Patents by Inventor Giichiro Uchida

Giichiro Uchida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150303334
    Abstract: Provided at low cost is a multi-quantum well solar cell such that recombination of carriers generated by light absorption is suppressed and a high photoelectric conversion efficiency is achieved. This multi-quantum well solar cell comprises a substrate, a p-type semiconductor layer, a barrier layer, a well layer, an n-type semiconductor layer, and electrodes, and is characterized in that the barrier layer and the well layer comprise crystals having a wurtzite crystal structure, the well layer is composed of a metal-oxynitride that comprises Zn and at least one element selected from a group consisting of In, Ga, and Al, and a piezoelectric electric field is generated in the well layer. This allows for the provision of a multi-quantum well solar cell such that recombination of carriers generated by light absorption is suppressed and a high photoelectric conversion efficiency is achieved.
    Type: Application
    Filed: March 5, 2013
    Publication date: October 22, 2015
    Applicant: JAPAN SCIENCE AND TECHNOLOGY AGENCY
    Inventors: Naho ITAGAKI, Masaharu SHIRATANI, Giichiro UCHIDA
  • Patent number: 6893532
    Abstract: An apparatus for processing particulate dust when a substrate is arranged in a high vacuum enclosure, plasma is generated in the high vacuum enclosure, and a reactive material is introduced into the high vacuum enclosure to perform processing of the substrate. At least one collecting electrode is provided around the substrate in the high vacuum enclosure other than the electrode that generates plasma, and particulates generated in plasma are efficiently removed by applying a predetermined electric potential of a direct-current or an alternating current to the collecting electrode, and thus a deposition problem onto an inner wall of the vacuum enclosure and a deterioration problem of processing accuracy and a film quality associated with flowing of the particulates onto the substrate are solved.
    Type: Grant
    Filed: June 29, 1999
    Date of Patent: May 17, 2005
    Assignee: Tohoku Techno Arch Co., Ltd.
    Inventors: Noriyoshi Sato, Satoru Iizuka, Giichiro Uchida