Patents by Inventor Gil-Lae Kim

Gil-Lae Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ink for color filter, method of fabricating color filter using the ink, and color filter fabricated by the method
    Patent number: 7985782
    Abstract: The present invention provides an ink for a color filter comprising a polymer binder, a crosslinking monomer, a solvent, a pigment, and a polymerization initiator. The polymer binder comprises acrylate or methacrylate including a hydroxy group. The polymer binder may comprise 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate.
    Type: Grant
    Filed: January 9, 2007
    Date of Patent: July 26, 2011
    Assignees: Samsung Electronics Co., Ltd., Dongjin Semichem Co., Ltd.
    Inventors: Kwang Ho Lee, Byoung Joo Kim, Jang Sub Kim, Chang Hun Kwak, Seong Gyu Kwon, Chan Seok Park, Kyung Ah Kim, Hyun Il Cho, Gil Lae Kim, Yoon Ho Kang
  • INK COMPOSITION AND COLOR FILTER INCLUDING THE SAME
    Publication number: 20100178416
    Abstract: An ink composition comprising dipropylene glycol monomethyl ether acetate (DPMA). For example, an ink composition for a color filter includes a binder material, a monomer material, a polymerization initiator, a pigment dispersion, and a solvent including dipropylene glycol monomethyl ether acetate (DPMA).
    Type: Application
    Filed: March 23, 2010
    Publication date: July 15, 2010
    Inventors: Yoon-Ho KANG, Choon-Ho Park, Kyung-Ah Kim, Gil-Lae Kim, Chan-Seok Park, Seong-Gyu Kwon, Jang-Sub Kim, Byoung-Joo Kim
  • Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same
    Patent number: 7611826
    Abstract: The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the -value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.
    Type: Grant
    Filed: January 9, 2009
    Date of Patent: November 3, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Seok-Yoon Yang, Gil-Lae Kim, Chan-Seok Park, Choon-Ho Park, Soo-Guy Rho
  • PHOTOSENSITIVE RESIN COMPOSITION CONTROLLING SOLUBILITY AND PATTERN FORMATION METHOD OF DOUBLE-LAYER STRUCTURE USING THE SAME
    Publication number: 20090191484
    Abstract: The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the -value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.
    Type: Application
    Filed: January 9, 2009
    Publication date: July 30, 2009
    Applicants: SAMSUNG ELECTRONICS CO., LTD., DONGJIN SEMICHEM CO., LTD.
    Inventors: Seok-Yoon YANG, Gil-Lae KIM, Chan-Seok PARK, Choon-Ho PARK, Soo-Guy RHO
  • INK FOR COLOR FILTER, METHOD OF FABRICATING COLOR FILTER USING THE INK, AND COLOR FILTER FABRICATED BY THE METHOD
    Publication number: 20070182795
    Abstract: The present invention provides an ink for a color filter comprising a polymer binder, a crosslinking monomer, a solvent, a pigment, and a polymerization initiator. The polymer binder comprises acrylate or methacrylate including a hydroxy group. The polymer binder may comprise 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate.
    Type: Application
    Filed: January 9, 2007
    Publication date: August 9, 2007
    Applicants: SAMSUNG ELECTRONICS CO., LTD., DONGJIN SEMICHEM CO., LTD.
    Inventors: Gil Lae KIM, Kyung Ah KIM, Chan Seok PARK, Hyun Il CHO, Yoon Ho KANG, Kwang Ho LEE, Byoung Joo KIM, Jang Sub KIM, Seong Gyu KWON, Chang Hun KWAK
  • Ink composition and color filter including the same
    Publication number: 20060063858
    Abstract: An ink composition comprising dipropylene glycol monomethyl ether acetate (DPMA). For example, an ink composition for a color filter includes a binder material, a monomer material, a polymerization initiator, a pigment dispersion, and a solvent including dipropylene glycol monomethyl ether acetate (DPMA).
    Type: Application
    Filed: September 15, 2005
    Publication date: March 23, 2006
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yoon-Ho Kang, Choon-Ho Park, Kyung-Ah Kim, Gil-Lae Kim, Chan-Seok Park, Seong-Gyu Kwon, Jang-Sub Kim, Byoung-Joo Kim
  • Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same
    Publication number: 20040115558
    Abstract: The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the &ggr;-value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.
    Type: Application
    Filed: September 30, 2003
    Publication date: June 17, 2004
    Inventors: Seok-Yoon Yang, Gil-Lae Kim, Chan-Seok Park, Choon-Ho Park, Soo-Guy Rho