Patents by Inventor Gilbert L. Varnell

Gilbert L. Varnell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma developable negative resist compositions for electron beam, X-ray and optical lithography
    Patent number: 4657844
    Abstract: A negative resist composition including a polymeric matrix material, a polymerizable monomer, and an onium salt radiation sensitive initiator. The monomer is polymerized by irradiating the resist with an e-beam, x-ray, or ultraviolet source and heating the exposed resist. The resist is developed by a dry etchant such as plasma or a reactive ion etchant.
    Type: Grant
    Filed: May 14, 1985
    Date of Patent: April 14, 1987
    Assignee: Texas Instruments Incorporated
    Inventors: Jing S. Shu, Johnny B. Covington, Wei Lee, Larry G. Venable, Gilbert L. Varnell
  • High gel rigidity, negative electron beam resists
    Patent number: 4318976
    Abstract: A negative, high energy radiation resist based on styrene-allyl methacrylate copolymers and substitutional modifications thereof, yielding a linear copolymer with highly sensitive allyl pendant groups together with a thermally stable, solvent resistant backbone. This resist exhibits improved e-beam sensitivity without the attendant problems of swelling during development and flow during heat processing.
    Type: Grant
    Filed: October 27, 1980
    Date of Patent: March 9, 1982
    Assignee: Texas Instruments Incorporated
    Inventors: Jing S. Shu, Wei Lee, Gilbert L. Varnell, John L. Bartelt