Patents by Inventor Gi Yi

Gi Yi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080026217
    Abstract: The present invention provides a photochromic nanoparticle having a core-shell structure comprising (a) a polymer nano particle having a mean diameter controlled in a range of 10˜150 nm and containing a photochromic dye; and (b) a silicate inorganic polymer layer enveloping the polymer nanoparticle, and a method for preparing the same. The photochromic nanoparticle according to the present invention has structural and physical stability continuously in a long term and has transparency because of low light scattering, so that it can be applied to optical products.
    Type: Application
    Filed: December 1, 2006
    Publication date: January 31, 2008
    Inventors: Hye Kim, Gi Yi, Sung Lim, Young Hong, Kyung Lee, Yang Jeong, Hyun Ha
  • Publication number: 20070132058
    Abstract: Disclosed is an adjuvant for use in simultaneous polishing of a cationically charged material and an anionically charged material, which forms an adsorption layer on the cationically charged material in order to increase polishing selectivity of the anionically charged material, wherein the adjuvant comprises a polyelectrolyte salt containing: (a) a mixture of a linear polyelectrolyte having a weight average molecular weight of 2,000˜50,000 with a graft type polyelectrolyte that has a weight average molecular weight of 1,000˜20,000 and comprises a backbone and a side chain; and (b) a basic material. CMP (chemical mechanical polishing) slurry comprising the above adjuvant and abrasive particles is also disclosed.
    Type: Application
    Filed: December 6, 2006
    Publication date: June 14, 2007
    Inventors: Gi Yi, Jong Kim, Jung Lee, Kwang Moon, Chang Ko, Soon Jang, Seung Cho, Young Hong
  • Publication number: 20060141741
    Abstract: Disclosed is an adjuvant for use in simultaneous polishing of a cationically charged material and an anionically charged material, which forms a adsorption layer on the cationically charged material in order to increase the polishing selectivity of the anionically charged material to cationically charged material, wherein the adjuvant comprises a polyelectrolyte salt containing: (a) a graft type polyelectrolyte that has a weight average molecular weight of 1,000˜20,000 and comprises a backbone and a side chain; and (b) a basic material. CMP (chemical mechanical polishing) slurry comprising the above adjuvant and abrasive particles is also disclosed.
    Type: Application
    Filed: December 28, 2005
    Publication date: June 29, 2006
    Inventors: Gi Yi, Jong Kim, Jung Hee Lee, Jeong Jin Hong, Young Jun Hong, No Ma Kim, An Na Lee