Patents by Inventor Giles E. Eperon

Giles E. Eperon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Two-step deposition process
    Patent number: 10580585
    Abstract: The present invention provides a process for producing a layer of a crystalline material comprising a perovskite or a hexahalometallate, which process comprises: (i) exposing a substrate to a vapour comprising a first precursor compound in a first chamber to produce a layer of the first precursor compound on the substrate; and (ii) exposing the layer of the first precursor compound to a vapour comprising a second precursor compound in a second chamber to produce the layer of a crystalline material, wherein the pressure in the second chamber is above high vacuum. The invention also provides a process for producing a layer of a crystalline material comprising a perovskite or a hexahalometallate, which process comprises exposing a layer of a first precursor compound on a substrate to a vapour comprising a second precursor compound in a chamber to produce the layer of a crystalline material, wherein the pressure in the chamber is greater than high vacuum and less than atmospheric pressure.
    Type: Grant
    Filed: July 9, 2015
    Date of Patent: March 3, 2020
    Assignee: OXFORD UNIVERSITY INNOVATION LIMITED
    Inventors: Henry J. Snaith, Giles E. Eperon, James M. Ball
  • TWO-STEP DEPOSITION PROCESS
    Publication number: 20170148579
    Abstract: The present invention provides a process for producing a layer of a crystalline material comprising a perovskite or a hexahalometallate, which process comprises: (i) exposing a substrate to a vapour comprising a first precursor compound in a first chamber to produce a layer of the first precursor compound on the substrate; and (ii) exposing the layer of the first precursor compound to a vapour comprising a second precursor compound in a second chamber to produce the layer of a crystalline material, wherein the pressure in the second chamber is above high vacuum. The invention also provides a process for producing a layer of a crystalline material comprising a perovskite or a hexahalometallate, which process comprises exposing a layer of a first precursor compound on a substrate to a vapour comprising a second precursor compound in a chamber to produce the layer of a crystalline material, wherein the pressure in the chamber is greater than high vacuum and less than atmospheric pressure.
    Type: Application
    Filed: July 9, 2015
    Publication date: May 25, 2017
    Applicant: OXFORD UNIVERSITY INNOVATION LIMITED
    Inventors: HENRY J. Snaith, Giles E. Eperon, James M. Ball