Patents by Inventor Gerrit VAN DEN BOSCH

Gerrit VAN DEN BOSCH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pellicle and pellicle assembly
    Patent number: 12117726
    Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.
    Type: Grant
    Filed: July 11, 2023
    Date of Patent: October 15, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: David Ferdinand Vles, Chaitanya Krishna Ande, Antonius Franciscus Johannes De Groot, Adrianus Johannes Maria Giesbers, Johannes Joseph Janssen, Paul Janssen, Johan Hendrik Klootwijk, Peter Simon Antonius Knapen, Evgenia Kurganova, Marcel Peter Meijer, Wouter Rogier Meijerink, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Raymond Olsman, Hrishikesh Patel, Mária Péter, Gerrit van den Bosch, Wilhelmus Theodorus Anthonius Johannes van den Einden, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, Hendrikus Jan Wondergem, Aleksandar Nikolov Zdravkov
  • PELLICLE AND PELLICLE ASSEMBLY
    Publication number: 20240027893
    Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.
    Type: Application
    Filed: July 11, 2023
    Publication date: January 25, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: David Ferdinand VLES, Chaitanya Krishna ANDE, Antonius Franciscus Johannes DE GROOT, Adrianus Johannes Maria GIESBERS, Johannes Joseph JANSSEN, Paul JANSSEN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Marcel Peter MEIJER, Wouter Rogier MEIJERINK, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Raymond OLSMAN, Hrishikesh PATEL, Mária PÉTER, Gerrit VAN DEN BOSCH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
  • Pellicle and pellicle assembly
    Patent number: 11754918
    Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
    Type: Grant
    Filed: December 13, 2021
    Date of Patent: September 12, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: David Ferdinand Vles, Chaitanya Krishna Ande, Antonius Franciscus Johannes De Groot, Adrianus Johannes Maria Giesbers, Johannes Joseph Janssen, Paul Janssen, Johan Hendrik Klootwijk, Peter Simon Antonius Knapen, Evgenia Kurganova, Marcel Peter Meijer, Wouter Rogier Meijerink, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Raymond Olsman, Hrishikesh Patel, Mária Péter, Gerrit Van Den Bosch, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, Hendrikus Jan Wondergem, Aleksandar Nikolov Zdravkov
  • PELLICLE AND PELLICLE ASSEMBLY
    Publication number: 20220121111
    Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
    Type: Application
    Filed: December 13, 2021
    Publication date: April 21, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: David Ferdinand VLES, Chaitanya Krishna ANDE, Antonius Franciscus Johannes DE GROOT, Adrianus Johannes Maria GIESBERS, Johannes Joseph JANSSEN, Paul JANSSEN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Marcel Peter MEIJER, Wouter Rogier MEIJERINK, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Raymond OLSMAN, Hrishikesh PATEL, Mária PÉTER, Gerrit VAN DEN BOSCH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
  • Pellicle and pellicle assembly
    Patent number: 11231646
    Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.
    Type: Grant
    Filed: June 8, 2018
    Date of Patent: January 25, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: David Ferdinand Vles, Chaitanya Krishna Ande, Antonius Franciscus Johannes De Groot, Adrianus Johannes Maria Giesbers, Johannes Joseph Janssen, Paul Janssen, Johan Hendrik Klootwijk, Peter Simon Antonius Knapen, Evgenia Kurganova, Marcel Peter Meijer, Wouter Rogier Meijerink, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Raymond Olsman, Hrishikesh Patel, Mária Péter, Gerrit Van Den Bosch, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, Hendrikus Jan Wondergem, Aleksandar Nikolov Zdravkov
  • Mask assembly
    Patent number: 11009803
    Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Grant
    Filed: September 30, 2019
    Date of Patent: May 18, 2021
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthias Kruizinga, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Erik Willem Bogaart, Derk Servatius Gertruda Brouns, Marc Bruijn, Richard Joseph Bruls, Jeroen Dekkers, Paul Janssen, Mohammad Reza Kamali, Ronald Harm Gunther Kramer, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Matthew Lipson, Erik Roelof Loopstra, Joseph H. Lyons, Stephen Roux, Gerrit Van Den Bosch, Sander Van Den Heijkant, Sandra Van Der Graaf, Frits Van Der Meulen, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge
  • Pellicle attachment apparatus
    Patent number: 11003098
    Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: May 11, 2021
    Assignee: ASML Netherlands B.V
    Inventors: Frits Van Der Meulen, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Derk Servatius Gertruda Brouns, Marc Bruijn, Jeroen Dekkers, Paul Janssen, Ronald Harm Gunther Kramer, Matthias Kruizinga, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Gerrit Van Den Bosch, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Angelo Cesar Peter De Klerk, Jacobus Maria Dings, Maurice Leonardus Johannes Janssen, Roland Jacobus Johannes Kerstens, Martinus Jozef Maria Kester, Michel Loos, Geert Middel, Silvester Matheus Reijnders, Frank Johannes Christiaan Theuerzeit, Anne Johannes Wilhelmus Van Lievenoogen
  • Pellicle attachment apparatus
    Patent number: 10969701
    Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Grant
    Filed: September 16, 2019
    Date of Patent: April 6, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Frits Van Der Meulen, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Derk Servatius Gertruda Brouns, Marc Bruijn, Jeroen Dekkers, Paul Janssen, Ronald Harm Gunther Kramer, Matthias Kruizinga, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Gerrit Van Den Bosch, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Angelo Cesar Peter De Klerk, Jacobus Maria Dings, Maurice Leonardus Johannes Janssen, Roland Jacobus Johannes Kerstens, Martinus Jozef Maria Kester, Michel Loos, Geert Middel, Silvester Matheus Reijnders, Frank Johannes Christiaan Theuerzeit, Anne Johannes Wilhelmus Van Lievenoogen
  • PELLICLE AND PELLICLE ASSEMBLY
    Publication number: 20200209736
    Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.
    Type: Application
    Filed: June 8, 2018
    Publication date: July 2, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: David Ferdinand VLES, Chaitanya Krishna ANDE, Antonius Franciscus Johannes DE GROOT, Adrianus Johannes Maria GIESBERS, Johannes Joseph JANSSEN, Paul JANSSEN, Johan Flendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Marcel Peter MEIJER, Wouter Rogier MEIJERINK, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Raymond OLSMAN, Hrishikesh PATEL, Maria PETER, Gerrit VAN DEN BOSCH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
  • Pellicle Attachment Apparatus
    Publication number: 20200096882
    Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Application
    Filed: November 18, 2019
    Publication date: March 26, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Frits VAN DER MEULEN, Maarten Mathijs Marinus JANSEN, Jorge Manuel AZEREDO LIMA, Derk Servatius Gertruda BROUNS, Marc BRUIJN, Jeroen DEKKERS, Paul JANSSEN, Ronald Harm Gunther KRAMER, Matthias KRUIZINGA, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Erik Roelof LOOPSTRA, Gerrit VAN DEN BOSCH, Jérôme François Sylvain Virgile VAN LOO, Beatrijs Louise Marie-Joseph Katrien VERBRUGGE, Angelo Cesar Peter DE KLERK, Jacobus Maria DINGS, Maurice Leonardus Johannes JANSSEN, Roland Jacobus Johannes KERSTENS, Martinus Jozef Maria KESTERS, Michel LOOS, Geert MIDDEL, Silvester Matheus REIJNDERS, Frank Johannes Christiaan THEUERZEIT, Anne Johannes Wilhelmus VAN LIEVENOOGEN
  • Mask Assembly
    Publication number: 20200057394
    Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Application
    Filed: September 30, 2019
    Publication date: February 20, 2020
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthias KRUIZINGA, Maarten Mathijs Marinus JANSEN, Jorge Manuel AZEREDO LIMA, Erik Willem BOGAART, Derk Servatius Gertruda BROUNS, Marc BRUIJN, Richard Joseph BRULS, Jeroen DEKKERS, Paul JANSSEN, Mohammad Reza KAMALI, Ronald Harm Gunther KRAMER, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Matthew LIPSON, Erik Roelof LOOPSTRA, Joseph H. LYONS, Stephen ROUX, Gerrit VAN DEN BOSCH, Sander VAN DEN HEIJKANT, Sandra VAN DER GRAAF, Frits VAN DER MEULEN, Jérôme François SylvainVirgile VAN LOO, Beatrijs Louis Marie-Joseph Katrien VERBRUGGE
  • Mask assembly
    Patent number: 10558129
    Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: February 11, 2020
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthias Kruizinga, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Erik Willem Bogaart, Derk Servatius Gertruda Brouns, Marc Bruijn, Richard Joseph Bruls, Jeroen Dekkers, Paul Janssen, Mohammad Reza Kamali, Ronald Harm Gunther Kramer, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Matthew Lipson, Erik Roelof Loopstra, Joseph H. Lyons, Stephen Roux, Gerrit Van Den Bosch, Sander Van Den Heijkant, Sandra Van Der Graaf, Frits Van Der Meulen, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge
  • Pellicle attachment apparatus
    Patent number: 10539886
    Abstract: A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: January 21, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Frits Van Der Meulen, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Derk Servatius Gertruda Brouns, Marc Bruijn, Jeroen Dekkers, Paul Janssen, Ronald Harm Gunther Kramer, Matthias Kruizinga, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Gerrit Van Den Bosch, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Angelo Cesar Peter De Klerk, Jacobus Maria Dings, Maurice Leonardus Johannes Janssen, Roland Jacobus Johannes Kerstens, Martinus Jozef Maria Kesters, Michel Loos, Geert Middel, Silvester Matheus Reijnders, Frank Johannes Christiaan Theuerzeit, Anne Johannes Wilhelmus Van Lievenoogen
  • Pellicle Attachment Apparatus
    Publication number: 20200012204
    Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Application
    Filed: September 16, 2019
    Publication date: January 9, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Frits Van Der Meulen, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Derk Servatius Gertruda Brouns, Marc Bruijn, Jeroen Dekkers, Paul Janssen, Ronald Harm, Gunther Kramer, Matthias Kruizinga, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Gerrit Van Den Bosch, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Angelo Cesar Peter De Klerk, Jacobus Maria Dings, Maurice Leonardus Johannes Janssen, Roland Jacobus Johannes Kerstens, Martinus Jozef Maria Kesters, Michel Loos, Geert Middel, Silvester Matheus Reijnders, Frank Johannes Christiaan Theuerzeit, Anne Johannes Wilhelmus Van Lievenoogen
  • Mask Assembly
    Publication number: 20180329314
    Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Application
    Filed: November 16, 2015
    Publication date: November 15, 2018
    Inventors: Matthias KRUIZINGA, Maarten Mathijs Marinus JANSEN, Jorge Manuel AZEREDO LIMA, Erik Willem BOGAART, Derk Servatius Gertruda BROUNS, Marc BRUIJN, Richard Joseph BRULS, Jeroen DEKKERS, Paul JANSSEN, Mohammad Reza KAMALI, Ronald Harm Gunther KRAMER, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Matthew LIPSON, Erik Roelof LOOPSTRA, Joseph H. LYONS, Stephen ROUX, Gerrit VAN DEN BOSCH, Sander VAN DEN HEIJKANT, Sandra VAN DER GRAAF, Frits VAN DER MEULEN, Jérôme François Sylvain Virgile VAN LOO, Beatrijs Louise Marie-Joseph Katrien VERBRUGGE