Patents by Inventor Gilbert Tsai

Gilbert Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of reducing stop layer loss in a photoresist stripping process using a fluorine scavenger
    Patent number: 6455232
    Abstract: A method of stripping a photoresist layer in a plasma derived from an etch gas for the photoresist and a fluorine-containing polymer includes a scavenging gas for fluorine in the resist strip etch plasma. The scavenger for flourine reduces the amount of fluorine released from a fluorine-containing polymer into the resist etch plasma during polymer dissociation in the photoresist stripping step, thereby providing a photoresist stripping mechanism with reduced stop layer loss.
    Type: Grant
    Filed: April 14, 1998
    Date of Patent: September 24, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Jason Lin, Stefan Jenq, Eric Ou-Yang, Gilbert Tsai