Abstract: A composition that includes at least one clinochlore and a resin is described. A method of treating a user that includes applying a composition including a piezoelectric material such as a clinochlore and a polymerized resin to at least one acupuncture or acupressure point of a user is also described.

Abstract: A method for forming small repeating structures, such as contact holes, is disclosed. The method comprises using a phase shift mask to perform a first exposure of a photoresist layer formed atop of a substrate. The phase shift mask includes etched regions and unetched regions. Next, the position of the phase shift mask is adjusted relative to the photoresist layer. A second exposure through the adjusted phase shift mask is performed on the photoresist layer. The photoresist is developed and is used as a mask for etching the substrate. After etch, the photoresist is stripped and cleaned. The resulted small sub-wavelength pattern is formed from the disclosed technique.