Patents by Inventor Gilles Tabbone

Gilles Tabbone has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD FOR ELECTRON BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK
    Publication number: 20240036456
    Abstract: A method for electron beam-induced processing of a defect of a microlithographic photomask, including the steps of: a) providing an activating electron beam at a first acceleration voltage (EHT1) and a process gas in the region of a defect of the photomask for the purpose of repairing the defect, and b) producing at least one image of the photomask, in which the region of the defect is captured at least in part, by providing an electron beam at at least one second acceleration voltage (e.g., EHT2, EHT3, EHT4) which differs from the first acceleration voltage (EHT1), for the purpose of determining a quality of the repaired defect.
    Type: Application
    Filed: July 27, 2023
    Publication date: February 1, 2024
    Inventor: Gilles Tabbone
  • Method and device for superimposing at least two images of a photolithographic mask
    Patent number: 11620429
    Abstract: The present invention relates to a method for superimposing at least two images of a photolithographic mask, wherein the method comprises the following steps: (a) determining at least one first difference of at least one first image relative to design data of the photolithographic mask; (b) determining at least one second difference of at least one second image relative to design data of the photolithographic mask, or relative to the at least one first image; and (c) superimposing the at least one first image and the at least one second image taking account of the at least one first difference and the at least one second difference.
    Type: Grant
    Filed: June 26, 2020
    Date of Patent: April 4, 2023
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Gilles Tabbone, Carsten Schmidt
  • METHOD AND DEVICE FOR SUPERIMPOSING AT LEAST TWO IMAGES OF A PHOTOLITHOGRAPHIC MASK
    Publication number: 20200409255
    Abstract: The present invention relates to a method for superimposing at least two images of a photolithographic mask, wherein the method comprises the following steps: (a) determining at least one first difference of at least one first image relative to design data of the photolithographic mask; (b) determining at least one second difference of at least one second image relative to design data of the photolithographic mask, or relative to the at least one first image; and (c) superimposing the at least one first image and the at least one second image taking account of the at least one first difference and the at least one second difference.
    Type: Application
    Filed: June 26, 2020
    Publication date: December 31, 2020
    Inventors: Gilles Tabbone, Carsten Schmidt
  • Method for analyzing a photomask
    Patent number: 9261775
    Abstract: A method for analyzing a photomask comprises the determination of a Bossung plot.
    Type: Grant
    Filed: February 27, 2014
    Date of Patent: February 16, 2016
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Anthony Garetto, Thomas Scheruebl, Gilles Tabbone, Vahagn Sargsyan, Doug Uzzel, Jon Morgan
  • METHOD FOR ANALYZING A PHOTOMASK
    Publication number: 20140254915
    Abstract: A method for analyzing a photomask comprises the determination of a Bossung plot.
    Type: Application
    Filed: February 27, 2014
    Publication date: September 11, 2014
    Inventors: Anthony Garetto, Thomas Scheruebl, Gilles Tabbone, Vahagn Sargsyan, Doug Uzzel, Jon Morgan