Patents by Inventor Gilles Lebourg

Gilles Lebourg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7192920
    Abstract: A subject of the invention, in all possible isomer forms as well as their mixtures, is the compounds of formula (I): in which either R1: H or CH3 and R2: cyclohexyl substituted by an amine, a (CH2)b-C?N radical or R1 and R2 together with the nitrogen which carries them form a ring with 3, 4 or 5 carbons optionally substituted by an amine R3: hydrogen, methyl or hydroxyl R4: hydrogen or hydroxyl R: represents a linear, branched or cyclic chain T: hydrogen, methyl, CH2CONH2, CH2C?N, a (CH2)2NH2 or (CH2)2Nalk+X? radical, X halogen and alk alkyl Y: hydrogen, hydroxyl, halogen or OSO3H, W: H or OH, Z: H, CH3. The compounds of formula (I) have antifungal properties.
    Type: Grant
    Filed: September 13, 2005
    Date of Patent: March 20, 2007
    Assignee: Aventis Pharma SA
    Inventors: Patrick Fauveau, Stephen Hawser, Gilles Lebourg, Laurent Schio
  • Patent number: 7022669
    Abstract: A subject of the invention, in all possible isomer forms as well as their mixtures, is the compounds of formula (I): in which either R1: H or CH3 and R2: cyclohexyl substituted by an amine, a (CH2)b-C?N radical or R1 and R2 together with the nitrogen which carries them form a ring with 3, 4 or 5 carbons optionally substituted by an amine R3: hydrogen, methyl or hydroxyl R4: hydrogen or hydroxyl R: represents a linear, branched or cyclic chain T: hydrogen, methyl, CH2CONH2, CH2C?N, a (CH2)2NH2 or (CH2)2Nalk+X? radical, X halogen and alk alkyl Y: hydrogen, hydroxyl, halogen or OSO3H, W: H or OH, Z: H, CH3. The compounds of formula (I) have antifungal properties.
    Type: Grant
    Filed: June 8, 2000
    Date of Patent: April 4, 2006
    Assignee: Aventis Pharma S.A.
    Inventors: Patrick Fauveau, Stephen Hawser, Gilles Lebourg, Laurent Schio
  • Publication number: 20060035820
    Abstract: A subject of the invention, in all possible isomer forms as well as their mixtures, is the compounds of formula (I): in which either R1: H or CH3 and R2: cyclohexyl substituted by an amine, a (CH2)b—C?N radical or R1 and R2 together with the nitrogen which carries-them form a ring with 3, 4 or 5 carbons optionally substituted by an amine R3: hydrogen, methyl or hydroxyl R4: hydrogen or hydroxyl R: represents a linear,. branched or cyclic chain T: hydrogen, methyl, CH2CONH2, CH2C?N, a (CH2)2NH2 or (CH2)2Nalk+X? radical, X halogen and alk alkyl Y: hydrogen, hydroxyl, halogen or OSO3H, W: H or OH, Z: H, CH3. The compounds of formula (I) have antifungal properties.
    Type: Application
    Filed: September 13, 2005
    Publication date: February 16, 2006
    Inventors: Patrick Fauveau, Stephen Hawser, Gilles Lebourg, Laurent Schio