Patents by Inventor Geun-Jong Yu

Geun-Jong Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Monomer, polymer and composition for photoresist
    Patent number: 7604919
    Abstract: The photoresist monomer including an oxime group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula. In Formula, R* is independently a hydrogen or a methyl group, and R is a substituted or unsubstituted C1˜C25 alkyl group with or without an ether group, or a substituted or unsubstituted C4˜C25 hydrocarbon group including an aryl group, a heteroaryl group, a cycloalkyl group or a multicycloalkyl group with or without an ether group, a ketone group or a sulfur.
    Type: Grant
    Filed: September 10, 2007
    Date of Patent: October 20, 2009
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Deog-Bae Kim, Jung-Youl Lee, Geun-Jong Yu, Sang-Jung Kim, Jae-Woo Lee, Jae-Hyun Kim
  • Monomer having sulfonyl group, polymer thereof and photoresist composition including the same
    Patent number: 7569325
    Abstract: A photoresist monomer having a sulfonyl group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula. wherein, R* is a hydrogen atom or a methyl group, R1 and R2 are independently a C1˜C20 alkyl group, a C4˜C20 cycloalkyl group, a C6˜C20 aryl group or a C7˜C20 arylalkyl group, one of R1 and R2 may not exist, and R1 and R2 can be connected to form a ring.
    Type: Grant
    Filed: October 24, 2007
    Date of Patent: August 4, 2009
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Jung-Youl Lee, Geun-Jong Yu, Sang-Jung Kim, Jae-Woo Lee, Deog-Bae Kim, Jae-Hyun Kim
  • MONOMER HAVING SULFONYL GROUP, POLYMER THEREOF AND PHOTORESIST COMPOSITION INCLUDING THE SAME
    Publication number: 20080102402
    Abstract: A photoresist monomer having a sulfonyl group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula. wherein, R* is a hydrogen atom or a methyl group, R1 and R2 are independently a C1˜C20 alkyl group, a C4˜C20 cycloalkyl group, a C6˜C20 aryl group or a C7˜C20 arylalkyl group, one of R1 and R2 may not exist, and R1 and R2 can be connected to form a ring.
    Type: Application
    Filed: October 24, 2007
    Publication date: May 1, 2008
    Inventors: Jung-Youl LEE, Geun-Jong Yu, Sang-Jung Kim, Jae-Woo Lee, Deog-Bae Kim, Jae-Hyun Kim
  • MONOMER, POLYMER AND COMPOSITION FOR PHOTORESIST
    Publication number: 20080070161
    Abstract: The photoresist monomer including an oxime group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula. In Formula, R* is independently a hydrogen or a methyl group, and R is a substituted or unsubstituted C1˜C25 alkyl group with or without an ether group, or a substituted or unsubstituted C4˜C25 hydrocarbon group including an aryl group, a heteroaryl group, a cycloalkyl group or a multicycloalkyl group with or without an ether group, a ketone group or a sulfur.
    Type: Application
    Filed: September 10, 2007
    Publication date: March 20, 2008
    Inventors: Deog-Bae Kim, Jung-Youl Lee, Geun-Jong Yu, Sang-Jung Kim, Jae-Woo Lee, Jae-Hyun Kim