Abstract: These copolymers are denoted by the formulae: ##STR1## P.sub.1, P.sub.2 =vinyl or dienic (p with a value of 1), or polyoxyalkylene, polyester or polyamide (p with a value of 0) polymer block;A=(1) ##STR2## with R.sub.1 denoting, among others, alkyl; (2) ##STR3## where E, G, J have various meanings; (3) ##STR4## M, joined to D, having the value ##STR5## h, i, Q and R having various meanings; D=a single bond or (cyclo)alkylene or arylene group;n=1 to 20.These polymers are iniferters in radical polymerization of vinyl monomers. The macroiniferters (I) and the polyiniferters (II) result, respectively, in triblock copolymers PA--PB--PA and diblock copolymers .paren open-st.PA--PB.paren close-st..sub.z a, z having a value from 2 to 25.

Abstract: The invention is directed to polymers containing thiuram disulfide groups and their preparation. These polymers are iniferters in radical polymerization of vinyl monomers. Macroiniferters (having one thiuram disulfide group in their main chain) and polyiniferters (having more than one thiuram disulfide group in their main chain) result respectively, in triblock copolymers PA--PB--PA and diblock copolymers. --PA--PB).sub.z, z having a value from 2 to 25.

Abstract: Polymers containing repeating units of: ##STR1## and optionally random distribution of other units derived from at least one vinyl monomer, R.sub.1 is H; alkyl, cycloalkyl or aryl each of which is unsubstituted or substituted by at least one halogen; ##STR2## (R.sub.7 is H, alkyl, cycloalkyl or aryl); A is a single bond; alkylene, cycloalkylene or arylene; or ##STR3## (B is alkylene, cycloalkylene or arylene); R.sub.2, R.sub.3 and R.sub.4 are alkyl, cycloalkyl or aryl; it being possible for at least one of R.sub.3 and R.sub.4 to contain at least one hydroxyl or carboxylic acid groups or to represent a polyoxyethylene or polyester sequence.These polymers are useful for the preparation of graft copolymers containing the units of the formula: ##STR4## where Po is a vinyl or a diene polymer sequence, and other vinyl units. These graft copolymers are useful especially as compatibility agents.

Abstract: Said polyurethanes contain patterns of the type (Ia) or (Ib) with A=alkyl, cycloalkyl, aryl, arylalkyl or alkylaryl, or polyoxyalkylene or polyester; D=alkylene, cycloalkylene, arylene, alkylarylene or arylalkylene, and can contain at least one heteroatom; E=(i), in which case G represents the hydrocarbonated skeleton of an organic compound containing at least two alcohol functions, or (ii), in which case G represents the hydrocarbonated skeleton of an organic compound containing at least two isocyanate functions, and Pv=a polymer sequence from at least one vinyl monomer. The presence of vinyl sequences in said polyurethanes makes it possible, in particular, to improve the stability when exposed to sunlight (UV) of paints with a polyurethane base, thereby adding a sheen to said paints.

Abstract: Polydiorganosiloxane/thiuram disulfide block copolymers having the formula: ##STR1## well adapted as "polyiniferters" in the radical polymerization of vinyl monomers, e.g., the (meth)acrylates or styrene, are prepared by reacting a corresponding .alpha.,.omega.-(amino)diorganopolysiloxane with CS.sub.2 in the presence of a tertiary amine and an oxidizing agent, e.g., iodine.

Abstract: This compound (I) is prepared by reaction of a compound (II) with carbon disulphide in the presence of an oxidizing agent. It can be used as an agent performing the triple function of initiator, chain transfer agent and termination agent in the radical polymerization of vinyl monomers. The .alpha.,.omega.-difunctional vinyl oligomers and polymers thus obtained are fireproofing polymers or polymers which can be employed as additives in the preparation of fireproofing polymers. They can also be employed to manufacture block polymers by condensation of their end functional groups in the presence of at least one other functional oligomer or polymer, these block polymers also being fireproofing polymers. ##STR1## R.sub.1, R.sub.2 =especially C.sub.1 -C.sub.12 alkyl optionally interrupted by --0--or, ##STR2## cycloalkyl, aryl, --Y--R.sub.4 (Y=single bond, --0-- or --NR.sub.5); R.sub.4 =phosphate or phosphonate functional group; at least one of R.sub.1 and R.sub.

Abstract: Polymers containing repeating units of: ##STR1## and optionally random distribution of other units derived from at least one vinyl monomer, R.sub.1 is H; alkyl, cycloalkyl or aryl each of which is unsubstituted or substituted by at least one halogen; ##STR2## (R.sub.7 is H, alkyl, cycloalkyl or aryl); A is a single bond; alkylene, cycloalkylene or arylene; or ##STR3## (B is alkylene, cycloalkylene or arylene); R.sub.2, R.sub.3 and R.sub.4 are alkyl, cycloalkyl or aryl; it being possible for at least one of R.sub.3 and R.sub.4 to contain at least one hydroxyl or carboxylic acid groups or to represent a polyoxyethylene or polyester sequence.These polymers are useful for the preparation of graft copolymers containing the units of the formula: ##STR4## where Po is a vinyl or a diene polymer sequence, and other vinyl units. These graft copolymers are useful especially as compatibility agents.

Abstract: Polydiorganosiloxane/thiuram disulfide block copolymers having the formula: ##STR1## well adapted as "polyiniferters" in the radical polymerization of vinyl monomers, e.g., the (meth)acrylates or styrene, are prepared by reacting a corresponding .alpha.,.omega.-(amino)diorganopolysiloxane with CS.sub.2 in the presence of a tertiary amine and an oxidizing agent, e.g., iodine.

Abstract: Novel polydiorganosiloxane substituted thiuram disulfides have the formula: ##STR1## and are useful for the radical polymerization of vinyl monomers to produce polydiorganosiloxane/polyvinyl/polydiorganosiloxane block copolymers having improved physical properties.