Abstract: A solid electrolyte including zwitterionic compounds comprising zwitterionic molecules and/or charge neutral polymers with zwitterion pendants. A salt is distributed through the solid such that the solid conducts alkali metal ions obtained from the salt and the zwitterionic compounds each include zero or more amorphous regions and one or more crystalline regions characterized by (1) a presence of Bragg diffraction peaks in an X-ray diffraction measurement of the solid; and (2) the solid having an ion conductivity of at least 10?4 S/cm at a temperature of 50 degrees Celsius when a transport number for the alkali metal ions is at least 0.5 and a molar ratio of the salt to the zwitterionic units is 0.9. The electrolyte exhibits surprisingly high alkali metal ion conductivity and linear elastic modulus over a wide range of practically useful temperatures.

Abstract: Disclosed herein is a pattern forming method comprising disposing upon a substrate a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottlebrush polymer; and where the bottlebrush polymer comprises a polymer that has a lower or a higher surface energy than the block copolymer; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer of the block copolymer to form a morphology of periodic domains formed from the first polymer and the second polymer; where a longitudinal axis of the periodic domains are parallel to the substrate.

Abstract: Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottlebrush polymer; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent.

Abstract: Disclosed herein is a pattern forming method comprising providing a substrate devoid of a layer of a brush polymer; disposing upon the substrate a composition comprising a block copolymer comprising a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other; and an additive polymer where the additive polymer comprises a bottlebrush polymer; where the bottlebrush polymer comprises a polymeric chain backbone and a grafted polymer that are bonded to each other; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer.

Abstract: Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottle brush polymer; where the bottle brush polymer comprises a homopolymer that is the chemically and structurally the same as one of the polymers in the block copolymer or where the additive polymer comprises a graft copolymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent.

Abstract: Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottlebrush polymer; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent.

Abstract: Disclosed herein is a pattern forming method comprising disposing upon a substrate a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottlebrush polymer; and where the bottlebrush polymer comprises a polymer that has a lower or a higher surface energy than the block copolymer; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer of the block copolymer to form a morphology of periodic domains formed from the first polymer and the second polymer; where a longitudinal axis of the periodic domains are parallel to the substrate.

Abstract: Disclosed herein is a pattern forming method comprising providing a substrate devoid of a layer of a brush polymer; disposing upon the substrate a composition comprising a block copolymer comprising a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other; and an additive polymer where the additive polymer comprises a bottlebrush polymer; where the bottlebrush polymer comprises a polymeric chain backbone and a grafted polymer that are bonded to each other; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer.

Abstract: Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottle brush polymer; where the bottle brush polymer comprises a homopolymer that is the chemically and structurally the same as one of the polymers in the block copolymer or where the additive polymer comprises a graft copolymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent.

Abstract: The invention provides compositions and methods for inducing and enhancing order and nanostructures in organosilicon block copolymers compositions by including certain organic additives in such compositions that include one or more moieties comprising a hydrogen bond acceptor or a hydrogen bond donor. Such block copolymer compositions may be used, for example, as a mask for lithographic patterning as is used, for example, during various stages of semiconductor device fabrication.

Abstract: The invention provides compositions and methods for inducing and enhancing order and nanostructures in organosilicon block copolymers compositions by including certain organic additives in such compositions that include one or more moieties comprising a hydrogen bond acceptor or a hydrogen bond donor. Such block copolymer compositions may be used, for example, as a mask for lithographic patterning as is used, for example, during various stages of semiconductor device fabrication.

Abstract: The invention provides compositions and methods for inducing and enhancing order and nanostructures in organosilicon block copolymers compositions by including certain organic additives in such compositions that include one or more moieties comprising a hydrogen bond acceptor or a hydrogen bond donor. Such block copolymer compositions may be used, for example, as a mask for lithographic patterning as is used, for example, during various stages of semiconductor device fabrication.

Abstract: The present invention relates to a thermoplastic elastomer composition which comprises a branched olefin copolymer comprising: a main chain of an ethylene/?-olefin copolymer; and a side chain derived from a crystalline propylene polymer containing a vinyl group at one end, wherein the content of ?-olefin in the main chain is 70 mol % or less, the composition has an elongation at break of 500% or higher, and has an elastic recovery rate of 70% or more when recovering from an extension to 300% elongation, and a process for manufacturing the same.

Abstract: Junction-functionalized block copolymers can be used in forming nanostructures. A junction-functionalized block copolymer can include a first polymer block joined to a second polymer block by a junction, where the junction includes one or more electrostatically charged moieties. The block copolymer can include a moiety of formula (I): A-J-B??(I) where A is a first polymer block, B is a second polymer block, where the A block and the B block are chemically dissimilar, and J is a junction linking the A block to the B block, and including one or more electrostatically charged moieties.

Abstract: Polyolefin block and graft copolymers comprised of two or more semicrystalline polyolefin blocks or grafts and one or more amorphous polyolefin blocks can be blended with a low molecular weight fluid diluent that preferentially locates within and swells the amorphous domains of the block or graft copolymer, while preserving the crystallinity of the semicrystalline block domains. After mechanical or thermomechanical processing, such compositions combine softness with high strength and high recoverable elasticity. Compositions are also disclosed whereby the diluent species is removed from the composition, either before or after the mechanical or thermomechanical processing, in order to create a strong elastic material with an ultra-low entanglement density within the amorphous domains.

Abstract: The present invention relates to a thermoplastic elastomer composition which comprises a branched olefin copolymer comprising: a main chain of an ethylene/?-olefin copolymer; and a side chain derived from a crystalline propylene polymer containing a vinyl group at one end, wherein the content of ?-olefin in the main chain is 70 mol % or less, the composition has an elongation at break of 500% or higher, and has an elastic recovery rate of 70% or more when recovering from an extension to 300% elongation, and a process for manufacturing the same.

Abstract: A polymer electrolyte composition including a metal salt and at least one polymer comprising a poly(glycidyl ether), where the at least one polymer is amorphous at ambient temperature. The poly(glycidyl ether) polymer can be a blend of poly(glycidyl ether) polymers, can be a poly(glycidyl ether) polymer blended with a mechanically strong solid polymer, and can be a block of a block copolymer that also includes a polymer block forming a mechanically strong solid polymer.

Abstract: The invention provides compositions and methods for inducing and enhancing order and nanostructures in organosilicon block copolymers compositions by including certain organic additives in such compositions that include one or more moieties comprising a hydrogen bond acceptor or a hydrogen bond donor. Such block copolymer compositions may be used, for example, as a mask for lithographic patterning as is used, for example, during various stages of semiconductor device fabrication.

Abstract: The present invention provides a block copolymer composition and method of making the same having the structures (A2-B)n-X-(A1) or (A2-B2)n-X-(B1A1), where A1 and A2 are each a polymer block of a monoalkenyl arene and B, B1, and B2 are each a polymer block of one or more conjugated dienes or a hydrogenated diene polymer, n is an integer from 2 to 30 and X is the residue of a coupling agent.

Abstract: The present invention provides a block copolymer composition and method of making the same having the structures (A2-B)n—X-(A1) or (A2-B2)n—X—(B1A1), where A1 and A2 are each a polymer block of a monoalkenyl arene and B, B1, and B2 are each a polymer block of one or more conjugated dienes or a hydrogenated diene polymer, n is an integer from 2 to 30 and X is the residue of a coupling agent.