Patents by Inventor Gijsber RISPENS

Gijsber RISPENS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • A MEMBRANE FOR EUV LITHOGRAPHY
    Publication number: 20190129299
    Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
    Type: Application
    Filed: April 12, 2017
    Publication date: May 2, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maxim Aleksandrovich NASALEVICH, Erik Achilles ABEGG, Nirupam BANERJEE, Michiel Alexander BLAUW, Derk Servatius Gertruda BROUNS, Paul JANSSEN, Matthias KRUIZINGA, Egbert LENDERINK, Nicolae MAXIM, Andrey NIKIPELOV, Arnoud Willem NOTENBOOM, Claudia PILIEGO, Mária PÉTER, Gijsber RISPENS, Nadja SCHUH, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Antonius Willem VERBURG, Johannes Petrus Martinus Bernardus VERMEULEN, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN, Aleksandar Nikolov ZDRAVICOV