Abstract: Set forth is a process for preparing acrylic acid and/or the ester of acrylic acid and lactic acid from a lactic acid oligomer or polymer. As a result of the use of a bromide source and/or a chloride source in combination with a specific acid, a process that can be operated to obtain a high yield, and is relatively easy to perform, is realized.

Abstract: A process for preparing acrylic acid and/or the ester of acrylic acid and lactic acid from a lactic acid oligomer or polymer, comprising the steps of bringing a reaction mixture comprising the lactic acid oligomer or polymer to reaction conditions to form acrylic acid and/or the ester of acrylic acid and lactic acid, the reacting mixture comprising a halide source selected from a bromide source and/or a chloride source and optionally an acid selected from the group of acids with a pKa of at most 2.0 and compounds which under reaction conditions decompose under the formation of an acid with a pKa of at most 2.0, with the reaction mixture comprising less than 1 wt. % of water, and keeping the reaction mixture under reaction conditions for a time sufficient to produce acrylic acid and/or the ester of acrylic acid and lactic acid.

Abstract: Polyhedral oligomeric silsesquioxanes (POSS) linked ligand of the general formula (I) L[(R1a)n-1(SiO1,5)nR2a]k[(R1b)n-1SiO1,5)nR2b]l[(R1c)n-1SiO1,5)nR2c]m??(I) in which (R1a,b,c)n-1(SiO1,5)n is a polyhedral oligomeric silsesquioxanes (POSS) with n=4, 6, 8, 10, 12, 14, 16 or 18 and R1a, R1b, R1c is each independently selected from the group consisting of same or different branched or linear C1-C20 alkyl chains, cyclo alkyl, C1-C20 alkoxy, aryl, aryloxy, heteroaryl and arylalkyl groups, k, l, m is 0 or 1 provided that k+l+m?1, R2a, R2b, R2c is a spacer that binds the polyhedral oligomeric silsesquioxane (POSS) to the ligand L and ligand L is an uncharged electron donor.

Abstract: A method to form a urethane material, the method comprises blending and reacting at least one isocyanate, at least one isocyanate reactive compound and a metallized polyhedral oligomeric silsesquioxane to provide said urethane material, the metallized polyhedral oligomeric silsesquioxane is a dimeric structure with general formula wherein M represents a metal providing a 6-coordinated metal center, x and y being 1, R1O and R2O represent an alkoxide bridging the 6-coordinated metal centers, R3OH and R4OH represent an alcohol ligand and each of R5, to R18 is selected from the group consisting of alkyl-, polyether- and polyester ligands.

Abstract: Polyhedral oligomeric silsesquioxanes (POSS) linked ligand of the general formula (I) L[(R1a)n-1(SiO1,5)nR2a]k[(R1b)n-1SiO1,5)nR2b]l[(R1c)n-1SiO1,5)nR2c]m??(I) in which (R1a,b,c)n-1(SiO1,5)n is a polyhedral oligomeric silsesquioxanes (POSS) with n=4, 6, 8, 10, 12, 14, 16 or 18 and R1a, R1b, R1c is each independently selected from the group consisting of same or different branched or linear C1-C20 alkyl chains, cyclo alkyl, C1-C20 alkoxy, aryl, aryloxy, heteroaryl and arylalkyl groups, k, l, m is 0 or 1 provided that k+l+m?1, R2a, R2b, R2c is a spacer that binds the polyhedral oligomeric silsesquioxane (POSS) to the ligand L and ligand L is an uncharged electron donor.

Abstract: A method to form a urethane material, the method comprises blending and reacting at least one isocyanate, at least one isocyanate reactive compound and a metallized polyhedral oligomeric silsesquioxane to provide said urethane material, the metallized polyhedral oligomeric silsesquioxane is a dimeric structure with general formula wherein M represents a metal providing a 6-coordinated metal center, x and y being 1, R1O and R2O represent an alkoxide bridging the 6-coordinated metal centers, R3OH and R4OH represent an alcohol ligand and each of R5, to R18 is selected from the group consisting of alkyl-, polyether- and polyester ligands.