Patents by Inventor Gerrit-Jan Heerens

Gerrit-Jan Heerens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby
    Patent number: 6781673
    Abstract: In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.
    Type: Grant
    Filed: August 23, 2001
    Date of Patent: August 24, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Martinus Hendrikus Antonius Leenders, Henri Gerard Cato Werij, Hugo Matthieu Visser, Gerrit-Jan Heerens, Erik Leonardus Ham, Hans Meiling, Erik Roelof Loopstra, Sjoerd Nicolaas Lambertus Donders
  • Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby
    Publication number: 20020109828
    Abstract: In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.
    Type: Application
    Filed: August 23, 2001
    Publication date: August 15, 2002
    Inventors: Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Martinus Hendrikus Antonius Leenders, Henri Gerard Cato Werij, Hugo Matthieu Visser, Gerrit-Jan Heerens, Erik Leonardus Ham, Hans Meiling, Erik Roelof Loopstra, Sjoerd Nicolaas Lambertus Donders
  • Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby
    Publication number: 20020096647
    Abstract: In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield means are fixed to the mask holder rather than the mask.
    Type: Application
    Filed: October 9, 2001
    Publication date: July 25, 2002
    Applicant: ASM LITHOGRAPHY B.V.
    Inventors: Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Martinus Hendrikus Antonius Leenders, Henri Gerard Cato Werij, Hugo Matthieu Visser, Gerrit-Jan Heerens, Erik Leonardus Ham, Hans Meiling, Erik Roelof Loopstra, Sjoerd Nicolaas Lambertus Donders