Patents by Inventor Gi-Hong Kim

Gi-Hong Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210082701
    Abstract: A process of realizing a silicon micropattern having a large aspect ratio in a semiconductor-manufacturing process, and a novel wet etching method that includes treating an organic carbon film layer so that a hydrofluoric-acid-resistant material is selectively attached to the organic carbon film layer and then wet etching the same using an aqueous solution containing hydrofluoric acid, thus forming a pattern, are proposed. In the method of forming the pattern by wet etching, etching is performed so that an active region having a depth of several ?m in an object to be etched is not damaged when a pattern having a small CD is formed, thereby exhibiting an effect of providing a method of forming a micropattern.
    Type: Application
    Filed: January 9, 2019
    Publication date: March 18, 2021
    Inventors: Su Jin LEE, Gi Hong KIM, Seung Hun LEE
  • Publication number: 20210063887
    Abstract: An extreme ultraviolet (EUV) developer composition for use in manufacturing a semiconductor is provided. More particularly an EUV developer composition for forming a fine pattern is provided, which is capable of forming a more uniform pattern and lowering EOP in a development process, the EUV developer composition including a water-soluble polymer represented by Chemical Formula 1, a nonionic surfactant represented by Chemical Formula 2, and an alkali compound.
    Type: Application
    Filed: March 22, 2018
    Publication date: March 4, 2021
    Inventors: Su Jin LEE, Gi Hong KIM, Seung Hun LEE, Seung Hyun LEE
  • Publication number: 20200363724
    Abstract: A photoresist developer composition for an EUV (extreme ultraviolet) light source in a semiconductor-manufacturing process is proposed. Further, the photoresist developer composition for an EUV light source for forming a micropattern and a lithography process of forming a pattern on a semiconductor substrate using an EUV light source using the composition are proposed. The composition includes an aqueous solution containing 2 to 10 wt % of tetraethylammonium hydroxide (TEAH). When a photoresist is developed, an Eop is reduced, which shortens a process time, prevents a pattern from collapsing, and enables a pattern to have a uniform profile.
    Type: Application
    Filed: January 9, 2019
    Publication date: November 19, 2020
    Inventors: Su Jin LEE, Gi Hong KIM, Seung Hun LEE
  • Publication number: 20200183284
    Abstract: The present invention relates to a method of reducing the LWR (Line Width Roughness) of a photoresist pattern using a negative tone photoresist during the fabrication of a semiconductor, and more specifically to a composition capable of reducing LWR in order to ensure a higher pattern CDU after a negative tone development process, and a processing method using the composition, thus reducing the LWR, thereby providing better CDU than existing methods.
    Type: Application
    Filed: April 26, 2017
    Publication date: June 11, 2020
    Inventors: Su Jin LEE, Gi Hong KIM, Seung Hun LEE, Seung Hyun LEE
  • Publication number: 20200110339
    Abstract: Provided is a composition for shrinking a photoresist pattern, which is capable of shrinking a photoresist pattern using a photoresist during the fabrication of a semiconductor, and to a method of shrinking a pattern using the composition, whereby a pattern to be formed can be shrunken in a photoresist-patterning process, thus remarkably decreasing the number of steps of a semiconductor fabrication process and reducing the fabrication time and costs.
    Type: Application
    Filed: June 20, 2017
    Publication date: April 9, 2020
    Inventors: Seung Hun LEE, Seung Hyun LEE, Su Jin LEE, Gi Hong KIM
  • Publication number: 20190258163
    Abstract: Provided is a hard mask composition having high etching resistance suitable for use in a semiconductor lithography process, and particularly to a spin-on hard mask composition including a dibenzo carbazole polymer and to a patterning method of forming a hard mask layer by applying the composition on an etching layer through spin coating and performing a baking process. The hard mask according to the present invention has effects of exhibiting high solubility and superior mechanical properties, as well as high etching resistance to withstand multiple etching processes.
    Type: Application
    Filed: October 12, 2017
    Publication date: August 22, 2019
    Inventors: Gi Hong KIM, Su Jin LEE, Seung Hyun LEE, Seung Hun LEE
  • Publication number: 20190137880
    Abstract: The present invention relates to a method of reducing the LWR (Line Width Roughness) of a photoresist pattern using a negative tone photoresist during the fabrication of a semiconductor, and more specifically to a composition capable of reducing LWR in order to ensure a higher pattern CDU after a negative tone development process, and a processing method using the composition, thus reducing the LWR, thereby providing better CDU than existing methods.
    Type: Application
    Filed: April 26, 2017
    Publication date: May 9, 2019
    Applicant: YOUNG CHANG CHEMICAL CO., LTD
    Inventors: Su Jin LEE, Gi Hong KIM, Seung Hun LEE, Seung Hyun LEE
  • Patent number: 10235934
    Abstract: Discussed are an organic light emitting display panel and an organic light emitting display device including the same, which allows a uniform current to flow in a plurality of driving power lines, thereby reducing consumption power. The organic light emitting display panel can include first to mth gate lines and first to nth data lines configured to define a plurality of pixel areas by intersections therebetween, a plurality of color pixels respectively provided in the plurality of pixel areas, and a plurality of driving power lines. Each of the plurality power lines is shared by two color pixels which are adjacent to each other in a first direction corresponding to a length direction of the first to mth gate lines. Two color pixels, which are adjacent to each other in a second direction corresponding to a length direction of the plurality of driving power lines, have different colors.
    Type: Grant
    Filed: November 12, 2014
    Date of Patent: March 19, 2019
    Assignee: LG DISPLAY CO., LTD.
    Inventors: Dong Kyun Woo, Gi-Hong Kim
  • Patent number: 10113038
    Abstract: The present invention relates to a thermoplastic resin composition for an exterior material, and a molded product using the same, the composition containing a thermoplastic resin and at least two types of cellulose-based fibers, wherein 0.1-5 parts by weight of the cellulose-based fibers are contained on the basis of 100 parts by weight of the thermoplastic resin.
    Type: Grant
    Filed: June 26, 2015
    Date of Patent: October 30, 2018
    Assignee: Lotte Advanced Materials Co., Ltd.
    Inventors: Min Ji Ju, Yun Jin Choi, Soo Kyung Kahng, Gi Hong Kim, Dong Hee Kim
  • Publication number: 20180142071
    Abstract: The present invention relates to a thermoplastic resin composition for an exterior material, and a molded product using the same, the composition containing a thermoplastic resin and at least two types of cellulose-based fibers, wherein 0.1-5 parts by weight of the cellulose-based fibers are contained on the basis of 100 parts by weight of the thermoplastic resin.
    Type: Application
    Filed: June 26, 2015
    Publication date: May 24, 2018
    Inventors: Min Ji JU, Yun Jin CHOI, Soo Kyung KAHNG, Gi Hong KIM, Dong Hee KIM
  • Patent number: 9884970
    Abstract: Disclosed herein is a coating composition for preventing the collapse of a capacitor, comprising a silane compound or a phosphorus compound. The coating composition can adjust a contact angle with regard to water on a substrate, thereby preventing the collapse of capacitor patterns on the substrate.
    Type: Grant
    Filed: December 10, 2013
    Date of Patent: February 6, 2018
    Assignee: YOUNG CHANG CHEMICAL CO., LTD
    Inventors: Su Jin Lee, Gi Hong Kim, Seung Hun Lee
  • Patent number: 9653143
    Abstract: Apparatuses, memory section control circuits, and methods of refreshing memory are disclosed. An example apparatus includes a plurality of memory sections and a plurality of memory section control circuits. Each memory section control circuit is coupled to a respective one of the plurality of memory sections and includes a plurality of access line drivers, each of which includes a plurality of transistors having common coupled gates. During an operation of the apparatus a first voltage is provided to the commonly coupled gates of the transistors of at least some of the access line drivers of the memory section control circuit coupled to an active memory section and a second voltage is provided to the commonly coupled gates of the transistors of the access line drivers of the memory section control circuit coupled to an inactive memory section control circuit, wherein the first voltage is greater than the second voltage.
    Type: Grant
    Filed: June 1, 2016
    Date of Patent: May 16, 2017
    Assignee: Micron Technology, Inc.
    Inventors: John David Porter, Gi-Hong Kim
  • Patent number: 9570009
    Abstract: A pixel circuit of a display device, an organic light emitting display device and a method for driving the same are discussed. The pixel circuit of the display device in one example includes an organic light emitting device emitting light through a current; a driving transistor controlling the current flowing in the organic light emitting device; a first capacitor connected between gate and source electrodes of the driving transistor; a second capacitor in which a data voltage is previously stored; and a switching unit charging the data voltage, which is stored in the second capacitor, in the first capacitor, and allowing the organic light emitting device to emit light by driving the driving transistor in accordance with the data voltage charged in the first capacitor and at the same time charging a data voltage of next frame in the second capacitor.
    Type: Grant
    Filed: December 3, 2014
    Date of Patent: February 14, 2017
    Assignee: LG Display Co., Ltd.
    Inventors: Dong Kyun Woo, Gi-Hong Kim
  • Publication number: 20160276017
    Abstract: Apparatuses, memory section control circuits, and methods of refreshing memory are disclosed. An example apparatus includes a plurality of memory sections and a plurality of memory section control circuits. Each memory section control circuit is coupled to a respective one of the plurality of memory sections and includes a plurality of access line drivers, each of which includes a plurality of transistors having common coupled gates. During an operation of the apparatus a first voltage is provided to the commonly coupled gates of the transistors of at least some of the access line drivers of the memory section control circuit coupled to an active memory section and a second voltage is provided to the commonly coupled gates of the transistors of the access line drivers of the memory section control circuit coupled to an inactive memory section control circuit, wherein the first voltage is greater than the second voltage.
    Type: Application
    Filed: June 1, 2016
    Publication date: September 22, 2016
    Applicant: MICRON TECHNOLOGY, INC.
    Inventors: John David Porter, Gi-Hong Kim
  • Patent number: 9418592
    Abstract: An organic light emitting display device includes: an organic light emitting display panel configured to include a plurality of power lines, a plurality of scan lines and a plurality of data lines; a power supplier configured to apply a reference voltage to the power lines; and a controller configured to apply at least one control signal to the power supplier. The reference voltage is gradually varied along the distance from the power supplier.
    Type: Grant
    Filed: November 8, 2013
    Date of Patent: August 16, 2016
    Assignee: LG DISPLAY CO., LTD.
    Inventors: Kyoung Won Min, Gi Hong Kim
  • Patent number: 9368184
    Abstract: Apparatuses, memory section control circuits, and methods of refreshing memory are disclosed. An example apparatus includes a plurality of memory sections and a plurality of memory section control circuits. Each memory section control circuit is coupled to a respective one of the plurality of memory sections and includes a plurality of access line drivers, each of which includes a plurality of transistors having common coupled gates. During an operation of the apparatus a first voltage is provided to the commonly coupled gates of the transistors of at least some of the access line drivers of the memory section control circuit coupled to an active memory section and a second voltage is provided to the commonly coupled gates of the transistors of the access line drivers of the memory section control circuit coupled to an inactive memory section control circuit, wherein the first voltage is greater than the second voltage.
    Type: Grant
    Filed: October 3, 2014
    Date of Patent: June 14, 2016
    Assignee: Micron Technology, Inc.
    Inventors: John David Porter, Gi-Hong Kim
  • Patent number: 9207733
    Abstract: A data buffer system includes a plurality of data buffer modules and a plurality of switching units. The data buffer module is configured for buffering a corresponding data signal. The data buffer module includes a plurality of buffers. The buffers are electrically coupled in series. The switching unit is configured for supplying power to the corresponding buffer in accordance with a regulated voltage. Each of the switching units is electrically coupled between the corresponding one of the buffers and the supply voltage. A power control method for a data buffer system is also provided.
    Type: Grant
    Filed: August 7, 2013
    Date of Patent: December 8, 2015
    Assignee: NANYA TECHNOLOGY CORPORATION
    Inventor: Gi-Hong Kim
  • Publication number: 20150316991
    Abstract: A motion recognition method includes: a light detecting step of detecting light reflected by the reflective body to measure a luminous intensity of the light by the light receiving element; a first coordinate setting step of setting a planar coordinate (X1, Y1) of the reflective body; a second coordinate setting step of setting a planar coordinate (X2, Y2) of the reflective body; and a direction determining step of obtaining an angle (?) between a line segment connecting the origin and the planar coordinate (X1, Y1) in the first position and a line segment connecting the planar coordinate (X1, Y1) in the first position and the planar coordinate (X2, Y2) in the second position and determining that the reflective body moves in a direction passing through a ½ point of the angle (?) in the first position by the data processing unit.
    Type: Application
    Filed: November 29, 2013
    Publication date: November 5, 2015
    Inventors: He Won JUNG, Gi Hong KIM
  • Patent number: 9170653
    Abstract: A motion recognition method includes: a light detecting step of detecting light reflected by the reflective body to measure a luminous intensity of the light by the light receiving element; a first coordinate setting step of setting a planar coordinate (X1, Y1) of the reflective body; a second coordinate setting step of setting a planar coordinate (X2, Y2) of the reflective body; and a direction determining step of obtaining an angle (?) between a line segment connecting the origin and the planar coordinate (X1, Y1) in the first position and a line segment connecting the planar coordinate (X1, Y1) in the first position and the planar coordinate (X2, Y2) in the second position and determining that the reflective body moves in a direction passing through a ½ point of the angle (?) in the first position by the data processing unit.
    Type: Grant
    Filed: November 29, 2013
    Date of Patent: October 27, 2015
    Assignee: HYSONIC CO., LTD.
    Inventors: He Won Jung, Gi Hong Kim
  • Publication number: 20150274991
    Abstract: Disclosed herein is a coating composition for preventing the collapse of a capacitor, comprising a silane compound or a phosphorus compound. The coating composition can adjust a contact angle with regard to water on a substrate, thereby preventing the collapse of capacitor patterns on the substrate.
    Type: Application
    Filed: December 10, 2013
    Publication date: October 1, 2015
    Applicant: YOUNG CHANG CHEMICAL CO., LTD
    Inventors: Su Jin Lee, Gi Hong Kim, Seung Hoon Lee