Abstract: A new approach to fabricating regularly patterned nano-scale structures, by self assembly of the structures is disclosed, where a pattern of nano-lines are deposited on a substrate and nano-structures are grown by self assembly in regions between the lines to form regular or patterned nano-scale structures, which are ideally suited for the construction nano-scale materials, nano-scale electronic devices and other nano-scale objects, apparatuses or devices. The invention also relates to methods of making and using same.

Abstract: Determining stress and productivity insights based on computerized data is described. Productivity data and stress-related behavior data associated with a user may be determined. The stress-related behavior data may be based on sensor data received from sensor(s) associated with a device corresponding to the user. The stress-related behavior data may be utilized to determine a first value indicative of stress associated with the user and the productivity data may be utilized to determine a second value indicative of productivity of the user. The productivity data, the stress-related behavior data, the first value, and/or the second value may be utilized to determine a recommendation. The recommendation may be intended to modify the first value and/or the second value. A user interface configured to communicate the recommendation to the user may be presented via the device.

Abstract: A new approach to fabricating regularly patterned nano-scale structures, by self assembly of the structures is disclosed, where a pattern of nano-lines are deposited on a substrate and nano-structures are grown by self assembly in regions between the lines to form regular or patterned nano-scale structures, which are ideally suited for the construction nano-scale materials, nano-scale electronic devices and other nano-scale objects, apparatuses or devices. The invention also relates to methods of making and using same.