Patents by Inventor Gillbert Declerck

Gillbert Declerck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fluorinated hard mask for micropattering of polymers
    Publication number: 20010026956
    Abstract: The present invention discloses the formation of a hard mask layer in an organic polymer layer by modifying at least locally the chemical composition of a part of said exposed organic low-k polymer. This modification starts from an exposed surface of the polymer and extends into the polymer thereby increasing the chemical resistance of the modified part of the polymer. As a result, this modified part can be used as a hard mask or an etch stop layer for plasma etching.
    Type: Application
    Filed: April 27, 2001
    Publication date: October 4, 2001
    Inventors: Mikhail Rodionovich Baklanov, Serge Vanhaelemeersch, Karen Maex, Joost Waterloos, Gillbert Declerck