Patents by Inventor Gertjan ZWARTJES

Gertjan ZWARTJES has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process based metrology target design
    Patent number: 10296681
    Abstract: Methods and systems for automatically generating robust metrology targets which can accommodate a variety of lithography processes and process perturbations. Individual steps of an overall lithography process are modeled into a single process sequence to simulate the physical substrate processing. That process sequence drives the creation of a three-dimensional device geometry as a whole, rather than “building” the device geometry element-by-element.
    Type: Grant
    Filed: May 17, 2018
    Date of Patent: May 21, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Guangqing Chen, Shufeng Bai, Eric Richard Kent, Yen-Wen Lu, Paul Anthony Tuffy, Jen-Shiang Wang, Youping Zhang, Gertjan Zwartjes, Jan Wouter Bijlsma
  • PROCESS BASED METROLOGY TARGET DESIGN
    Publication number: 20180268093
    Abstract: Methods and systems for automatically generating robust metrology targets which can accommodate a variety of lithography processes and process perturbations. Individual steps of an overall lithography process are modeled into a single process sequence to simulate the physical substrate processing. That process sequence drives the creation of a three-dimensional device geometry as a whole, rather than “building” the device geometry element-by-element.
    Type: Application
    Filed: May 17, 2018
    Publication date: September 20, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Guangqing CHEN, Shufeng Bai, Eric Richard Kent, Yen-Wen Lu, Paul Anthony Tuffy, Jen-Shiang Wang, Youping Zhang, Gertjan Zwartjes, Jan Wouter Bijlsma
  • Process based metrology target design
    Patent number: 10007744
    Abstract: Methods and systems for automatically generating robust metrology targets which can accommodate a variety of lithography processes and process perturbations. Individual steps of an overall lithography process are modeled into a single process sequence to simulate the physical substrate processing. That process sequence drives the creation of a three-dimensional device geometry as a whole, rather than “building” the device geometry element-by-element.
    Type: Grant
    Filed: November 13, 2015
    Date of Patent: June 26, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Guangqing Chen, Shufeng Bai, Eric Richard Kent, Yen-Wen Lu, Paul Anthony Tuffy, Jen-Shiang Wang, Youping Zhang, Gertjan Zwartjes, Jan Wouter Bijlsma
  • PROCESS BASED METROLOGY TARGET DESIGN
    Publication number: 20160140267
    Abstract: Methods and systems for automatically generating robust metrology targets which can accommodate a variety of lithography processes and process perturbations. Individual steps of an overall lithography process are modeled into a single process sequence to simulate the physical substrate processing. That process sequence drives the creation of a three-dimensional device geometry as a whole, rather than “building” the device geometry element-by-element.
    Type: Application
    Filed: November 13, 2015
    Publication date: May 19, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Guangqing CHEN, Shufeng BAI, Eric Richard KENT, Yen-Wen LU, Paul Anthony TUFFY, Jen-Shiang WANG, Youping ZHANG, Gertjan ZWARTJES, Jan Wouter BIJLSMA