Abstract: In accordance with an embodiment, a device includes: a first supply rail; a second supply rail; an input/output terminal; an electrostatic discharge protection device comprising at least two stacked transistors coupled between the input/output terminal and a first one of the first supply rail or the second supply rail; and a trigger circuit coupled to the first supply rail and the second supply rail and configured to: detect an electrostatic discharge event at the input/output terminal based on a voltage of the first supply rail or a voltage of the second supply rail, and switch on the electrostatic discharge protection device in response to detecting the electrostatic discharge event.

Abstract: A radio frequency integrated circuit (RFIC) device includes: a first RF input/output (I/O) terminal; a second RF I/O terminal, where the first and the second RF I/O terminals are configured to transmit or receive an RF signal; a capacitor coupled between the first and the second RF I/O terminals; a first coil coupled between the first and the second RF I/O terminals, where the first coil is configured to provide ESD protection to the capacitor during a first ESD event; and a fast transient ESD protection circuit coupled between the first and the second RF I/O terminals, where the fast transient ESD protection circuit is configured to provide ESD protection to the capacitor during a second ESD event different from the first ESD event, where a first rise time of the first ESD event is longer than a second rise time of the second ESD event.

Abstract: In accordance with an embodiment, a semiconductor device includes: an n-doped region disposed over an insulating layer; a p-doped region disposed over the insulating layer adjacent to the n-doped region, where an interface between the n-doped region and the p-doped region form a first diode junction; a plurality of segmented p-type anode regions disposed over the insulating layer, each of the plurality of segmented p-type anode regions being surrounded by the n-doped region, where a doping concentration of the plurality of segmented p-type anode regions is greater than a doping concentration of the p-doped region; and a plurality of segmented n-type cathode regions disposed over the insulating layer. Each of the plurality of segmented n-type cathode regions are surrounded by the p-doped region, where a doping concentration of the plurality of segmented n-type cathode regions is greater than a doping concentration of the n-doped region.

Abstract: In accordance with an embodiment, a semiconductor device includes: an n-doped region disposed over an insulating layer; a p-doped region disposed over the insulating layer adjacent to the n-doped region, where an interface between the n-doped region and the p-doped region form a first diode junction; a plurality of segmented p-type anode regions disposed over the insulating layer, each of the plurality of segmented p-type anode regions being surrounded by the n-doped region, where a doping concentration of the plurality of segmented p-type anode regions is greater than a doping concentration of the p-doped region; and a plurality of segmented n-type cathode regions disposed over the insulating layer. Each of the plurality of segmented n-type cathode regions are surrounded by the p-doped region, where a doping concentration of the plurality of segmented n-type cathode regions is greater than a doping concentration of the n-doped region.

Abstract: A radio frequency integrated circuit (RFIC) device includes: a first RF input/output (I/O) terminal; a second RF I/O terminal, where the first and the second RF I/O terminals are configured to transmit or receive an RF signal; a capacitor coupled between the first and the second RF I/O terminals; a first coil coupled between the first and the second RF I/O terminals, where the first coil is configured to provide ESD protection to the capacitor during a first ESD event; and a fast transient ESD protection circuit coupled between the first and the second RF I/O terminals, where the fast transient ESD protection circuit is configured to provide ESD protection to the capacitor during a second ESD event different from the first ESD event, where a first rise time of the first ESD event is longer than a second rise time of the second ESD event.

Abstract: In accordance with an embodiment, a method for protecting a circuit includes: receiving a stress caused by an electrostatic discharge (ESD) event from a first node; limiting a current using a current limiting element coupled between the first node and a second node connected to the circuit; and limiting a voltage on the second node caused by the ESD event using a protection circuit including at least one MOS transistor having a load path coupled to the second node, where the at least one MOS transistor is disposed in a well, and a bias circuit coupled to a gate and a bulk connection of the at least one MOS transistor and a supply node.

Abstract: In accordance with an embodiment, a method for protecting a circuit includes: receiving a stress caused by an electrostatic discharge (ESD) event from a first node; limiting a current using a current limiting element coupled between the first node and a second node connected to the circuit; and limiting a voltage on the second node caused by the ESD event using a protection circuit including at least one MOS transistor having a load path coupled to the second node, where the at least one MOS transistor is disposed in a well, and a bias circuit coupled to a gate and a bulk connection of the at least one MOS transistor and a supply node.

Abstract: In accordance with an embodiment, a method for protecting a circuit includes: receiving a stress caused by an electrostatic discharge (ESD) event from a first node; limiting a current using a current limiting element coupled between the first node and a second node connected to the circuit; and limiting a voltage on the second node caused by the ESD event using a protection circuit including at least one MOS transistor having a load path coupled to the second node, where the at least one MOS transistor is disposed in a well, and a bias circuit coupled to a gate and a bulk connection of the at least one MOS transistor and a supply node.

Abstract: In accordance with an embodiment, a method for electrostatic discharge (ESD) protection includes: dividing a voltage between a plurality of circuit nodes using a voltage divider circuit to form a divided voltage; compensating a temperature dependency of the divided voltage to form a temperature compensated divided voltage; monitoring the voltage between the plurality of circuit nodes using a transient detection circuit to form a transient detection signal; and activating a clamp circuit coupled between the plurality of circuit nodes based on the temperature compensated divided voltage and based on the transient detection signal.

Abstract: In accordance with an embodiment, a method for electrostatic discharge (ESD) protection includes: dividing a voltage between a plurality of circuit nodes using a voltage divider circuit to form a divided voltage; compensating a temperature dependency of the divided voltage to form a temperature compensated divided voltage; monitoring the voltage between the plurality of circuit nodes using a transient detection circuit to form a transient detection signal; and activating a clamp circuit coupled between the plurality of circuit nodes based on the temperature compensated divided voltage and based on the transient detection signal.

Abstract: In accordance with an embodiment, a method for protecting a circuit includes: receiving a stress caused by an electrostatic discharge (ESD) event from a first node; limiting a current using a current limiting element coupled between the first node and a second node connected to the circuit; and limiting a voltage on the second node caused by the ESD event using a protection circuit including at least one MOS transistor having a load path coupled to the second node, where the at least one MOS transistor is disposed in a well, and a bias circuit coupled to a gate and a bulk connection of the at least one MOS transistor and a supply node.

Abstract: A semiconductor device includes an active device of a transistor disposed in a semiconductor substrate. An isolation layer is disposed at the semiconductor substrate, and a polysilicon substrate layer is disposed over the isolation layer and the semiconductor substrate. The polysilicon substrate layer includes a semiconductor device region of an interface protection circuit of the transistor.

Abstract: In some examples, a device includes a first power supply node, an input-output node, and a second power supply node positioned between the first power supply node and the input-output node. The device also includes a protection element configured to block a parasitic flow of carriers between the first power supply node and the input-output node, wherein the parasitic flow of carriers is based on a voltage level of the second power supply node.

Abstract: In some examples, a device includes a first power supply node, an input-output node, and a second power supply node positioned between the first power supply node and the input-output node. The device also includes a protection element configured to block a parasitic flow of carriers between the first power supply node and the input-output node, wherein the parasitic flow of carriers is based on a voltage level of the second power supply node.

Abstract: A semiconductor device includes an active device of a transistor disposed in a semiconductor substrate. An isolation layer is disposed at the semiconductor substrate, and a polysilicon substrate layer is disposed over the isolation layer and the semiconductor substrate. The polysilicon substrate layer includes a semiconductor device region of an interface protection circuit of the transistor.

Abstract: A circuit may comprise an electronic switching element, an integrated sensor, and a low-impedance path from one of the terminals of the sensor to one of the terminals of the electronic switching element.

Abstract: A circuit may comprise an electronic switching element, an integrated sensor, and a low-impedance path from one of the terminals of the sensor to one of the terminals of the electronic switching element.

Abstract: Techniques and architectures corresponding to electrostatic discharge clamping circuits with tracing circuitry are described.

Abstract: Techniques and architectures corresponding to electrostatic discharge blocking circuits are described.

Abstract: Embodiments of this disclosure relate to electrostatic discharge (ESD) protection techniques. For example, some embodiments include a variable resistor that selectively shunts power of an incoming ESD pulse from a first circuit node to a second circuit node and away from a semiconductor device. A control voltage provided to the variable resistor causes the transistor to change between a fully-off mode where only sub-threshold current, if any, flows; a fully-on mode wherein a maximum amount of current flows; and an analog mode wherein an intermediate and time-varying amount of current flows. In particular, the analog mode allows the ESD protection device to shunt power more precisely than previously achievable, such that the ESD protection device can protect semiconductor devices from ESD pulses.