Abstract: A photocatalytic batch reactor can include a reactor vessel configured to receive a photocatalyst, the housing having an inlet, an outlet, and an opening configured to allow light to pass into the interior volume. The photocatalytic batch reactor can include a carbon-dioxide pump that is configured to pressurize carbon-dioxide en route to the reactor vessel. The photocatalytic batch reactor is operable in a gas state in which gas carbon-dioxide is supplied to the reactor vessel from a gas carbon-dioxide container. The photocatalytic batch reactor is also operable in a liquid state in which liquid carbon-dioxide is supplied to the reactor vessel from a liquid carbon-dioxide container. The photocatalytic batch reactor is also operable in a supercritical state, in which supercritical carbon-dioxide is supplied via the carbon-dioxide pump.

Abstract: According to the present invention there is provided a component handling assembly which comprises, a transport system which comprises a track, and a plurality of shuttles, wherein each of said shuttles can be driven individually and independently of one another along the track; and wherein each of said shuttles comprise a pick-up-head which can hold a component; a plurality of stations located proximate to the track, said plurality of stations comprising, a picking station at which the pickup head on a shuttle can pick components from a tray located in said picking station; at least one vision inspection station, which comprises one or more cameras, at which a component which has been picked from the picking station and transported to the vision inspection station can be inspected; and at least one of, a placing station at which the pickup head on a shuttle can place a component onto a tray, and/or, a tape station at which the pickup head on a shuttle can place a component into a pocket of a tape.

Abstract: Superhydrophilic and antifogging non-porous TiO2 films for glass substrates and methods of providing the TiO2 films are provided. The TiO2 films may maintain a water contact angle less than 5° in the dark for five days after an annealing treatment, and the water contact angle of the TiO2 films may stabilize at less than 20° after ten days from the annealing treatment. The TiO2 films may have a thickness of about 20 nm and may be transparent. The methods may include depositing a TiO2 film on a glass substrate using e-beam evaporation. The methods may further include annealing the TiO2 film after depositing the TiO2 film on the glass substrate. The methods may not include UV radiation.

Abstract: Superhydrophilic and antifogging non-porous TiO2 films for glass substrates and methods of providing the TiO2 films are provided. The TiO2 films may maintain a water contact angle less than 5° in the dark for five days after an annealing treatment, and the water contact angle of the TiO2 films may stabilize at less than 20° after ten days from the annealing treatment. The TiO2 films may have a thickness of about 20 nm and may be transparent. The methods may include depositing a TiO2 film on a glass substrate using e-beam evaporation. The methods may further include annealing the TiO2 film after depositing the TiO2 film on the glass substrate. The methods may not include UV radiation.

Abstract: Superhydrophilic and antifogging non-porous TiO2 films for glass substrates and methods of providing the TiO2 films are provided. The TiO2 films may maintain a water contact angle less than 5° in the dark for five days after an annealing treatment, and the water contact angle of the TiO2 films may stabilize at less than 20° after ten days from the annealing treatment. The TiO2 films may have a thickness of about 20 nm and may be transparent. The methods may include depositing a TiO2 film on a glass substrate using e-beam evaporation. The methods may further include annealing the TiO2 film after depositing the TiO2 film on the glass substrate. The methods may not include UV radiation.

Abstract: Superhydrophilic and antifogging non-porous TiO2 films for glass substrates and methods of providing the TiO2 films are provided. The TiO2 films may maintain a water contact angle less than 5° in the dark for five days after an annealing treatment, and the water contact angle of the TiO2 films may stabilize at less than 20° after ten days from the annealing treatment. The TiO2 films may have a thickness of about 20 nm and may be transparent. The methods may include depositing a TiO2 film on a glass substrate using e-beam evaporation. The methods may further include annealing the TiO2 film after depositing the TiO2 film on the glass substrate. The methods may not include UV radiation.

Abstract: A process for the preparation of an aromatic aldehyde by means of the oxidation of the corresponding starting compound in aqueous medium, and separation of said aldehyde from said medium by pervaporation is disclosed together a plant for its carrying out. Advantageously, the process of the present invention allows control of oxidation reaction and recovery of the product with high selectivity and purity. Among others, benzaldehyde, anisaldehyde and vanillin can advantageously be prepared by this process.

Abstract: According to the present invention there is provided a component handling assembly, comprising, an index table which comprises one or more nests each of which is configured to cooperate with a component to hold the component as the index table is indexed, wherein the one or more nests are configured such that a component which cooperates with a nest is supported above the nest so that the one or more nests can cooperate with components of various sizes, and an alignment means operable to move a component into a predefined orientation before a component co-operates with a nest on the index table. There is further provided a corresponding method of handling a component.

Abstract: A process for the preparation of an aromatic aldehyde by means of the oxidation of the corresponding starting compound in aqueous medium, and separation of said aldehyde from said medium by pervaporation is disclosed together a plant for its carrying out. Advantageously, the process of the present invention allows control of oxidation reaction and recovery of the product with high selectivity and purity. Among others, benzaldehyde, anisaldehyde and vanillin can advantageously be prepared by this process.

Abstract: The invention relates to a metal-containing organosilica catalyst, and use thereof in metal-catalyzed reactions. The invention relates to a process of preparation of the metal-containing organosilica catalyst comprising i) mixing a silicon source with an hydrolytic solvent; ii) adding one or more metal catalyst or a precursor thereof; iii) treating the mixture of step ii) with a condensation catalyst and iv) optionally treating the mixture resulting from step iii) with one or more reducing or oxydating agent such as to provide the required oxidation level to the metal catalyst.

Abstract: Methods of coupling targeting molecules to multidentate aza ligands of general formula (I): in which: R1 through R5 and FG are as defined in the specification are presented. The aza ligands and/or the resulting conjugates may be labeled with bi-trivalent ions of the metal elements having atomic number ranging between 20 and 31, 39, 42, 43, 44, 49, and between 57 and 83, and radioisotopes chosen among 203Pb, 67Ga, 68Ga, 72As, 111In, 113In, 90Y, 97Ru, 62Cu, 64Cu, 52Fe, 52mMn, 140La, 175Yb, 153Sm, 166Ho, 149Pm, 177Lu, 142Pr, 159Gd, 212Bi, 47Sc, 149Pm, 67Cu, 111Ag, 199Au, 161Tb, 51Cr, 167Tm, 141Ce, 168Yb, 88Y, 165Dy, 166Dy, 97Ru, 103Ru, 186Re, 188Re, 99mTc, 211Bi, 212Bi, 213Bi, 214Bi, 105Rh, 109Pd, 117mSn, 177Sn and 199Au.

Abstract: Compounds of general formula (I): with substituents as defined herein and their chelates with bi-trivalent ions of the metal elements of atomic numbers 20 to 31, 39, 42, 43, 44, 49, and 57 to 83, and radioisotopes chosen among 203Pb, 67Ga, 68Ga, 72As, 111In, 113In, 90Y, 97Ru, 62Cu, 64Cu, 52Fe, 52mMn, 140La, 175Yb, 153Sm, 166Ho, 149Pm, 177Lu, 142Pr, 159Gd, 212Bi, 47Sc, 149Pm, 67Cu, 111Ag, 199Au, 161Tb, 51Cr, 167Tm, 141Ce, 168Yb, 88Y, 165Dy, 166Dy, 97Ru, 103Ru, 186Re, 99mTc, 211Bi, 213Bi, 214Bi, 105Rh, 109Pd, 177mSn, 177Sn and 199Au, as well as the salts thereof with physiologically compatible bases or acids.

Abstract: Compounds of general formula (I): in which: R1 is hydrogen, C1–C20 alkyl, C3–C10 cycloalkyl, C4–C20 cycloalkylalkyl, aryl, arylalkyl, or two R1, taken together, form a straight or cyclic C2–C10 alkylene group or an ortho disubstituted arylene; R2 is hydrogen, C1–C20 alkyl, C3–C10 cycloalkyl, C4–C20 cycloalkylalkyl, aryl or aryl alkyl optionally substituted with functional groups which allow conjugation with a suitable molecule able to interact with physiological systems; R3, R4 and R5 are hydrogen, C1–C20 alkyl, C3–C10 cycloalkyl, C4–C20 cycloalkylalkyl, aryl, arylalkyl; and their chelates with bi-trivalent ions of the metal elements having atomic number ranging between 20 and 31, 39, 42, 43, 44, 49, and between 57 and 83, and radioisotopes chosen among 203Pb 67Ga 68Ga 72As 111In 113In 90Y 97Ru 62Cu 64Cu 52Fe 52mMn 140La 175Yb 153Sm 166Ho 149Pm 177Lu 142Pr 159Gd 212Bi 47Sc 149Pm 67Cu, 111Ag, 199Au, 161Tb and 51Cr as well as the salts thereof with physiologically compatible bases or acids

Abstract: Compounds of general formula (I): in which: R1 through R5 are as defined in the specification FG, which can be the same or different, are carboxy, —PO3H2 or —RP(O)OH groups, wherein R is hydrogen, or an optionally substituted group selected from C1-C20 alkyl, C3-C10 cycloalkyl, C4-C20 cycloalkylalkyl, aryl, arylalkyl, a group bearing an acidic moiety, and a group bearing an amino moiety, each of which may be further optionally substituted with functional groups which allow conjugation with a suitable molecule able to interact with physiological systems; and their chelates with bi-trivalent ions of the metal elements having atomic number ranging between 20 and 31, 39, 42, 43, 44, 49, and between 57 and 83, and radioisotopes chosen among 203Pb, 67Ga, 68Ga, 72As, 111In, 113In, 90Y, 97Ru, 62Cu, 64Cu, 52Fe, 52mMn, 140La, 175Yb, 153Sm, 166Ho, 149Pm, 177Lu, 142Pr, 159Gd, 212Bi, 47Sc, 149Pm, 67Cu, 111Ag, 199Au, 161Tb, 51Cr, 167Tm, 141Ce, 168Yb, 88Y, 165Dy, 166Dy, 97Ru, 103Ru, 186Re, 188Re, 99mTc, 211Bi, 212Bi,

Abstract: Compounds of general formula (I): in which: R1 is hydrogen, C1-C20 alkyl, C3-C10 cycloalkyl, C4-C20 cycloalkylalkyl, aryl, arylalkyl, or two R1, taken together, form a straight or cyclic C2-C10 alkylene group or an ortho disubstituted arylene; R2 is hydrogen, C1-C20 alkyl, C3-C10 cycloalkyl, C4-C20 cycloalkylalkyl, aryl or aryl alkyl optionally substituted with functional groups which allow conjugation with a suitable molecule able to interact with physiological systems; R3, R4 and R5 are hydrogen, C1-C20 alkyl, C3-C10 cycloalkyl, C4-C20 cycloalkylalkyl, aryl, arylalkyl; and their chelates with bi-trivalent ions of the metal elements having atomic number ranging between 20 and 31, 39, 42, 43, 44, 49, and between 57 and 83, and radioisotopes chosen among 203Pb 67Ga 68Ga 72As 111In 113In 90Y 97Ru 62Cu 64Cu 52Fe 52mMn 140La 175Yb 153Sm 166Ho 149Pm 177Lu 142Pr 159Gd 212Bi 47Sc 149Pm 67Cu, 111Ag, 199Au, 161Tb and 51Cr as well as the salts thereof with physiologically compatible bases or acids.