Patents by Inventor Giuseppe Tandoi

Giuseppe Tandoi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11757256
    Abstract: A multi-junction VCSEL is formed by as a compact structure that reduces lateral current spreading by reducing the spacing between adjacent active regions in the stack of such regions used to from the multi-junction device. At least two of the active regions within the stack are located adjacent peaks of the intensity profile of the VCSEL, with an intervening tunnel junction positioned at a trough between the two peaks. The alignment of the active regions with the peaks maximizes the generated optical power, while the alignment of the tunnel junction with the trough minimizes optical loss. The close spacing on adjacent peaks forms a compact structure (which may even include a cavity having a sub-? optical length) that lessens the total path traveled by carriers and therefore reduces lateral current spread.
    Type: Grant
    Filed: March 3, 2022
    Date of Patent: September 12, 2023
    Assignee: II-VI Delaware, Inc.
    Inventor: Giuseppe Tandoi
  • Publication number: 20230208103
    Abstract: Modification of the topology of selected regions of individual VCSEL devices during fabrication is utilized to provide an array output beam with specific characteristics (e.g., “uniform” output power across the array). These physical features include at least the width of the metal aperture, the width of the oxide aperture, and/or the geometry of the contact ring structure on the top of the VCSEL device. The modifications may also function to adjust the numerical apertures (NAs) of the devices, the beam waist, wallplug efficiency, and the like.
    Type: Application
    Filed: February 15, 2023
    Publication date: June 29, 2023
    Applicant: II-VI Delaware, Inc.
    Inventors: Giuseppe Tandoi, Norbert Lichtenstein, Lukas Mutter, Andre Bisig
  • Patent number: 11594857
    Abstract: Modification of the topology of selected regions of individual VCSEL devices during fabrication is utilized to provide an array output beam with specific characteristics (e.g., “uniform” output power across the array). These physical features include the width of the metal aperture, the width of the modal filter, and/or the geometry of the contact ring structure on the top of the VCSEL device. The modifications may also function to adjust the numerical apertures (NAs) of the devices, the beam waist, wallplug efficiency, and the like.
    Type: Grant
    Filed: February 15, 2019
    Date of Patent: February 28, 2023
    Assignee: II-VI Delaware Inc.
    Inventors: Giuseppe Tandoi, Norbert Lichtenstein, Lukas Mutter, Andre Bisig
  • Publication number: 20220190559
    Abstract: A multi-junction VCSEL is formed by as a compact structure that reduces lateral current spreading by reducing the spacing between adjacent active regions in the stack of such regions used to from the multi-junction device. At least two of the active regions within the stack are located adjacent peaks of the intensity profile of the VCSEL, with an intervening tunnel junction positioned at a trough between the two peaks. The alignment of the active regions with the peaks maximizes the generated optical power, while the alignment of the tunnel junction with the trough minimizes optical loss. The close spacing on adjacent peaks forms a compact structure (which may even include a cavity having a sub-? optical length) that lessens the total path traveled by carriers and therefore reduces lateral current spread.
    Type: Application
    Filed: March 3, 2022
    Publication date: June 16, 2022
    Applicant: II-VI Delaware, Inc.
    Inventor: Giuseppe Tandoi
  • Patent number: 11303098
    Abstract: A multi-junction VCSEL is formed by as a compact structure that reduces lateral current spreading by reducing the spacing between adjacent active regions in the stack of such regions used to from the multi-junction device. At least two of the active regions within the stack are located adjacent peaks of the intensity profile of the VCSEL, with an intervening tunnel junction positioned at a trough between the two peaks. The alignment of the active regions with the peaks maximizes the generated optical power, while the alignment of the tunnel junction with the trough minimizes optical loss. The close spacing on adjacent peaks forms a compact structure (which may even include a cavity having a sub-? optical length) that lessens the total path traveled by carriers and therefore reduces lateral current spread.
    Type: Grant
    Filed: November 18, 2020
    Date of Patent: April 12, 2022
    Assignee: II-VI Delaware, Inc.
    Inventor: Giuseppe Tandoi
  • Publication number: 20210408762
    Abstract: Modification of the topology of selected regions of individual VCSEL devices during fabrication is utilized to provide an array output beam with specific characteristics (e.g., “uniform” output power across the array). These physical features include the width of the metal aperture, the width of the modal filter, and/or the geometry of the contact ring structure on the top of the VCSEL device. The modifications may also function to adjust the numerical apertures (NAs) of the devices, the beam waist, wallplug efficiency, and the like.
    Type: Application
    Filed: February 15, 2019
    Publication date: December 30, 2021
    Applicant: II-VI Delaware, Inc.
    Inventors: Giuseppe Tandoi, Norbert Lichtenstein, Lukas Mutter, Andre Bisig
  • Publication number: 20210336420
    Abstract: A vertical cavity surface emitting laser (VCSEL) device includes an oxide aperture layer positioned in close proximity to the active region of the device, typically within the cavity itself, as opposed to being positioned in the top DBR of the VCSEL. Reducing the spacing between the active region and the oxide aperture layer has been found to reduce the spread of current across the surface of the active region, allowing for a lower threshold current to be achieved. The closer positioning of the oxide aperture layer also reduced optical absorption and series resistance. The oxide aperture layer may be located at the first null in the standing wave pattern between the active region and the top DBR to minimize divergence of the beam and control the optical mode.
    Type: Application
    Filed: April 27, 2020
    Publication date: October 28, 2021
    Applicant: II-VI Delaware, Inc.
    Inventor: Giuseppe Tandoi