Patents by Inventor Gerry M. Blumenstock
Gerry M. Blumenstock has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20100176313Abstract: An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material.Type: ApplicationFiled: December 14, 2009Publication date: July 15, 2010Applicant: Cymer, Inc.Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert Bowering, Oleh Khodykin, Curtis L. Rettiq, Gerry M. Blumenstock, Timothy S. Dyer, Rodney D. Simmons, Jerzy R. Hoffman, R. Mark Johnson
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Patent number: 7368741Abstract: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.Type: GrantFiled: April 14, 2005Date of Patent: May 6, 2008Assignee: Cymer, Inc.Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert R. Bowering, Oleh Khodykin, Curtis L. Rettig, Gerry M. Blumenstock, Timothy S. Dyer, Rodney D. Simmons, Jerzy R. Hoffman, R. Mark Johnson
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Patent number: 7291853Abstract: An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis or rotation and an ellipse in another. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members.Type: GrantFiled: July 26, 2006Date of Patent: November 6, 2007Assignee: Cymer, Inc.Inventors: Igor V. Fomenkov, William N. Partlo, Gerry M. Blumenstock, Nortbert Bowering, I. Roger Oliver, Xiaojiang Pan, Rodney D. Simmons
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Patent number: 7217940Abstract: A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.Type: GrantFiled: March 10, 2004Date of Patent: May 15, 2007Assignee: Cymer, Inc.Inventors: William N. Partlo, John Martin Algots, Gerry M. Blumenstock, Norbert Bowering, Alexander I. Ershov, Igor V. Fomenkov, Xiaojiang Pan
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Patent number: 6972421Abstract: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.Type: GrantFiled: April 8, 2003Date of Patent: December 6, 2005Assignee: Cymer, Inc.Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert Bowering, Oleh Khodykin, Curtis L. Rettig, Gerry M. Blumenstock, Timothy S. Dyer, Rodney D. Simmons, Jerzy R. Hoffman, R. Mark Johnson
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Publication number: 20040160155Abstract: An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber.Type: ApplicationFiled: December 18, 2003Publication date: August 19, 2004Inventors: William N. Partlo, Gerry M. Blumenstock, Norbert Bowering, Kent Bruzzone, Dennis Cobb, Timothy S. Dyer, John Dunlop, Igor V. Fomenkov, James Christopher Hysham, I. Roger Oliver, Frederick Palenschat, Xiaojiang Pan, Curtis L. Rettig, Rodney D. Simmons, John Walker, R. Kyle Webb, Thomas Hofmann
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Publication number: 20040108473Abstract: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.Type: ApplicationFiled: April 8, 2003Publication date: June 10, 2004Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert Bowering, Oleh Khodykin, Curtis L. Rettig, Gerry M. Blumenstock, Timothy S. Dyer, Rodney D. Simmons, Jerzy R. Hoffman, R. Mark Johnson