Patents by Inventor Geun-soo Lee

Geun-soo Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240093338
    Abstract: The present disclosure relates to a healable superplastic amorphous alloy, and specifically, to a healable superplastic amorphous alloy capable of exhibiting superplastic behavior and unique healable behavior by maximizing the complexity of the amorphous structure for an Icosahedral quenched-in nuclei quasi-crystal cluster to be formed in the amorphous matrix through the composition limitation and additive element control of Zr—Cu—Ni—Al alloy.
    Type: Application
    Filed: January 16, 2023
    Publication date: March 21, 2024
    Inventors: Eun Soo PARK, Geun Hee YOO, Wook Ha RYU, Myeong Jun LEE, Min Kyung KWAK
  • Publication number: 20240039357
    Abstract: Proposed is an electric compressor for a vehicle configured such that an electrical connection structure between a winding coil of an electric motor and a sealing terminal that connects an inverter unit to the electric motor is improved, thereby being capable of increasing assemblability of a product and reducing a production cost. The electric compressor includes an electric motor provided with a stator, a rotor, and a rotary shaft, a compression unit configured to compress a refrigerant according to a rotation of the rotary shaft, an inverter configured to control driving of the electric motor, a sealing terminal electrically connecting the electric motor to the inverter, and a cluster integrally formed on a portion of the stator, the cluster having an inner portion thereof provided with multiple connection terminals for electrically connecting a coil wound on the stator to multiple connection pins provided at the sealing terminal.
    Type: Application
    Filed: December 3, 2021
    Publication date: February 1, 2024
    Applicant: ESTRA AUTOMOTIVE SYSTEMS CO., LTD.
    Inventor: Geun Soo LEE
  • Patent number: 7442738
    Abstract: Disclosed is a barrier rib forming composition for manufacturing a plasma display panel which is capable of hydrogen bonding, and contains a mixed solvent including a second solvent with a high boiling point and a low vapor pressure to enable rapid formation of barrier ribs. The barrier rib forming composition for manufacturing a plasma display panel comprises: 500 g of ceramic powder, 50 to 70 g of acryl resin, 15 to 25 g of plasticizer and 100 to 140 g of a mixed solvent of a second solvent, capable of hydrogen bonding and having a high boiling point and a low vapor pressure, and toluene.
    Type: Grant
    Filed: July 21, 2005
    Date of Patent: October 28, 2008
    Assignee: LG Electronics Inc.
    Inventors: Jin Seok Kim, Jae Ho Choi, Geun Soo Lee, Buung Cheol Kim
  • Patent number: 7198887
    Abstract: Disclosed are an organic anti-reflective coating polymer having a structure represented by the following formula I, its preparation method and an organic anti-reflective coating composition with respect to an ultra-fine pattern formation process of the photoresist for photolithography technique using ArF light source with a wavelength of 193 nm or VUV light source with a wavelength of 157 nm. An organic anti-reflective coating polymer capable of protecting a photoresist from amines in the atmosphere to minimize the post exposure delay effect after exposure to light and, at the same time, enhances notching status, such as, a pattern distortion caused by diffused reflection, and reducing reflection rate to minimize the swing effect. wherein m is an integer ranging from 5 to 5000.
    Type: Grant
    Filed: March 29, 2004
    Date of Patent: April 3, 2007
    Assignee: Hynix Semiconductor Inc.
    Inventors: Geun-soo Lee, Cheol-kyu Bok, Seung-chan Moon, Ki-soo Shin, Won-wook Lee
  • Publication number: 20050014089
    Abstract: Disclosed are an organic anti-reflective coating polymer having a structure represented by the following formula I, its preparation method and an organic anti-reflective coating composition with respect to an ultra-fine pattern formation process of the photoresist for photolithography technique using ArF light source with a wavelength of 193 nm or VUV light source with a wavelength of 157 nm. An organic anti-reflective coating polymer capable of protecting a photoresist from amines in the atmosphere to minimize the post exposure delay effect after exposure to light and, at the same time, enhances notching status, such as, a pattern distortion caused by diffused reflection, and reducing reflection rate to minimize the swing effect. wherein m is an integer ranging from 5 to 5000.
    Type: Application
    Filed: March 29, 2004
    Publication date: January 20, 2005
    Inventors: Geun-soo Lee, Cheol-kyu Bok, Seung-chan Moon, Ki-soo Shin, Won-wook Lee
  • Publication number: 20010005187
    Abstract: An address driving method of a plasma display panel that permits a stable high-speed addressing. Tn the method, a data pulse is applied to an address electrode and applying a scanning pulse to a scanning electrode, to thereby generating an address discharge in the selected cell. Also, an auxiliary pulse is to an auxiliary electrode parallel to the address electrode, to thereby generating an auxiliary discharge. Accordingly, the auxiliary discharge is used to largely shorten a discharge delay time, thereby permitting a high-speed addressing. Also, the auxiliary pulse having the same polarity as the data pulse is applied to prevent an erroneous discharge between the auxiliary electrode and the data electrode.
    Type: Application
    Filed: December 1, 2000
    Publication date: June 28, 2001
    Inventor: Geun Soo Lee