Patents by Inventor Glen P. Sundstrom
Glen P. Sundstrom has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11926550Abstract: A method including directing an aqueous solution having dissolved carbon dioxide and dissolved ozone into a vessel, removing an amount of the dissolved carbon dioxide and irradiating the effluent with ultraviolet light to decompose an amount of the dissolved ozone is disclosed. The method may include removing the dissolved carbon dioxide by controlling pH. The method may include removing the dissolved carbon dioxide by contact with a membrane degasifier. A system including a channel fluidly connectable to a source of an aqueous solution having dissolved carbon dioxide and dissolved ozone, a dissolved carbon dioxide removal subsystem, and a source of ultraviolet irradiation is also disclosed. The dissolved carbon dioxide removal subsystem may include a source of a pH adjuster. The dissolved carbon dioxide removal subsystem may include a membrane degasifier.Type: GrantFiled: October 29, 2019Date of Patent: March 12, 2024Assignee: Evoqua Water Technologies LLCInventor: Glen P. Sundstrom
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Publication number: 20230357056Abstract: According to various aspects and embodiments, a system and method for polishing ultrapure water (UPW) is disclosed. The water polishing system includes a source of ultrapure water (UPW), an ultrafiltration (UF) module having an inlet and a permeate outlet, a recirculation conduit communicating the permeate outlet with the inlet and forming a recirculation loop, a recirculation pump disposed along the recirculation conduit upstream from the inlet of the UF module and fluidly coupled to the source of UPW, a supply conduit fluidly coupled to the recirculating conduit and a demand source, the supply conduit positioned downstream from the permeate outlet, and a pressure control valve disposed along the recirculation conduit downstream from the supply conduit and configured to maintain pressure of permeate at a predetermined value.Type: ApplicationFiled: June 29, 2023Publication date: November 9, 2023Inventors: Boris Eliosov, Bruce Lee Coulter, Glen P. Sundstrom
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Patent number: 11702351Abstract: According to various aspects and embodiments, a system and method for polishing ultrapure water (UPW) is disclosed. The water polishing system includes a source of ultrapure water (UPW), an ultrafiltration (UF) module having an inlet and a permeate outlet, a recirculation conduit communicating the permeate outlet with the inlet and forming a recirculation loop, a recirculation pump disposed along the recirculation conduit upstream from the inlet of the UF module and fluidly coupled to the source of UPW, a supply conduit fluidly coupled to the recirculating conduit and a demand source, the supply conduit positioned downstream from the permeate outlet, and a pressure control valve disposed along the recirculation conduit downstream from the supply conduit and configured to maintain pressure of permeate at a predetermined value.Type: GrantFiled: June 21, 2021Date of Patent: July 18, 2023Assignee: Evoqua Water Technologies LLCInventors: Boris Eliosov, Glen P. Sundstrom, Bruce L. Coulter
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Publication number: 20210403358Abstract: A method including directing an aqueous solution having dissolved carbon dioxide and dissolved ozone into a vessel, removing an amount of the dissolved carbon dioxide and irradiating the effluent with ultraviolet light to decompose an amount of the dissolved ozone is disclosed. The method may include removing the dissolved carbon dioxide by controlling pH. The method may include removing the dissolved carbon dioxide by contact with a membrane degasifier. A system including a channel fluidly connectable to a source of an aqueous solution having dissolved carbon dioxide and dissolved ozone, a dissolved carbon dioxide removal subsystem, and a source of ultraviolet irradiation is also disclosed. The dissolved carbon dioxide removal subsystem may include a source of a pH adjuster. The dissolved carbon dioxide removal subsystem may include a membrane degasifier.Type: ApplicationFiled: October 29, 2019Publication date: December 30, 2021Applicant: Evoqua Water Technologies LLCInventor: Glen P. Sundstrom
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Publication number: 20210323843Abstract: According to various aspects and embodiments, a system and method for polishing ultrapure water (UPW) is disclosed. The water polishing system includes a source of ultrapure water (UPW), an ultrafiltration (UF) module having an inlet and a permeate outlet, a recirculation conduit communicating the permeate outlet with the inlet and forming a recirculation loop, a recirculation pump disposed along the recirculation conduit upstream from the inlet of the UF module and fluidly coupled to the source of UPW, a supply conduit fluidly coupled to the recirculating conduit and a demand source, the supply conduit positioned downstream from the permeate outlet, and a pressure control valve disposed along the recirculation conduit downstream from the supply conduit and configured to maintain pressure of permeate at a predetermined value.Type: ApplicationFiled: June 21, 2021Publication date: October 21, 2021Applicant: Evoqua Water Technologies LLCInventors: Boris Eliosov, Glen P. Sundstrom, Bruce L. Coulter
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Patent number: 11072545Abstract: According to various aspects and embodiments, a system and method for polishing ultrapure water (UPW) is disclosed. The water polishing system includes a source of ultrapure water (UPW), an ultrafiltration (UF) module having an inlet and a permeate outlet, a recirculation conduit communicating the permeate outlet with the inlet and forming a recirculation loop, a recirculation pump disposed along the recirculation conduit upstream from the inlet of the UF module and fluidly coupled to the source of UPW, a supply conduit fluidly coupled to the recirculating conduit and a demand source, the supply conduit positioned downstream from the permeate outlet, and a pressure control valve disposed along the recirculation conduit downstream from the supply conduit and configured to maintain pressure of permeate at a predetermined value.Type: GrantFiled: September 15, 2017Date of Patent: July 27, 2021Assignee: Evoqua Water Technologies LLCInventors: Boris Eliosov, Glen P. Sundstrom, Bruce L. Coulter
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Publication number: 20210181167Abstract: A method of determining composition of an aqueous solution is disclosed. The method includes obtaining the aqueous solution, removing oxygen from the aqueous solution, determining concentration of dissolved oxygen, removing hydrogen peroxide from the aqueous solution, and determining concentration of dissolved oxygen. The method includes calculating the difference between the concentrations of dissolved oxygen to determine concentration of hydrogen peroxide. A system for determining composition of an aqueous solution is also disclosed. The system includes a feed line connectable to a source of the aqueous solution, an oxygen removal unit, a hydrogen peroxide removal unit, and dissolved oxygen analyzers.Type: ApplicationFiled: August 13, 2019Publication date: June 17, 2021Applicant: Evoqua Water Technologies LLCInventor: Glen P. Sundstrom
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Publication number: 20190241446Abstract: According to various aspects and embodiments, a system and method for polishing ultrapure water (UPW) is disclosed. The water polishing system includes a source of ultrapure water (UPW), an ultrafiltration (UF) module having an inlet and a permeate outlet, a recirculation conduit communicating the permeate outlet with the inlet and forming a recirculation loop, a recirculation pump disposed along the recirculation conduit upstream from the inlet of the UF module and fluidly coupled to the source of UPW, a supply conduit fluidly coupled to the recirculating conduit and a demand source, the supply conduit positioned downstream from the permeate outlet, and a pressure control valve disposed along the recirculation conduit downstream from the supply conduit and configured to maintain pressure of permeate at a predetermined value.Type: ApplicationFiled: September 15, 2017Publication date: August 8, 2019Inventors: Boris Eliosov, Glen P. Sundstrom, Bruce L. Coulter