Patents by Inventor Gert-Jan Heerens
Gert-Jan Heerens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20170074090Abstract: The invention relates to a telemetry system for use in a pipe having a wall, comprising a transmitter adapted to generate at least one acoustic wave in a frequency range of about 50-300 kHz, and to inject the acoustic wave in the wall of the pipe, wherein the transmitter is further arranged to binary code information conceived to be transmitted with the acoustic wave. The invention further relates to a pipe comprising the telemetry system, and to a method of transmitting information via a pipe.Type: ApplicationFiled: November 23, 2016Publication date: March 16, 2017Inventors: Arno Willem Frederik Volker, Rik Vos, Gert Jan Heerens
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Publication number: 20140133276Abstract: The invention relates to a telemetry system for use in a pipe having a wall, comprising a transmitter adapted to generate at least one acoustic wave in a frequency range of about 50-300 kHz and to inject the acoustic wave in the wall of the pipe, wherein the transmitter is further arranged to binary code information conceived to be transmitted with the acoustic wave. The invention further related to a pipe comprising the telemetry system and to a method of transmitting information via a pipe.Type: ApplicationFiled: July 6, 2012Publication date: May 15, 2014Applicant: Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNOInventors: Arno Willem Frederik Volker, Rik Vos, Gert Jan Heerens
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Patent number: 8235212Abstract: A mask transport system is configured to transport a mask into and out of a lithographic apparatus. The mask transport system includes a first container configured to shield a top side and a bottom side of the mask. At least a portion of the container is at least partially translucent for radiation having a predetermined wavelength used to detect contamination on the top side or the bottom side of the mask when the mask is shielded by the first container. The mask transport system also includes a second container configured to enclose the first container. The second container includes a first part defining a first opening and an openable cover that covers the first opening. The cover is configured to open and release the first container within the lithographic apparatus or at an interface with the lithographic apparatus.Type: GrantFiled: June 12, 2009Date of Patent: August 7, 2012Assignee: ASML Netherlands B.V.Inventor: Gert-Jan Heerens
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Patent number: 7839489Abstract: A system for use in a lithographic apparatus includes an assembly of a reticle and a reticle holder. The reticle includes a marker. The system also includes a position detector arranged to detect the reticle marker to position the reticle with respect to the reticle holder, and a storage container constructed and arranged to store the assembly during the positioning of the reticle with respect to the reticle holder. The reticle holder and the detector are arranged to be kinematically aligned with respect to each other.Type: GrantFiled: June 15, 2007Date of Patent: November 23, 2010Assignee: ASML Netherlands B.V.Inventors: Gert-Jan Heerens, Bastiaan Lambertus Wilhelmus Marinus Van De Ven
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Patent number: 7781237Abstract: An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.Type: GrantFiled: June 8, 2005Date of Patent: August 24, 2010Assignee: ASML Netherlands B.V.Inventors: Gert-Jan Heerens, Anastasius Jacobus Anicetus Bruinsma, Jacob Fredrik Frisco Klinkhamer, Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Hubert Adriaan Van Mierlo, Willem Arthur Vliegenthart
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Publication number: 20090262327Abstract: A mask transport system is configured to transport a mask into and out of a lithographic apparatus. The mask transport system includes a first container configured to shield a top side and a bottom side of the mask. At least a portion of the container is at least partially translucent for radiation having a predetermined wavelength used to detect contamination on the top side or the bottom side of the mask when the mask is shielded by the first container. The mask transport system also includes a second container configured to enclose the first container. The second container includes a first part defining a first opening and an openable cover that covers the first opening. The cover is configured to open and release the first container within the lithographic apparatus or at an interface with the lithographic apparatus.Type: ApplicationFiled: June 12, 2009Publication date: October 22, 2009Applicant: ASML NETHERLANDS B.V.Inventor: Gert-Jan HEERENS
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Patent number: 7522263Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition an extreme ultraviolet radiation beam, a patterning device configured to impart the extreme ultraviolet radiation beam with a pattern in its cross-section to form a patterned extreme ultraviolet radiation beam, a substrate table constructed to hold a substrate, a projection system provided with reflective optics configured to project the patterned extreme ultraviolet radiation beam onto a target portion of the substrate, a vacuum chamber constructed to create a vacuum environment, and a detection unit arranged within the vacuum chamber to detect contamination on the patterning device.Type: GrantFiled: December 27, 2005Date of Patent: April 21, 2009Assignee: ASML Netherlands B.V.Inventors: Hubert Adriaan Van Mierlo, Gert-Jan Heerens, Hans Meiling, Antonius Gerardus Theodorus Maria Bastein, Jacques Cor Johan Van der Donck, Hedser Van Brug
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Patent number: 7466397Abstract: A lithographic apparatus equipped with a patterning device safety mechanism, is presented herein. In one embodiment, the apparatus comprises an illumination system for providing a beam of radiation, a support structure for supporting a patterning device that serves to impart the beam of radiation with a pattern in its cross-section, a substrate holder for holding a substrate having a plurality of target portions, a projection system for projecting the patterned beam onto the substrate target portions, a connector for securing the patterning device relative to the support structure, and a safety mechanism configured to reduce uncontrolled displacement of the patterning device in case of failure of the connector.Type: GrantFiled: July 20, 2004Date of Patent: December 16, 2008Assignee: ASML Netherlands B.V.Inventors: Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Gert-Jan Heerens
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Patent number: 7423733Abstract: The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.Type: GrantFiled: July 20, 2004Date of Patent: September 9, 2008Assignee: ASML Netherlands B.V.Inventors: Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Gert-Jan Heerens, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra
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Patent number: 7361911Abstract: A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher pressure in the channel than in the substrate compartment and in the optics compartment during the projecting, intercepting particles that emanate from the substrate with the ionized flush gas, pumping the flush gas carrying the intercepted particles from the substrate compartment using a pump coupled to a gas outlet coupled to at least one of the compartments, and establishing an electrical potential difference between a wall of the channel and the outlet and/or a rotor of the pump so that the outlet and/or the rotor of the pump attracts positively charged ions that stem from the flush gas in the channel.Type: GrantFiled: December 9, 2004Date of Patent: April 22, 2008Assignee: ASML Netherlands B.V.Inventors: Johannes Hubertus Josephina Moors, Robertus Nicodemus Jacobus Van Ballegoij, Vadim Yevgenyevich Banine, Gert-Jan Heerens, Frederik Theodorus Elisabeth Heuts, Johannes Henricus Wilhelmus Jacobs, Paulus Martinus Maria Liebregts, Hendrik Antony Johannes Neerhof
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Patent number: 7306680Abstract: A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface.Type: GrantFiled: September 10, 2003Date of Patent: December 11, 2007Assignee: ASML Netherlands B.V.Inventor: Gert-Jan Heerens
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Publication number: 20070247609Abstract: A system for use in a lithographic apparatus includes an assembly of a reticle and a reticle holder. The reticle includes a marker. The system also includes a position detector arranged to detect the reticle marker to position the reticle with respect to the reticle holder, and a storage container constructed and arranged to store the assembly during the positioning of the reticle with respect to the reticle holder. The reticle holder and the detector are arranged to be kinematically aligned with respect to each other.Type: ApplicationFiled: June 15, 2007Publication date: October 25, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Gert-Jan Heerens, Bastiaan Lambertus Van De Ven
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Patent number: 7248340Abstract: A transport box for transporting a lithographic patterning device and a lithographic apparatus adapted to cooperate with the transport box are presented. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also includes a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box.Type: GrantFiled: June 24, 2004Date of Patent: July 24, 2007Assignee: ASML Netherlands B.V.Inventors: Erik Leonardus Ham, Robert Gabriël Maria Lansbergen, Ellart Alexander Meijer, Hendricus Johannes Maria Meijer, Hans Meiling, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors, Gert-Jan Heerens
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Publication number: 20070159616Abstract: The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.Type: ApplicationFiled: July 20, 2004Publication date: July 12, 2007Applicant: ASML Netherlands B.V.Inventors: Bastiaan Lambertus Van De Ven, Gert-Jan Heerens, Robert Lansbergen, Martinus Leenders, Erik Loopstra
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Publication number: 20070146657Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition an extreme ultraviolet radiation beam, a patterning device configured to impart the extreme ultraviolet radiation beam with a pattern in its cross-section to form a patterned extreme ultraviolet radiation beam, a substrate table constructed to hold a substrate, a projection system provided with reflective optics configured to project the patterned extreme ultraviolet radiation beam onto a target portion of the substrate, a vacuum chamber constructed to create a vacuum environment, and a detection unit arranged within the vacuum chamber to detect contamination on the patterning device.Type: ApplicationFiled: December 27, 2005Publication date: June 28, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Hubert Mierlo, Gert-Jan Heerens, Hans Meiling, Antonius Theodorus Maria Bastein, Jacques Donck, Hedser Brug
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Publication number: 20070146658Abstract: A lithographic apparatus is disclosed. The apparatus includes a patterning device that is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a cleaning unit arranged to clean the patterning device in-situ, and/or a detection unit arranged to detect contamination of the patterning device in-situ.Type: ApplicationFiled: December 27, 2005Publication date: June 28, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Hubert Van Mierlo, Gert-Jan Heerens, Hans Meiling, Antonius Gerardus Maria Bastein, Jacques Cor Der Donck
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Patent number: 7236233Abstract: An assembly for use in a lithographic apparatus is disclosed. The assembly includes a reticle, and a reticle holder. The reticle holder is adjustable between a form closed reticle blocking state and a reticle releasing state. The reticle holder is arranged to (1) prevent movement of the reticle with respect to the reticle holder in at least one direction without friction when the reticle holder is in the form closed reticle blocking state, and (2) release the reticle when the reticle holder is in the reticle releasing state.Type: GrantFiled: October 13, 2004Date of Patent: June 26, 2007Assignee: ASML Netherlands B.V.Inventors: Gert-Jan Heerens, Bastiaan Lambertus Wilhelmus Marinus Van De Ven
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Publication number: 20070117028Abstract: A mask for use in a lithographic projection apparatus comprises three brackets arranged on the circumference of the mask. The brackets are provided with grooves directed to a common imaginary point and are intend to cooperate with three pins provided on a mask gripper present in a mask handling apparatus or device. Preferably, the pins are provided with a rounded top for insertion in associated grooves of the brackets to provide a kinematically-determined mechanical position of the mask on the gripper.Type: ApplicationFiled: November 15, 2006Publication date: May 24, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Gert-Jan Heerens, Erik Ham, Bastiaan Wilhelmus Marinus Van De Ven
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Patent number: 7202934Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.Type: GrantFiled: December 20, 2004Date of Patent: April 10, 2007Assignee: ASML Netherlands B.V.Inventors: Johannes Hubertus Josephina Moors, Erik Leonardus Ham, Gert-Jan Heerens, Paulus Martinus Maria Liebregts, Erik Roelof Loopstra, Henri Gerard Cato Werij
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Patent number: 7151589Abstract: According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.Type: GrantFiled: October 26, 2004Date of Patent: December 19, 2006Assignee: ASML Netherlands B.V.Inventors: Erik Leonardus Ham, Gert-Jan Heerens, Robert Gabriël Maria Lansbergen, Ellard Alexander Meijer, Hendricus Johannes Maria Meijer, Hans Meiling, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors