Patents by Inventor Ghislaine Seiberras

Ghislaine Seiberras has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chemical vapor deposition apparatus activated by a microwave plasma
    Patent number: 5603771
    Abstract: Apparatus for plasma activated chemical vapor deposition, the apparatus comprising a microwave-excited plasma reactor with a reaction enclosure (10), a microwave generator (20), a waveguide (21) providing non-resonant coupling, and insertion means (40-54) for inserting at least one flow of a predetermined gaseous mixture into the enclosure; the insertion means comprise, in order: transformation means (40-43) for transforming the state of a precursor of a material to be deposited to bring it to the gaseous state, feed means (41, 42) for feeding a vector gas suitable for being charged with the gaseous precursor to constitute the above-mentioned predetermined gaseous mixture; and injection means (18) for injecting the predetermined gaseous mixture into the enclosure (10) and comprising an externally frustoconical nozzle provided with an injection orifice situated at one end and shaped as a function of the injection orifice and of the column configuration of the plasma formed, said nozzle having means for heating
    Type: Grant
    Filed: March 23, 1995
    Date of Patent: February 18, 1997
    Assignee: Office National d'Etudes et de Recherches Aerospatiales
    Inventors: Ghislaine Seiberras, Claude Indrigo, Remy Mevrel, Philippe LePrince, Michel Bejet, Claude Le Pennec