Abstract: A microelectronic device including first insulative structures, each first insulative structure including first sections individually having a first horizontal width in a first direction, and second sections horizontally alternating with the first sections in a second direction orthogonal to the first direction, the second sections individually having a second horizontal width in the first direction greater than the first width. First conductive structures are directly adjacent the first sections of the first insulative structures in the first direction and directly adjacent the second sections of the first insulative structures in the second direction. Second insulative structures are directly adjacent the first conductive structures and the second sections of the first insulative structures in the first direction; and second conductive structures are directly adjacent the second insulative structures in the first direction.

Abstract: Some embodiments include an integrated assembly having a first bottom electrode adjacent to a second bottom electrode. An intervening region is directly between the first and second bottom electrodes. Capacitor-insulative-material is adjacent to the first and second bottom electrodes. The capacitor-insulative-material is substantially not within the intervening region. Top-electrode-material is adjacent to the capacitor-insulative-material. Some embodiments include methods of forming integrated assemblies.

Abstract: Methods, systems, and devices for biasing a memory cell during a read operation are described. For example, a memory device may bias a memory cell to a first voltage (e.g., a read voltage) during an activation phase of a read operation. After biasing the memory cell to the first voltage, the memory device may bias the memory cell to a second voltage greater than the first voltage (e.g., a write voltage) during the activation phase of the read operation. After biasing the memory cell to the second voltage, the memory device may initiate a refresh phase of the read operation. Based on a value stored by the memory cell prior to biasing the memory cell to the first voltage, the memory device may initiate a precharge phase of the read operation.

Abstract: Some embodiments include an assembly having first and second pillars. Each of the pillars has an inner edge and an outer edge. A first gate is proximate a channel region of the first pillar. A second gate is proximate a channel region of the second pillar. A shield line is between the first and second pillars. First and second bottom electrodes are over the first and second pillars, respectively; and are configured as first and second angle plates. An insulative material is over the first and second bottom electrodes. The insulative material may be ferroelectric or non-ferroelectric. A top electrode is over the insulative material. Some embodiments include methods of forming assemblies.

Abstract: Methods, systems, and devices for techniques to manufacture ferroelectric memory devices are described. In some cases, a memory array may be manufactured using a self-aligned manufacturing technique. For example, a continuous layer of dielectric material may be formed over an assembly which includes an array of transistors coupling contacts on the surface of the assembly with a set of digit lines. In some cases, an array of cavities may be etched into the dielectric material, each cavity exposing a set of contacts. A set of bottom electrodes corresponding to the set of contacts may be formed on sidewalls in each cavity, for example by depositing a layer of electrode material and etching the electrode material using a variety of hard masks.

Abstract: Some embodiments include an assembly having first and second pillars. Each of the pillars has an inner edge and an outer edge. A first gate is proximate a channel region of the first pillar. A second gate is proximate a channel region of the second pillar. A shield line is between the first and second pillars. First and second bottom electrodes are over the first and second pillars, respectively; and are configured as first and second angle plates. An insulative material is over the first and second bottom electrodes. The insulative material may be ferroelectric or non-ferroelectric. A top electrode is over the insulative material. Some embodiments include methods of forming assemblies.

Abstract: Correctable error pattern information for a memory device can be based on data received from or using a data pin of the memory device. The memory device can include, for example, a DRAM device comprising an array of memory cells. Based on the error pattern information, firmware or software can be used to identify respective physical portions of the array comprising data with correctable errors. In an example, one or more fault locations in the memory device can be identified, the fault location corresponding to multiple cells in the array and comprising the data with correctable errors. In response to identifying the fault location in the array, one or more memory pages corresponding to the location(s) can be offlined or removed from an addressable memory space. In an example, the memory device comprises a portion of a compute express link (CXL) system.

Abstract: A variety of applications can include apparatus having a memory device with ferroelectric capacitors as storage structures in memory cells. A ferroelectric capacitor can have a bottom electrode, a top electrode, and ferroelectric material, where a leaker electrically couples the bottom electrode to the top electrode. Conductive plates can be positioned on and contacting a different set of the memory cells. The plates can be separated from each other along a direction parallel to an access line to the array, without dummy memory cells between the different sets of memory cells at the edges of the plates. A number of different fabrication options can be implemented to realize a memory array with container structures that can have small container spacing without dummy memory cells at the edges of plate cuts. The different fabrication options can be realized by differences in process related to top electrode formation.

Abstract: At least one portion of a memory array may be arranged to provide high density non-volatile random access memory (HIGH DENSITY NON-VOLATILE RAM) while at least one other portion of the memory array may be arranged to provide dynamic random access memory (DRAM)-like memory. In some examples, the memory array may be arranged by programming one or more configuration devices. In some examples, the configuration device may include one or more switches to couple one or more memory cells to a sense amplifier. In some examples, the configuration device may include fuses and/or antifuses to couple one or more memory cells to a sense amplifier. In some examples, the portions of the memory array may be reconfigurable from one arrangement to another arrangement.

Abstract: Methods, systems, and devices for memory array configuration for shared word lines are described. A memory array of a memory device may include shared (e.g., shorted) word lines. The memory array may include multiple memory cells, word lines, rows of transistors, and digit lines. Each transistor of the rows of transistors may be coupled with a respective memory cell and includes a connection between a first word line, a second word line, and a gate terminal of a transistor. Additionally, each digit line may be coupled with respective terminals of respective transistors of alternating rows of transistors including a first subset of alternating rows and a second subset of alternating rows that are exclusive from each other. The transistors may be configured according to a first configuration including two digit lines overlapping each transistor or a second configuration including a single digit line overlapping each transistor.

Abstract: Some embodiments include an integrated assembly having first and second pillars of semiconductor material. The first pillar includes a first source/drain region, and the second pillar includes a second source/drain region. First and second bottom electrodes are coupled with the first and second source/drain regions, respectively. The first and second source/drain regions are spaced from one another by an intervening region. First and second leaker-device-structures extend into the intervening region from the first and second bottom electrodes, respectively. Top-electrode-material extends into the intervening region and contacts the first and second leaker-device-structures. Ferroelectric-insulative-material is between the top-electrode-material and the bottom electrodes. Some embodiments include methods of forming integrated assemblies.

Abstract: A variety of applications can include apparatus having a memory device with ferroelectric capacitors as storage structures in memory cells. The ferroelectric capacitors can be arranged vertically from a region of access transistors of the memory cells with the bottom electrodes of the ferroelectric capacitors arranged above and coupled to the access transistors. The bottom electrodes can be separated from the top electrodes of the ferroelectric capacitors by ferroelectric material. The bottom electrodes of ferroelectric capacitors of adjacent memory cells can be separated by a low-k dielectric material.

Abstract: Some embodiments include an integrated assembly having first and second pillars of semiconductor material. The first pillar includes a first source/drain region, and the second pillar includes a second source/drain region. First and second bottom electrodes are coupled with the first and second source/drain regions, respectively. The first and second source/drain regions are spaced from one another by an intervening region. First and second leaker-device-structures extend into the intervening region from the first and second bottom electrodes, respectively. Top-electrode-material extends into the intervening region and contacts the first and second leaker-device-structures. Ferroelectric-insulative-material is between the top-electrode-material and the bottom electrodes. Some embodiments include methods of forming integrated assemblies.

Abstract: Some embodiments include an integrated assembly having a first bottom electrode adjacent to a second bottom electrode. An intervening region is directly between the first and second bottom electrodes. Capacitor-insulative-material is adjacent to the first and second bottom electrodes. The capacitor-insulative-material is substantially not within the intervening region. Top-electrode-material is adjacent to the capacitor-insulative-material. Some embodiments include methods of forming integrated assemblies.

Abstract: A method used in forming an array of capacitors comprises forming first walls along a column direction and second walls along a row direction. The first and second walls individually comprise a first material directly above a second material. The first and second materials are of different compositions relative one another. All of the second material is removed from being directly under the first material in the second walls to form beams that are elongated along the row direction and are suspended between immediately-adjacent of the first walls and to leave the second material directly under the first material in the first walls. Third walls are formed along the row direction. The third walls comprise third material that is of different composition from those of the first and second materials. The third material of individual of the third walls circumferentially-covers the beams. Conductive material is grown over the first and second materials selectively relative to the third material.

Abstract: Provided is a computing system including a memory system in communication with a host, to store data therein. The memory system includes a memory having a plurality of memory components coupled to the controller via a memory interface; and a memory controller configured to communicate with the memory to control data transmission and performing scrubbing operation of the memory components and detecting a region of the memory to be sanitized and performing a sanitization operation of the detected region to prevent the occurrence of failure.

Abstract: Implementations described herein relate to various structures, integrated assemblies, and memory devices. In some implementations, an integrated assembly includes a pillar having an upper source/drain, a middle source/drain, a lower source/drain, an upper channel between the upper source/drain and the middle source/drain, and a lower channel between the middle source/drain and the lower source/drain. The integrated assembly includes a gate pair that includes a first gate and a second gate. The first gate is positioned on a first side of the pillar at a first height, and the second gate is positioned on a second side of the pillar, that is opposite the first side, at a second height that is different from the first height. The integrated assembly includes a capacitor that is electrically coupled with the upper source/drain. Some implementations include methods of forming the various structures, integrated assemblies, and memory devices.

Abstract: Methods, systems, and devices for differential storage in memory arrays are described. A memory device may include pairs of memory cells configured to store a single logic state (e.g., a single bit of information). Additionally, the memory device may include sense amplifiers configured to sense the logic state based on a difference between a voltage of a first ferroelectric memory cell of the pair of memory cells and a voltage of a second ferroelectric memory cell of the pair of memory cells. In one example, the memory device may include pairs of memory cells within a single memory array on a single level. Here, each memory cell pair may include a memory cells that are each coupled with a same word line and plate line. Additionally, each memory cell pair may include memory cells each coupled with different digit lines.

Abstract: Some embodiments include an integrated assembly having a first bottom electrode adjacent to a second bottom electrode. An intervening region is directly between the first and second bottom electrodes. Capacitor-insulative-material is adjacent to the first and second bottom electrodes. The capacitor-insulative-material is substantially not within the intervening region. Top-electrode-material is adjacent to the capacitor-insulative-material. Some embodiments include methods of forming integrated assemblies.

Abstract: Methods, systems, and devices for memory cell biasing techniques are described. A memory cell may be accessed during an access phase of an access operation. A pre-charge phase of the access phase may be initiated. The memory cell may be biased to a voltage (e.g., a non-zero voltage) after the pre-charge phase. In some examples, the memory cell may be biased to the voltage when a word line is unbiased and the memory cell is isolated from the digit line.