Patents by Inventor Gerrit Jacobus Hendrik BRUSSAARD

Gerrit Jacobus Hendrik BRUSSAARD has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230194954
    Abstract: A waveguide including: a first section, the first section configured to generate, by a non-linear optical process, a broadened wavelength spectrum of pulsed radiation provided to an input end of the waveguide; a second section, the second section including an output end of the waveguide, the second section configured to exhibit a larger absolute value of group velocity dispersion than the first section; wherein a length of the second section is configured to reduce a peak intensity of one or more peaks in the broadened wavelength spectrum by at least 20%.
    Type: Application
    Filed: November 30, 2022
    Publication date: June 22, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gerrit Jacobus Hendrik BRUSSAARD, Johannes Richard Karl KOHLER
  • Publication number: 20220326152
    Abstract: A high harmonic generation assembly and method for generating high harmonic radiation. The assembly comprises a cavity configured to receive input radiation and increase the intensity of the input radiation inside the cavity for forming drive radiation suitable for use in high harmonic generation. The assembly further comprises an interaction region within the cavity at which, in use, a medium is present, the medium being configured to generate harmonic radiation by high harmonic generation when the drive radiation is incident thereupon, and an optical assembly configured to direct the drive radiation to pass through the interaction region, and comprising an output coupler comprising an aperture through which at least a part of the generated harmonic radiation is able to exit the cavity. The optical assembly is further configured to shape the drive radiation into a converging hollow beam before the drive radiation passes through the interaction region.
    Type: Application
    Filed: September 4, 2020
    Publication date: October 13, 2022
    Applicant: ASML Netherlands B.V.
    Inventors: Adrianus Johannes Hendrikus SCHELLEKENS, David O'DWYER, Nan LIN, Gerrit Jacobus Hendrik BRUSSAARD
  • Patent number: 11347155
    Abstract: An illumination source apparatus (500), suitable for use in a metrology apparatus for the characterization of a structure on a substrate, the illumination source apparatus comprising: a high harmonic generation, HHG, medium (502); a pump radiation source (506) operable to emit a beam of pump radiation (508); and adjustable transformation optics (510) configured to adjustably transform the transverse spatial profile of the beam of pump radiation to produce a transformed beam (518) such that relative to the centre axis of the transformed beam, a central region of the transformed beam has substantially zero intensity and an outer region which is radially outwards from the centre axis of the transformed beam has a non-zero intensity, wherein the transformed beam is arranged to excite the HHG medium so as to generate high harmonic radiation (540), wherein the location of said outer region is dependent on an adjustment setting of the adjustable transformation optics.
    Type: Grant
    Filed: April 23, 2019
    Date of Patent: May 31, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: David O Dwyer, Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard
  • Patent number: 11223181
    Abstract: Methods and corresponding apparatus operable to cause an interaction between a drive radiation beam and a medium for generation of emitted radiation by high harmonic generation, the arrangement comprising: an interaction region positioned at an interaction plane and configured to receive the medium; a beam block positioned upstream of the interaction plane at a beam block plane and configured to partially block the drive radiation beam; a beam shaper positioned upstream of the beam block plane at an object plane and configured to control a spatial distribution of the drive radiation beam; and at least one lens positioned upstream of the interaction plane and downstream of the beam block plane, wherein the lens being positioned such that an image of the spatial distribution of the drive radiation beam is formed at the interaction plane.
    Type: Grant
    Filed: August 19, 2019
    Date of Patent: January 11, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard, David O Dwyer
  • Publication number: 20210191274
    Abstract: An illumination source apparatus (500), suitable for use in a metrology apparatus for the characterization of a structure on a substrate, the illumination source apparatus comprising: a high harmonic generation, HHG, medium (502); a pump radiation source (506) operable to emit a beam of pump radiation (508); and adjustable transformation optics (510) configured to adjustably transform the transverse spatial profile of the beam of pump radiation to produce a transformed beam (518) such that relative to the centre axis of the transformed beam, a central region of the transformed beam has substantially zero intensity and an outer region which is radially outwards from the centre axis of the transformed beam has a non-zero intensity, wherein the transformed beam is arranged to excite the HHG medium so as to generate high harmonic radiation (540), wherein the location of said outer region is dependent on an adjustment N setting of the adjustable transformation optics.
    Type: Application
    Filed: April 23, 2019
    Publication date: June 24, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: David O DWYER, Petrus Wilhelmus SMORENBURG, Gerrit Jacobus Hendrik BRUSSAARD
  • Patent number: 10900829
    Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.
    Type: Grant
    Filed: July 30, 2019
    Date of Patent: January 26, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Gerrit Jacobus Hendrik Brussaard, Willem Jakobus Cornelis Koppert, Otger Jan Luiten, Han-Kwang Nienhuys, Job Beckers, Ruud Martinus Van Der Horst
  • Patent number: 10670974
    Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.
    Type: Grant
    Filed: December 27, 2018
    Date of Patent: June 2, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Gerrit Jacobus Hendrik Brussaard, Petrus Wilhelmus Smorenburg, Teis Johan Coenen, Niels Geypen, Peter Danny Van Voorst, Sander Bas Roobol
  • Patent number: 10642172
    Abstract: An illumination source apparatus (500), suitable for use in a metrology apparatus for the characterization of a structure on a substrate, the illumination source apparatus comprising: a high harmonic generation, HHG, medium (502); a pump radiation source (506) operable to emit a beam of pump radiation (508); and adjustable transformation optics (510) configured to adjustably transform the transverse spatial profile of the beam of pump radiation to produce a transformed beam (518) such that relative to the centre axis of the transformed beam, a central region of the transformed beam has substantially zero intensity and an outer region which is radially outwards from the centre axis of the transformed beam has a non-zero intensity, wherein the transformed beam is arranged to excite the HHG medium so as to generate high harmonic radiation (540), wherein the location of said outer region is dependent on an adjustment setting of the adjustable transformation optics.
    Type: Grant
    Filed: April 30, 2019
    Date of Patent: May 5, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: David O Dwyer, Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard
  • Patent number: 10630037
    Abstract: Disclosed is a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a pump radiation source is operable to emit pump radiation at a high harmonic generation gas medium thereby exciting the high harmonic generation gas medium within a pump radiation interaction region so as to generate the high harmonic radiation and an ionization radiation source is operable to emit ionization radiation at the high harmonic generation gas medium to ionize a gas at an ionization region between the pump radiation interaction region and an optical output of the illumination source.
    Type: Grant
    Filed: March 13, 2019
    Date of Patent: April 21, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Sudhir Srivastava, Sander Bas Roobol, Simon Gijsbert Josephus Mathijssen, Nan Lin, Sjoerd Nicolaas Lambertus Donders, Krijn Frederik Bustraan, Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard
  • Publication number: 20200067258
    Abstract: Methods and corresponding apparatus operable to cause an interaction between a drive radiation beam and a medium for generation of emitted radiation by high harmonic generation, the arrangement comprising: an interaction region positioned at an interaction plane and configured to receive the medium; a beam block positioned upstream of the interaction plane at a beam block plane and configured to partially block the drive radiation beam; a beam shaper positioned upstream of the beam block plane at an object plane and configured to control a spatial distribution of the drive radiation beam; and at least one lens positioned upstream of the interaction plane and downstream of the beam block plane, wherein the lens being positioned such that an image of the spatial distribution of the drive radiation beam is formed at the interaction plane.
    Type: Application
    Filed: August 19, 2019
    Publication date: February 27, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard, David O Dwyer
  • Patent number: 10530111
    Abstract: Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Sudhir Srivastava, Sander Bas Roobol, Simon Gijsbert Josephus Mathijssen, Nan Lin, Sjoerd Nicolaas Lambertus Donders, Krijn Frederik Bustraan, Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard
  • Publication number: 20190353521
    Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.
    Type: Application
    Filed: July 30, 2019
    Publication date: November 21, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Yevgenyevich Banine, Gerrit Jacobus Hendrik Brussaard, Willem Jakobus Cornelis Koppert, Otger Jan Luiten, Han-Kwang Nienhuys, Job Beckers, Ruud Martinus Van Der Horst
  • Publication number: 20190346776
    Abstract: An illumination source apparatus (500), suitable for use in a metrology apparatus for the characterization of a structure on a substrate, the illumination source apparatus comprising: a high harmonic generation, HHG, medium (502); a pump radiation source (506) operable to emit a beam of pump radiation (508); and adjustable transformation optics (510) configured to adjustably transform the transverse spatial profile of the beam of pump radiation to produce a transformed beam (518) such that relative to the centre axis of the transformed beam, a central region of the transformed beam has substantially zero intensity and an outer region which is radially outwards from the centre axis of the transformed beam has a non-zero intensity, wherein the transformed beam is arranged to excite the HHG medium so as to generate high harmonic radiation (540), wherein the location of said outer region is dependent on an adjustment setting of the adjustable transformation optics.
    Type: Application
    Filed: April 30, 2019
    Publication date: November 14, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: David O DWYER, Petrus Wilhelmus SMORENBURG, Gerrit Jacobus Hendrik BRUSSAARD
  • Patent number: 10468225
    Abstract: An electron source, e.g. for a free electron laser used for EUV lithography comprises: • a cathode (203) configured to be connected to a negative potential (100, 101); • a laser (110) configured to direct pulses of radiation onto the cathode so as to cause the cathode to emit bunches of electrons; • an RF booster (180) connected to an RF source and configured to accelerate the bunches of electrons; and • a timing corrector (303, 313, 400, 401) configured to correct the time of arrival of bunches of electrons at the RF booster relative to the RF voltage provided by the RF source. The timing corrector may comprise a correction electrode (303, 313) surrounding a path of the bunches of electrons from the cathode to the RF booster and a correction voltage source (400, 401) configured to apply a correction voltage to the correction electrode.
    Type: Grant
    Filed: February 7, 2017
    Date of Patent: November 5, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Andrey Alexandrovich Nikipelov, Gerrit Jacobus Hendrik Brussaard, Wouter Joep Engelen
  • Patent number: 10362665
    Abstract: Methods and apparatus for generation of radiation by high harmonic generation, HHG. The apparatus comprises: a chamber for holding a vacuum, the chamber comprising a radiation input, a radiation output and an interaction region at which, in use, a medium is present, the chamber being arranged such that, in use, when driving radiation propagates through the radiation input and is incident upon the medium, the medium emits radiation via HHG, the emitted radiation propagating through the radiation output; and at least one plasma generator at the radiation input and/or the radiation output for generating a plasma volume allowing the driving radiation and emitted radiation, respectively, to propagate through the plasma volume.
    Type: Grant
    Filed: May 24, 2018
    Date of Patent: July 23, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard, Vadim Yevgenyevich Banine
  • Publication number: 20190212657
    Abstract: Disclosed is a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a pump radiation source is operable to emit pump radiation at a high harmonic generation gas medium thereby exciting the high harmonic generation gas medium within a pump radiation interaction region so as to generate the high harmonic radiation and an ionization radiation source is operable to emit ionization radiation at the high harmonic generation gas medium to ionize a gas at an ionization region between the pump radiation interaction region and an optical output of the illumination source.
    Type: Application
    Filed: March 13, 2019
    Publication date: July 11, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Sudhir SRIVASTAVA, Sander Bas Roobol, Simon Gijsbert Josephus Mathijssen, Nan Lin, Sjoerd Nicolaas Lambertus Donders, Krijn Frederik Bustraan, Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard
  • Publication number: 20190204757
    Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.
    Type: Application
    Filed: December 27, 2018
    Publication date: July 4, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Gerrit Jacobus Hendrik BRUSSAARD, Petrus Wilhelmus Smorenburg, Teis Johan Coenen, Niels Geypen, Peter Danny Van Voorst, Sander Bas Roobol
  • Publication number: 20190035594
    Abstract: An electron source, e.g. for a free electron laser used for EUV lithography comprises: a cathode (203) configured to be connected to a negative potential (100, 101); a laser (110) configured to direct pulses of radiation onto the cathode so as to cause the cathode to emit bunches of electrons; an RF booster (180) connected to an RF source and configured to accelerate the bunches of electrons; and a timing corrector (303, 313, 400, 401) configured to correct the time of arrival of bunches of electrons at the RF booster relative to the RF voltage provided by the RF source. The timing corrector may comprise a correction electrode (303, 313) surrounding a path of the bunches of electrons from the cathode to the RF booster and a correction voltage source (400, 401) configured to apply a correction voltage to the correction electrode.
    Type: Application
    Filed: February 7, 2017
    Publication date: January 31, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Andrey Alexandrovich NIKIPELOV, Gerrit Jacobus Hendrik BRUSSAARD, Wouter Joep ENGELEN
  • Publication number: 20180368243
    Abstract: Methods and apparatus for generation of radiation by high harmonic generation, HHG. The apparatus comprises: a chamber for holding a vacuum, the chamber comprising a radiation input, a radiation output and an interaction region at which, in use, a medium is present, the chamber being arranged such that, in use, when driving radiation propagates through the radiation input and is incident upon the medium, the medium emits radiation via HHG, the emitted radiation propagating through the radiation output; and at least one plasma generator at the radiation input and/or the radiation output for generating a plasma volume allowing the driving radiation and emitted radiation, respectively, to propagate through the plasma volume.
    Type: Application
    Filed: May 24, 2018
    Publication date: December 20, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Petrus Wilhelmus SMORENBURG, Gerrit Jacobus Hendrik Brussaard, Vadim Yevgenyevich Banine
  • Publication number: 20180267411
    Abstract: Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.
    Type: Application
    Filed: February 23, 2018
    Publication date: September 20, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Sudhir SRIVASTAVA, Sander Bas ROOBOL, Simon Gijsbert Josephus MATHIJSSEN, Nan LIN, Sjoerd Nicolaas Lambertus DONDERS, Krijn Frederik BUSTRAAN, Petrus Wilhelmus SMORENBURG, Gerrit Jacobus Hendrik BRUSSAARD