Patents by Inventor Gerrit Jacobus Hendrik BRUSSAARD
Gerrit Jacobus Hendrik BRUSSAARD has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230194954Abstract: A waveguide including: a first section, the first section configured to generate, by a non-linear optical process, a broadened wavelength spectrum of pulsed radiation provided to an input end of the waveguide; a second section, the second section including an output end of the waveguide, the second section configured to exhibit a larger absolute value of group velocity dispersion than the first section; wherein a length of the second section is configured to reduce a peak intensity of one or more peaks in the broadened wavelength spectrum by at least 20%.Type: ApplicationFiled: November 30, 2022Publication date: June 22, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Gerrit Jacobus Hendrik BRUSSAARD, Johannes Richard Karl KOHLER
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Publication number: 20220326152Abstract: A high harmonic generation assembly and method for generating high harmonic radiation. The assembly comprises a cavity configured to receive input radiation and increase the intensity of the input radiation inside the cavity for forming drive radiation suitable for use in high harmonic generation. The assembly further comprises an interaction region within the cavity at which, in use, a medium is present, the medium being configured to generate harmonic radiation by high harmonic generation when the drive radiation is incident thereupon, and an optical assembly configured to direct the drive radiation to pass through the interaction region, and comprising an output coupler comprising an aperture through which at least a part of the generated harmonic radiation is able to exit the cavity. The optical assembly is further configured to shape the drive radiation into a converging hollow beam before the drive radiation passes through the interaction region.Type: ApplicationFiled: September 4, 2020Publication date: October 13, 2022Applicant: ASML Netherlands B.V.Inventors: Adrianus Johannes Hendrikus SCHELLEKENS, David O'DWYER, Nan LIN, Gerrit Jacobus Hendrik BRUSSAARD
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Patent number: 11347155Abstract: An illumination source apparatus (500), suitable for use in a metrology apparatus for the characterization of a structure on a substrate, the illumination source apparatus comprising: a high harmonic generation, HHG, medium (502); a pump radiation source (506) operable to emit a beam of pump radiation (508); and adjustable transformation optics (510) configured to adjustably transform the transverse spatial profile of the beam of pump radiation to produce a transformed beam (518) such that relative to the centre axis of the transformed beam, a central region of the transformed beam has substantially zero intensity and an outer region which is radially outwards from the centre axis of the transformed beam has a non-zero intensity, wherein the transformed beam is arranged to excite the HHG medium so as to generate high harmonic radiation (540), wherein the location of said outer region is dependent on an adjustment setting of the adjustable transformation optics.Type: GrantFiled: April 23, 2019Date of Patent: May 31, 2022Assignee: ASML Netherlands B.V.Inventors: David O Dwyer, Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard
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Patent number: 11223181Abstract: Methods and corresponding apparatus operable to cause an interaction between a drive radiation beam and a medium for generation of emitted radiation by high harmonic generation, the arrangement comprising: an interaction region positioned at an interaction plane and configured to receive the medium; a beam block positioned upstream of the interaction plane at a beam block plane and configured to partially block the drive radiation beam; a beam shaper positioned upstream of the beam block plane at an object plane and configured to control a spatial distribution of the drive radiation beam; and at least one lens positioned upstream of the interaction plane and downstream of the beam block plane, wherein the lens being positioned such that an image of the spatial distribution of the drive radiation beam is formed at the interaction plane.Type: GrantFiled: August 19, 2019Date of Patent: January 11, 2022Assignee: ASML Netherlands B.V.Inventors: Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard, David O Dwyer
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Publication number: 20210191274Abstract: An illumination source apparatus (500), suitable for use in a metrology apparatus for the characterization of a structure on a substrate, the illumination source apparatus comprising: a high harmonic generation, HHG, medium (502); a pump radiation source (506) operable to emit a beam of pump radiation (508); and adjustable transformation optics (510) configured to adjustably transform the transverse spatial profile of the beam of pump radiation to produce a transformed beam (518) such that relative to the centre axis of the transformed beam, a central region of the transformed beam has substantially zero intensity and an outer region which is radially outwards from the centre axis of the transformed beam has a non-zero intensity, wherein the transformed beam is arranged to excite the HHG medium so as to generate high harmonic radiation (540), wherein the location of said outer region is dependent on an adjustment N setting of the adjustable transformation optics.Type: ApplicationFiled: April 23, 2019Publication date: June 24, 2021Applicant: ASML Netherlands B.V.Inventors: David O DWYER, Petrus Wilhelmus SMORENBURG, Gerrit Jacobus Hendrik BRUSSAARD
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Patent number: 10900829Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.Type: GrantFiled: July 30, 2019Date of Patent: January 26, 2021Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Gerrit Jacobus Hendrik Brussaard, Willem Jakobus Cornelis Koppert, Otger Jan Luiten, Han-Kwang Nienhuys, Job Beckers, Ruud Martinus Van Der Horst
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Patent number: 10670974Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.Type: GrantFiled: December 27, 2018Date of Patent: June 2, 2020Assignee: ASML Netherlands B.V.Inventors: Gerrit Jacobus Hendrik Brussaard, Petrus Wilhelmus Smorenburg, Teis Johan Coenen, Niels Geypen, Peter Danny Van Voorst, Sander Bas Roobol
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Patent number: 10642172Abstract: An illumination source apparatus (500), suitable for use in a metrology apparatus for the characterization of a structure on a substrate, the illumination source apparatus comprising: a high harmonic generation, HHG, medium (502); a pump radiation source (506) operable to emit a beam of pump radiation (508); and adjustable transformation optics (510) configured to adjustably transform the transverse spatial profile of the beam of pump radiation to produce a transformed beam (518) such that relative to the centre axis of the transformed beam, a central region of the transformed beam has substantially zero intensity and an outer region which is radially outwards from the centre axis of the transformed beam has a non-zero intensity, wherein the transformed beam is arranged to excite the HHG medium so as to generate high harmonic radiation (540), wherein the location of said outer region is dependent on an adjustment setting of the adjustable transformation optics.Type: GrantFiled: April 30, 2019Date of Patent: May 5, 2020Assignee: ASML Netherlands B.V.Inventors: David O Dwyer, Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard
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Patent number: 10630037Abstract: Disclosed is a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a pump radiation source is operable to emit pump radiation at a high harmonic generation gas medium thereby exciting the high harmonic generation gas medium within a pump radiation interaction region so as to generate the high harmonic radiation and an ionization radiation source is operable to emit ionization radiation at the high harmonic generation gas medium to ionize a gas at an ionization region between the pump radiation interaction region and an optical output of the illumination source.Type: GrantFiled: March 13, 2019Date of Patent: April 21, 2020Assignee: ASML Netherlands B.V.Inventors: Sudhir Srivastava, Sander Bas Roobol, Simon Gijsbert Josephus Mathijssen, Nan Lin, Sjoerd Nicolaas Lambertus Donders, Krijn Frederik Bustraan, Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard
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Publication number: 20200067258Abstract: Methods and corresponding apparatus operable to cause an interaction between a drive radiation beam and a medium for generation of emitted radiation by high harmonic generation, the arrangement comprising: an interaction region positioned at an interaction plane and configured to receive the medium; a beam block positioned upstream of the interaction plane at a beam block plane and configured to partially block the drive radiation beam; a beam shaper positioned upstream of the beam block plane at an object plane and configured to control a spatial distribution of the drive radiation beam; and at least one lens positioned upstream of the interaction plane and downstream of the beam block plane, wherein the lens being positioned such that an image of the spatial distribution of the drive radiation beam is formed at the interaction plane.Type: ApplicationFiled: August 19, 2019Publication date: February 27, 2020Applicant: ASML Netherlands B.V.Inventors: Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard, David O Dwyer
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Patent number: 10530111Abstract: Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.Type: GrantFiled: February 23, 2018Date of Patent: January 7, 2020Assignee: ASML Netherlands B.V.Inventors: Sudhir Srivastava, Sander Bas Roobol, Simon Gijsbert Josephus Mathijssen, Nan Lin, Sjoerd Nicolaas Lambertus Donders, Krijn Frederik Bustraan, Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard
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Publication number: 20190353521Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.Type: ApplicationFiled: July 30, 2019Publication date: November 21, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Vadim Yevgenyevich Banine, Gerrit Jacobus Hendrik Brussaard, Willem Jakobus Cornelis Koppert, Otger Jan Luiten, Han-Kwang Nienhuys, Job Beckers, Ruud Martinus Van Der Horst
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Publication number: 20190346776Abstract: An illumination source apparatus (500), suitable for use in a metrology apparatus for the characterization of a structure on a substrate, the illumination source apparatus comprising: a high harmonic generation, HHG, medium (502); a pump radiation source (506) operable to emit a beam of pump radiation (508); and adjustable transformation optics (510) configured to adjustably transform the transverse spatial profile of the beam of pump radiation to produce a transformed beam (518) such that relative to the centre axis of the transformed beam, a central region of the transformed beam has substantially zero intensity and an outer region which is radially outwards from the centre axis of the transformed beam has a non-zero intensity, wherein the transformed beam is arranged to excite the HHG medium so as to generate high harmonic radiation (540), wherein the location of said outer region is dependent on an adjustment setting of the adjustable transformation optics.Type: ApplicationFiled: April 30, 2019Publication date: November 14, 2019Applicant: ASML Netherlands B.V.Inventors: David O DWYER, Petrus Wilhelmus SMORENBURG, Gerrit Jacobus Hendrik BRUSSAARD
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Patent number: 10468225Abstract: An electron source, e.g. for a free electron laser used for EUV lithography comprises: • a cathode (203) configured to be connected to a negative potential (100, 101); • a laser (110) configured to direct pulses of radiation onto the cathode so as to cause the cathode to emit bunches of electrons; • an RF booster (180) connected to an RF source and configured to accelerate the bunches of electrons; and • a timing corrector (303, 313, 400, 401) configured to correct the time of arrival of bunches of electrons at the RF booster relative to the RF voltage provided by the RF source. The timing corrector may comprise a correction electrode (303, 313) surrounding a path of the bunches of electrons from the cathode to the RF booster and a correction voltage source (400, 401) configured to apply a correction voltage to the correction electrode.Type: GrantFiled: February 7, 2017Date of Patent: November 5, 2019Assignee: ASML Netherlands B.V.Inventors: Andrey Alexandrovich Nikipelov, Gerrit Jacobus Hendrik Brussaard, Wouter Joep Engelen
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Patent number: 10362665Abstract: Methods and apparatus for generation of radiation by high harmonic generation, HHG. The apparatus comprises: a chamber for holding a vacuum, the chamber comprising a radiation input, a radiation output and an interaction region at which, in use, a medium is present, the chamber being arranged such that, in use, when driving radiation propagates through the radiation input and is incident upon the medium, the medium emits radiation via HHG, the emitted radiation propagating through the radiation output; and at least one plasma generator at the radiation input and/or the radiation output for generating a plasma volume allowing the driving radiation and emitted radiation, respectively, to propagate through the plasma volume.Type: GrantFiled: May 24, 2018Date of Patent: July 23, 2019Assignee: ASML Netherlands B.V.Inventors: Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard, Vadim Yevgenyevich Banine
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Publication number: 20190212657Abstract: Disclosed is a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a pump radiation source is operable to emit pump radiation at a high harmonic generation gas medium thereby exciting the high harmonic generation gas medium within a pump radiation interaction region so as to generate the high harmonic radiation and an ionization radiation source is operable to emit ionization radiation at the high harmonic generation gas medium to ionize a gas at an ionization region between the pump radiation interaction region and an optical output of the illumination source.Type: ApplicationFiled: March 13, 2019Publication date: July 11, 2019Applicant: ASML Netherlands B.V.Inventors: Sudhir SRIVASTAVA, Sander Bas Roobol, Simon Gijsbert Josephus Mathijssen, Nan Lin, Sjoerd Nicolaas Lambertus Donders, Krijn Frederik Bustraan, Petrus Wilhelmus Smorenburg, Gerrit Jacobus Hendrik Brussaard
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Publication number: 20190204757Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.Type: ApplicationFiled: December 27, 2018Publication date: July 4, 2019Applicant: ASML Netherlands B.V.Inventors: Gerrit Jacobus Hendrik BRUSSAARD, Petrus Wilhelmus Smorenburg, Teis Johan Coenen, Niels Geypen, Peter Danny Van Voorst, Sander Bas Roobol
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Publication number: 20190035594Abstract: An electron source, e.g. for a free electron laser used for EUV lithography comprises: a cathode (203) configured to be connected to a negative potential (100, 101); a laser (110) configured to direct pulses of radiation onto the cathode so as to cause the cathode to emit bunches of electrons; an RF booster (180) connected to an RF source and configured to accelerate the bunches of electrons; and a timing corrector (303, 313, 400, 401) configured to correct the time of arrival of bunches of electrons at the RF booster relative to the RF voltage provided by the RF source. The timing corrector may comprise a correction electrode (303, 313) surrounding a path of the bunches of electrons from the cathode to the RF booster and a correction voltage source (400, 401) configured to apply a correction voltage to the correction electrode.Type: ApplicationFiled: February 7, 2017Publication date: January 31, 2019Applicant: ASML Netherlands B.V.Inventors: Andrey Alexandrovich NIKIPELOV, Gerrit Jacobus Hendrik BRUSSAARD, Wouter Joep ENGELEN
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Publication number: 20180368243Abstract: Methods and apparatus for generation of radiation by high harmonic generation, HHG. The apparatus comprises: a chamber for holding a vacuum, the chamber comprising a radiation input, a radiation output and an interaction region at which, in use, a medium is present, the chamber being arranged such that, in use, when driving radiation propagates through the radiation input and is incident upon the medium, the medium emits radiation via HHG, the emitted radiation propagating through the radiation output; and at least one plasma generator at the radiation input and/or the radiation output for generating a plasma volume allowing the driving radiation and emitted radiation, respectively, to propagate through the plasma volume.Type: ApplicationFiled: May 24, 2018Publication date: December 20, 2018Applicant: ASML Netherlands B.V.Inventors: Petrus Wilhelmus SMORENBURG, Gerrit Jacobus Hendrik Brussaard, Vadim Yevgenyevich Banine
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Publication number: 20180267411Abstract: Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.Type: ApplicationFiled: February 23, 2018Publication date: September 20, 2018Applicant: ASML Netherlands B.V.Inventors: Sudhir SRIVASTAVA, Sander Bas ROOBOL, Simon Gijsbert Josephus MATHIJSSEN, Nan LIN, Sjoerd Nicolaas Lambertus DONDERS, Krijn Frederik BUSTRAAN, Petrus Wilhelmus SMORENBURG, Gerrit Jacobus Hendrik BRUSSAARD