however, M is at least one element selected from a group 4A element, a group 5A element, and a group 6A element (except for Cr) in the periodic table, and Z shows one of N, CN, NO and CNO), wherein a+b+c+d+e+f=1, and 0?a?0.3, 0.05?b?0.4, 0.4?c?0.8, 0?d?0.2, 0?e?0.2, and 0.01?f?0.1, (a, b, c, d, e and f show atomic ratios of M, Cr, Al, Si, B and Y respectively).

Abstract: For superior wear resistance to conventional TiN hard films and TiAlN hard films, a hard film contains (Zr1-a, Hfa) (C1-xNx), wherein “a” and “x” are the atomic ratios of Hf and N, respectively, and satisfy the following conditions: 0.05?a?0.4 and 0?x?1. Another hard film contains (Zr1-a-b, Hfa, Mb) (C1-xNx), wherein M is at least one of W and Mo; and “a”, “b”, and “x” are the atomic ratios of Hf, M, and N, respectively, and satisfy the following conditions: 0?1-a-b, 0?a, 0.03?b?0.35, and 0?x?1.