Abstract: A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of depths relative to the substrate. The manufacturing system performs a deposition of a second material over the profile created in the etch-compatible film. The manufacturing system performs a planarization of the second material to obtain a plurality of etch heights of the second material in accordance with the plurality of depths in the profile created in the etch-compatible film. The manufacturing system performs a lithographic patterning of a photoresist deposited over the planarized second material to obtain the plurality of etch heights and one or more duty cycles in the second material.

Abstract: A waveguide display includes a first substrate and one or more grating layers on a first surface of the first substrate. The one or more grating layers are configured to cause destructive interference between ambient light diffracted by at least two grating layers or between ambient light diffracted by different portions of one grating layer. In some embodiments, the waveguide display also includes an angular-selective transmissive layer. The angular-selective transmissive layer is configured to reflect, diffract, or absorb ambient light incident on the angular-selective reflective layer with an incidence angle greater than a threshold value.

Abstract: A waveguide display includes a substrate having two opposite surfaces, and a slanted grating at a first surface of the two opposite surfaces of the substrate. The slanted grating includes a plurality of ridges and is characterized by a grating period in one direction. The plurality of ridges is tilted at a slant angle with respect to a surface normal of the first surface and is characterized by a height. The height of the plurality of ridges, the grating period, and the slant angle are configured to cause destructive interference between ambient light diffracted by the slanted grating. In some embodiments, a difference between the height of the plurality of ridges and an integer multiple of the grating period divided by the tangent of the slant angle is less than a threshold value.

Abstract: A three-dimensional diffraction grating is generated by selective deposition and/or selective etching. The three-dimensional diffraction grating includes a substrate and a plurality of structures located at different positions on the substrate. The structures have different materials. Edges of at least some of the structures are aligned. The three-dimensional diffraction grating includes different materials and aligned edges in all three dimensions. With the different materials and aligned edges, the three-dimensional diffraction gratings is configured to eliminate display artifacts, such as ghost, rainbow, etc.