Patents by Inventor Giduck Kweon

Giduck Kweon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Furnace-type semiconductor apparatus, method of cleaning the same, and method of forming thin film using the same
    Patent number: 10413946
    Abstract: Embodiments of the inventive concepts provide a method of cleaning a furnace-type semiconductor apparatus that is equipped in a clean room and includes a process chamber in which a process of forming a thin film is performed on a substrate. The method includes supplying air of the clean room into the process chamber after the process of forming the thin film, and thermally treating an inside of the process chamber using the air of the clean room supplied to the inside of the process chamber. An adhered material containing chlorine is formed on an inner surface of the process chamber by the process of forming the thin film, and the chlorine of the adhered material is removed by the thermal treatment of the inside of the process chamber.
    Type: Grant
    Filed: May 26, 2016
    Date of Patent: September 17, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyouncheol Kim, Youngil Kwon, Giduck Kweon, Jong-il Park, Inwoo Seo, Wooksung Son
  • FURNACE-TYPE SEMICONDUCTOR APPARATUS, METHOD OF CLEANING THE SAME, AND METHOD OF FORMING THIN FILM USING THE SAME
    Publication number: 20170008042
    Abstract: Embodiments of the inventive concepts provide a method of cleaning a furnace-type semiconductor apparatus that is equipped in a clean room and includes a process chamber in which a process of forming a thin film is performed on a substrate. The method includes supplying air of the clean room into the process chamber after the process of forming the thin film, and thermally treating an inside of the process chamber using the air of the clean room supplied to the inside of the process chamber. An adhered material containing chlorine is formed on an inner surface of the process chamber by the process of forming the thin film, and the chlorine of the adhered material is removed by the thermal treatment of the inside of the process chamber.
    Type: Application
    Filed: May 26, 2016
    Publication date: January 12, 2017
    Inventors: Hyouncheol Kim, Youngil Kwon, Giduck Kweon, Jong-il Park, lnwoo Seo, Wooksung Son