Patents by Inventor Gijsbert Simon Matthijs Jansen

Gijsbert Simon Matthijs Jansen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11391677
    Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.
    Type: Grant
    Filed: January 23, 2020
    Date of Patent: July 19, 2022
    Assignee: ASML Netherlands B. V.
    Inventors: Stefan Michiel Witte, Gijsbert Simon Matthijs Jansen, Lars Christian Freisem, Kjeld Sijbrand Eduard Eikema, Simon Gijsbert Josephus Mathijssen
  • Publication number: 20200232931
    Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.
    Type: Application
    Filed: January 23, 2020
    Publication date: July 23, 2020
    Applicants: ASML Netherlands B.V., Stiching Nederlandse Wetenschappelijk Onderzoek Instituten, Stichting VU, Universiteit van Amsterdam
    Inventors: Stefan Michiel WITTE, Gijsbert Simon Matthijs JANSEN, Lars Christian FREISEM, Kjeld Sijbrand Eduard EIKEMA, Simon Gijsbert Josephus MATHIJSSEN
  • Patent number: 10648919
    Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.
    Type: Grant
    Filed: May 15, 2018
    Date of Patent: May 12, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Stefan Michiel Witte, Gijsbert Simon Matthijs Jansen, Lars Christian Freisem, Kjeld Sijbrand Eduard Eikema, Simon Gijsbert Josephus Mathijssen
  • Publication number: 20180348145
    Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.
    Type: Application
    Filed: May 15, 2018
    Publication date: December 6, 2018
    Applicants: ASML Netherlands B.V., Stichting Nederlandse Wetenschappelijk Onderzoek Instituten, Stichting VU, Universiteit van Amsterdam
    Inventors: Stefan Michiel WITTE, Gijsbert Simon Matthijs Jansen, Lars Christian Freisem, Kjeld Sijbrand Eduard Eikema, Simon Gijsbert Josephus Mathijssen