Abstract: A substrate carrier system for carrying substrates to a vertical oven and a vertical oven are disclosed. In an embodiment, the system includes a substrate carrier configured to carry a plurality of substrates and a substrate carrier support structure configured to be inserted along an insertion direction into the vertical oven, and to receive the substrate carrier in a direction substantially orthogonal to the insertion direction into a holding position in the substrate carrier support structure.

Abstract: A substrate carrier system for moving substrates in a vertical oven and a method for processing substrates are disclosed. In some embodiments, a method for oxidizing material or depositing material includes carrying a plurality of substrates by a substrate carrier and inserting the substrate carrier into a vertical oven, wherein the plurality of substrates are held by the substrate carrier in predefined positions, wherein an angle measured between a main surface of a substrate of the plurality of substrates at one of the predefined positions and a vertical direction is less than 20 degrees. The method further includes oxidizing a material on the plurality of substrates or depositing a material onto the plurality of substrates.

Abstract: A substrate carrier system for moving substrates in a vertical oven and a method for processing substrates are disclosed. In some embodiments, a method for oxidizing material or depositing material includes carrying a plurality of substrates by a substrate carrier and inserting the substrate carrier into a vertical oven, wherein the plurality of substrates are held by the substrate carrier in predefined positions, wherein an angle measured between a main surface of a substrate of the plurality of substrates at one of the predefined positions and a vertical direction is less than 20 degrees. The method further includes oxidizing a material on the plurality of substrates or depositing a material onto the plurality of substrates.

Abstract: A method for manufacturing solid electrolyte capacitors is provided. Pursuant to the method, pores in formed sintered members composed of a valve metal are first nearly filled with manganese dioxide that is produced by pyrolysis of solutions that contain manganese nitrate. Following thereupon, the sintered members are immersed into a dry melt of manganese nitrate that may comprise an additive of manganese dioxide and/or silicon dioxide powder. Subsequently, the members are introduced into a furnace, and heated to approximately 100.degree. C. in dry air. Subsequently, fine drops of water are applied onto the surface of the heated sintered members and the pyrolysis is ended at temperatures of approximately 200.degree. to about 350.degree. C. in a mist of water vapor that flows by.