Patents by Inventor Giovanni Francisco NINO

Giovanni Francisco NINO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20230273533
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Application
    Filed: April 13, 2023
    Publication date: August 31, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: NICOLAAS TEN KATE, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Giovanni Francisco Nino, Marinus Jan Remie, Johannes Henricus Wilhelmus Jacobs, Thibault Simon Mathieu Laurent, Johan Gertrudis Cornelis Kunnen
  • Lithographic apparatus and method
    Patent number: 11630399
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Grant
    Filed: March 18, 2022
    Date of Patent: April 18, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Ten Kate, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Giovanni Francisco Nino, Marinus Jan Remie, Johannes Henricus Wilhelmus Jacobs, Thibault Simon Mathieu Laurent, Johan Gertrudis Cornelis Kunnen
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20220206400
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Application
    Filed: March 18, 2022
    Publication date: June 30, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas TEN KATE, Joost Jeroen OTTENS, Bastiaan Andreas Wilhelmus Hubertus KNARREN, Robbert Jan VOOGD, Giovanni Francisco NINO, Marinus Jan REMIE, Johannes Henricus Wilhelmus JACOBS, Thibault Simon Mathieu LAURENT, Johan Gertrudis Cornelis KUNNEN
  • Lithographic apparatus and method
    Patent number: 11281115
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Grant
    Filed: January 6, 2020
    Date of Patent: March 22, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Ten Kate, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Giovanni Francisco Nino, Marinus Jan Remie, Johannes Henricus Wilhelmus Jacobs, Thibault Simon Mathieu Laurent, Johan Gertrudis Cornelis Kunnen
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20200142325
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Application
    Filed: January 6, 2020
    Publication date: May 7, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Ten Kate, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Giovanni Francisco Nino, Marinus Jan Remie, Johannes Henricus Wilhelmus Jacobs, Thibault Simon Mathieu Laurent, Johan Gertrudis Cornelis Kunnen
  • Lithographic apparatus and method
    Patent number: 10551752
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Grant
    Filed: March 11, 2011
    Date of Patent: February 4, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Nicolaas Ten Kate, Johannes Henricus Wilhelmus Jacobs, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Thibault Simon Mathieu Laurent, Robbert Jan Voogd, Giovanni Francisco Nino, Johan Gertrudis Cornelis Kunnen, Marinus Jan Remie
  • Lithographic apparatus and method
    Patent number: 9632435
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Grant
    Filed: March 11, 2011
    Date of Patent: April 25, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Ten Kate, Johannes Henricus Wilhelmus Jacobs, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Thibault Simon Mathieu Laurent, Robbert Jan Voogd, Giovanni Francisco Nino, Johan Gertrudis Cornelis Kunnen, Marinus Jan Remie
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20110222032
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Application
    Filed: March 11, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas TEN KATE, Johannes Henricus Wilhelmus JACOBS, Joost Jeroen OTTENS, Bastiaan Andreas Wilhelmus Hubertus KNARREN, Thibault Simon Mathieu LAURENT, Robbert Jan VOOGD, Giovanni Francisco NINO, Johan Gertrudis Cornelis KUNNEN, Marinus Jan REMIE
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20110222033
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Application
    Filed: March 11, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Ten Kate, Johannes Henricus Wilhelmus Jacobs, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Thibault Simon Mathieu Laurent, Robbert Jan Voogd, Giovanni Francisco Nino, Johan Gertrudis Cornelis Kunnen, Marinus Jan Remie