Patents by Inventor Gi-Yong Nam

Gi-Yong Nam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ETCHING COMPOSITION FOR THIN FILM CONTAINING SILVER, METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING A DISPLAY DEVICE USING THE SAME
    Publication number: 20230220280
    Abstract: An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.
    Type: Application
    Filed: March 17, 2023
    Publication date: July 13, 2023
    Inventors: JONGHEE PARK, HYOUNG SIK KIM, O Byoung Kwon, Gi-Yong Nam, Kyungchan Min, SUCK JUN LEE, YOUNGMIN KIM, JINHYUNG KIM, DONGHUN LEE, KYU-HUN LIM, DONGMIN JANG
  • Etching composition for thin film containing silver, method for forming pattern and method for manufacturing a display device using the same
    Patent number: 11639470
    Abstract: An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.
    Type: Grant
    Filed: July 29, 2021
    Date of Patent: May 2, 2023
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jonghee Park, Hyoung Sik Kim, O Byoung Kwon, Gi-Yong Nam, Kyungchan Min, Suck Jun Lee, Youngmin Kim, Jinhyung Kim, Donghun Lee, Kyu-Hun Lim, Dongmin Jang
  • ETCHING COMPOSITION FOR THIN FILM CONTAINING SILVER, METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING A DISPLAY DEVICE USING THE SAME
    Publication number: 20220204846
    Abstract: An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.
    Type: Application
    Filed: July 29, 2021
    Publication date: June 30, 2022
    Inventors: JONGHEE PARK, HYOUNG SIK KIM, O Byoung Kwon, Gi-Yong Nam, Kyungchan Min, SUCK JUN LEE, YOUNGMIN KIM, JINHYUNG KIM, DONGHUN LEE, KYU-HUN LIM, DONGMIN JANG
  • Etchant and method for manufacturing display device using the same
    Patent number: 10636666
    Abstract: An etchant includes about 8 wt % to about 12 wt % of nitric acid, about 3 wt % to about 8 wt % of alkylsulfonic acid, about 7 wt % to about 12 wt % of a sulfate, about 40 wt % to about 55 wt % of an organic acid, about 0.5 wt % to about 5 wt % of an organic acid salt, and a balance of water.
    Type: Grant
    Filed: October 10, 2019
    Date of Patent: April 28, 2020
    Assignees: SAMSUNG DISPLAY CO., LTD., DONGWOO FINE-CHEM CO., LTD.
    Inventors: Jong Hee Park, Gi Yong Nam, Jin Seock Kim, Ki Tae Kim, Won Ho Lee, Young-Jin Yoon, Young-Chul Park
  • ETCHANT AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME
    Publication number: 20200115631
    Abstract: An etchant includes about 8 wt % to about 12 wt % of nitric acid, about 3 wt % to about 8 wt % of alkylsulfonic acid, about 7 wt % to about 12 wt % of a sulfate, about 40 wt % to about 55 wt % of an organic acid, about 0.5 wt % to about 5 wt % of an organic acid salt, and a balance of water.
    Type: Application
    Filed: October 10, 2019
    Publication date: April 16, 2020
    Inventors: Jong Hee PARK, Gi Yong NAM, Jin Seock KIM, Ki Tae KIM, Won Ho LEE, Young-Jin YOON, Young-Chul PARK
  • Etchant and method of manufacturing display device by using the same
    Patent number: 9741827
    Abstract: An etchant composition is provided comprising a persulfate from 0.5 to 20 wt %; a fluoride compound from 0.01 to 2 wt %; an inorganic acid from 1 to 10 wt %; a N (nitrogen atom)-containing heterocyclic compound from 0.5 to 5 wt %; a chloride compound from 0.1 to 5 wt %; a copper salt from 0.05 to 3 wt %; an organic acid or an organic acid salt from 0.1 to 10 wt %; an electron-donating compound from at 0.1 to 5 wt %; and a solvent of the residual amount. Also provided is a method of manufacturing a display device by using the same.
    Type: Grant
    Filed: October 7, 2014
    Date of Patent: August 22, 2017
    Assignees: Samsung Display Co., Ltd., Dongwoo Fine-Chem Co., Ltd.
    Inventors: Jong-Hyun Choung, In-Bae Kim, Hong-Sick Park, Seon-Il Kim, In-Seol Kuk, Gi-Yong Nam, Young-Chul Park, In-Ho Yu, Young-Jin Yoon, Suck-Jun Lee
  • Etchant composition and method of manufacturing metal wiring and thin film transistor substrate using the etchant
    Patent number: 9293565
    Abstract: An etchant composition includes about 0.5 weight % to about 20 weight % of persulfate, about 0.01 weight % to about 2 weight % of a fluoride compound, about 1 weight % to about 10 weight % of an inorganic acid, about 0.5 weight % to about 5 weight % of a cyclic amine compound, about 0.1 weight % to about 10.0 weight % of a compound having an amino group and a sulfonic acid, about 0.1 weight % to about 15.0 weight % of an organic acid or a salt thereof, and water to 100 weight % of the etchant composition.
    Type: Grant
    Filed: December 9, 2013
    Date of Patent: March 22, 2016
    Assignees: SAMSUNG DISPLAY CO., LTD., DONGWOO FINE-CHEM CO., LTD.
    Inventors: Jong-Hyun Choung, In-Bae Kim, Jae-Woo Jeong, Hong-Sick Park, In-Seol Kuk, Gi-Yong Nam, Young-Chul Park, In-Ho Yu, Young-Jin Yoon, Suck-Jun Lee
  • ETCHANT AND METHOD OF MANUFACTURING DISPLAY DEVICE BY USING THE SAME
    Publication number: 20150307779
    Abstract: An etchant composition is provided comprising a persulfate from 0.5 to 20 wt %; a fluoride compound from 0.01 to 2 wt %; an inorganic acid from 1 to 10 wt %; a N (nitrogen atom)-containing heterocyclic compound from 0.5 to 5 wt %; a chloride compound from 0.1 to 5 wt %; a copper salt from 0.05 to 3 wt %; an organic acid or an organic acid salt from 0.1 to 10 wt %; an electron-donating compound from at 0.1 to 5 wt %; and a solvent of the residual amount. Also provided is a method of manufacturing a display device by using the same.
    Type: Application
    Filed: October 7, 2014
    Publication date: October 29, 2015
    Inventors: Jong-Hyun Choung, In-Bae Kim, Hong-Sick Park, Seon-ll Kim, In-Seol Kuk, Gi-Yong Nam, Young-Chul Park, In-Ho Yu, Young-Jin Yoon, Suck-Jun Lee
  • TOUCH SCREEN PANEL AND METHOD OF FABRICATING THE SAME
    Publication number: 20150277605
    Abstract: Disclosed is a touch screen panel, including: a glass substrate including an active area and a non-active area; enhancement layers formed on upper and lower surfaces of the glass substrate; sensing patterns disposed on a surface of one of the enhancement layers in the active area; and sensing lines disposed in the non-active area, and electrically connected with the sensing patterns. Here, a side surface of the glass substrate may include a plurality of blunt areas depressed in a shape of a curved surface.
    Type: Application
    Filed: February 13, 2015
    Publication date: October 1, 2015
    Inventors: Soo-Min AN, Young-Jin YOON, Soo-Guy RHO, Sang-Duck PARK, Kang-Bin YI, Jung-Bo LEE, Sang-Hun CHO, Gi-Yong NAM, Young-Joon CHIN, Sang-Tae KIM, Yong-Seok CHOI
  • GLASS-REINFORCING COMPOSITION AND METHOD OF MANUFACTURING TOUCHSCREEN GLASS USING THE SAME
    Publication number: 20150274583
    Abstract: A glass-reinforcing composition and method of using the same, the composition including 1 weight % to 20 weight % of hydrofluoric acid, 0.1 weight % to 5 weight % of ammonium fluoride, 1 weight % to 20 weight % of an inorganic acid, an organic acid, or 1 weight % to 10 weight % of an organic acid salt, and a remainder of water.
    Type: Application
    Filed: September 8, 2014
    Publication date: October 1, 2015
    Inventors: Soo Min AN, Young-Jin Yoon, Gi Yong Nam, Soo Guy Rho, Sang-Duck Park, Kang Bin Yi, Jung Bo Lee, Sang Hun Cho, Sang-Tae Kim, Young-Jun Jin, Yong Seok Choi
  • ETCHANT, METHOD OF MANUFACTURING METAL WIRING AND THIN FILM TRANSISTOR SUBSTRATE USING THE ETCHANT
    Publication number: 20150004758
    Abstract: An etchant composition includes about 0.5 weight % to about 20 weight % of persulfate, about 0.01 weight % to about 2 weight % of a fluoride compound, about 1 weight % to about 10 weight % of an inorganic acid, about 0.5 weight % to about 5 weight % of a cyclic amine compound, about 0.1 weight % to about 10.0 weight % of a compound having an amino group and a sulfonic acid, about 0.1 weight % to about 15.0 weight % of an organic acid or a salt thereof, and water to 100 weight % of the etchant composition.
    Type: Application
    Filed: December 9, 2013
    Publication date: January 1, 2015
    Applicants: DONGWOO FINE-CHEM Co., Ltd., Samsung Display Co., Ltd.
    Inventors: Jong-Hyun Choung, In-Bae Kim, Jae-Woo Jeong, Hong-Sick Park, In-Seol Kuk, Gi-Yong Nam, Young-Chul Park, In-Ho Yu, Young-Jin Yoon, Suck-Jun Lee