Patents by Inventor Glenn H. Fredrickson

Glenn H. Fredrickson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10351727
    Abstract: Disclosed herein is a pattern forming method comprising disposing upon a substrate a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottlebrush polymer; and where the bottlebrush polymer comprises a polymer that has a lower or a higher surface energy than the block copolymer; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer of the block copolymer to form a morphology of periodic domains formed from the first polymer and the second polymer; where a longitudinal axis of the periodic domains are parallel to the substrate.
    Type: Grant
    Filed: February 25, 2016
    Date of Patent: July 16, 2019
    Assignee: DOW GLOBAL TECHNOLOGIES LLC
    Inventors: Phillip D. Hustad, Peter Trefonas, III, Valeriy V. Ginzburg, Bongkeun Kim, Glenn H. Fredrickson
  • Patent number: 9840637
    Abstract: Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottlebrush polymer; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent.
    Type: Grant
    Filed: February 25, 2016
    Date of Patent: December 12, 2017
    Assignees: DOW GLOBAL TECHNOLOGIES LLC, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Phillip D. Hustad, Peter Trefonas, III, Valeriy V. Ginzburg, Bongkeun Kim, Glenn H. Fredrickson
  • Patent number: 9772554
    Abstract: Disclosed herein is a pattern forming method comprising providing a substrate devoid of a layer of a brush polymer; disposing upon the substrate a composition comprising a block copolymer comprising a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other; and an additive polymer where the additive polymer comprises a bottlebrush polymer; where the bottlebrush polymer comprises a polymeric chain backbone and a grafted polymer that are bonded to each other; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer.
    Type: Grant
    Filed: February 25, 2016
    Date of Patent: September 26, 2017
    Assignees: DOW GLOBAL TECHNOLOGIES LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Phillip D. Hustad, Peter Trefonas, III, Valeriy V. Ginzburg, Bongkeun Kim, Glenn H. Fredrickson
  • Patent number: 9765214
    Abstract: Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottle brush polymer; where the bottle brush polymer comprises a homopolymer that is the chemically and structurally the same as one of the polymers in the block copolymer or where the additive polymer comprises a graft copolymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent.
    Type: Grant
    Filed: February 25, 2016
    Date of Patent: September 19, 2017
    Assignees: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, ROHM AND HAAS ELECTRONIC MATERIALS LLC, DOW GLOBAL TECHNOLOGIES LLC
    Inventors: Phillip D. Hustad, Peter Trefonas, III, Valeriy V. Ginzburg, Bongkeun Kim, Glenn H. Fredrickson
  • Publication number: 20160251508
    Abstract: Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottle brush polymer; where the bottle brush polymer comprises a homopolymer that is the chemically and structurally the same as one of the polymers in the block copolymer or where the additive polymer comprises a graft copolymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent.
    Type: Application
    Filed: February 25, 2016
    Publication date: September 1, 2016
    Inventors: Phillip D. Hustad, Peter Trefonas, III, Valeriy V. Ginzburg, Bongkeun Kim, Glenn H. Fredrickson
  • Publication number: 20160254141
    Abstract: Disclosed herein is a pattern forming method comprising providing a substrate devoid of a layer of a brush polymer; disposing upon the substrate a composition comprising a block copolymer comprising a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other; and an additive polymer where the additive polymer comprises a bottlebrush polymer; where the bottlebrush polymer comprises a polymeric chain backbone and a grafted polymer that are bonded to each other; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer.
    Type: Application
    Filed: February 25, 2016
    Publication date: September 1, 2016
    Inventors: Phillip D. Hustad, Peter Trefonas, III, Valeriy V. Ginzburg, Bongkeun Kim, Glenn H. Fredrickson
  • Publication number: 20160251538
    Abstract: Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottlebrush polymer; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent.
    Type: Application
    Filed: February 25, 2016
    Publication date: September 1, 2016
    Inventors: Phillip D. Hustad, Peter Trefonas, III, Valeriy V. Ginzburg, Bongkeun Kim, Glenn H. Fredrickson
  • Publication number: 20160251539
    Abstract: Disclosed herein is a pattern forming method comprising disposing upon a substrate a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer; where the additive polymer comprises a bottlebrush polymer; and where the bottlebrush polymer comprises a polymer that has a lower or a higher surface energy than the block copolymer; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer of the block copolymer to form a morphology of periodic domains formed from the first polymer and the second polymer; where a longitudinal axis of the periodic domains are parallel to the substrate.
    Type: Application
    Filed: February 25, 2016
    Publication date: September 1, 2016
    Inventors: Phillip D. Hustad, Peter Trefonas, III, Valeriy V. Ginzburg, Bongkeun Kim, Glenn H. Fredrickson
  • Patent number: 9388326
    Abstract: The invention provides compositions and methods for inducing and enhancing order and nanostructures in organosilicon block copolymers compositions by including certain organic additives in such compositions that include one or more moieties comprising a hydrogen bond acceptor or a hydrogen bond donor. Such block copolymer compositions may be used, for example, as a mask for lithographic patterning as is used, for example, during various stages of semiconductor device fabrication.
    Type: Grant
    Filed: September 9, 2015
    Date of Patent: July 12, 2016
    Assignee: The Regents of the University of California
    Inventors: Damien Montarnal, Craig J. Hawker, Edward J. Kramer, Glenn H. Fredrickson
  • Publication number: 20150376455
    Abstract: The invention provides compositions and methods for inducing and enhancing order and nanostructures in organosilicon block copolymers compositions by including certain organic additives in such compositions that include one or more moieties comprising a hydrogen bond acceptor or a hydrogen bond donor. Such block copolymer compositions may be used, for example, as a mask for lithographic patterning as is used, for example, during various stages of semiconductor device fabrication.
    Type: Application
    Filed: September 9, 2015
    Publication date: December 31, 2015
    Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Damien Montarnal, Craig J. Hawker, Edward J. Kramer, Glenn H. Fredrickson
  • Patent number: 9158200
    Abstract: The invention provides compositions and methods for inducing and enhancing order and nanostructures in organosilicon block copolymers compositions by including certain organic additives in such compositions that include one or more moieties comprising a hydrogen bond acceptor or a hydrogen bond donor. Such block copolymer compositions may be used, for example, as a mask for lithographic patterning as is used, for example, during various stages of semiconductor device fabrication.
    Type: Grant
    Filed: January 13, 2014
    Date of Patent: October 13, 2015
    Assignee: The Regents of the University of California
    Inventors: Damien Montarnal, Craig J. Hawker, Edward J. Kramer, Glenn H. Fredrickson
  • Patent number: 9139679
    Abstract: The present invention relates to a thermoplastic elastomer composition which comprises a branched olefin copolymer comprising: a main chain of an ethylene/?-olefin copolymer; and a side chain derived from a crystalline propylene polymer containing a vinyl group at one end, wherein the content of ?-olefin in the main chain is 70 mol % or less, the composition has an elongation at break of 500% or higher, and has an elastic recovery rate of 70% or more when recovering from an extension to 300% elongation, and a process for manufacturing the same.
    Type: Grant
    Filed: April 24, 2014
    Date of Patent: September 22, 2015
    Assignees: MITSUBISHI CHEMICAL CORPORATION, CORNELL UNIVERSITY
    Inventors: Hisashi Ohtaki, Fumihiko Shimizu, Geoffrey W. Coates, Glenn H. Fredrickson
  • Publication number: 20150197607
    Abstract: Junction-functionalized block copolymers can be used in forming nanostructures. A junction-functionalized block copolymer can include a first polymer block joined to a second polymer block by a junction, where the junction includes one or more electrostatically charged moieties. The block copolymer can include a moiety of formula (I): A-J-B??(I) where A is a first polymer block, B is a second polymer block, where the A block and the B block are chemically dissimilar, and J is a junction linking the A block to the B block, and including one or more electrostatically charged moieties.
    Type: Application
    Filed: December 17, 2014
    Publication date: July 16, 2015
    Inventors: Damien Montarnal, Yingdong Luo, Craig J. Hawker, Edward J. Kramer, Glenn H. Fredrickson
  • Patent number: 8993672
    Abstract: Polyolefin block and graft copolymers comprised of two or more semicrystalline polyolefin blocks or grafts and one or more amorphous polyolefin blocks can be blended with a low molecular weight fluid diluent that preferentially locates within and swells the amorphous domains of the block or graft copolymer, while preserving the crystallinity of the semicrystalline block domains. After mechanical or thermomechanical processing, such compositions combine softness with high strength and high recoverable elasticity. Compositions are also disclosed whereby the diluent species is removed from the composition, either before or after the mechanical or thermomechanical processing, in order to create a strong elastic material with an ultra-low entanglement density within the amorphous domains.
    Type: Grant
    Filed: April 8, 2008
    Date of Patent: March 31, 2015
    Assignee: The Regents of the University of California
    Inventors: Glenn H. Fredrickson, Edward J. Kramer, Zhigang Wang
  • Publication number: 20150057415
    Abstract: The present invention relates to a thermoplastic elastomer composition which comprises a branched olefin copolymer comprising: a main chain of an ethylene/?-olefin copolymer; and a side chain derived from a crystalline propylene polymer containing a vinyl group at one end, wherein the content of ?-olefin in the main chain is 70 mol % or less, the composition has an elongation at break of 500% or higher, and has an elastic recovery rate of 70% or more when recovering from an extension to 300% elongation, and a process for manufacturing the same.
    Type: Application
    Filed: April 24, 2014
    Publication date: February 26, 2015
    Applicants: MITSUBISHI CHEMICAL CORPORATION, CORNELL UNIVERSITY
    Inventors: Hisashi OHTAKI, Fumihiko SHIMIZU, Geoffrey W. COATES, Glenn H. FREDRICKSON
  • Patent number: 8911639
    Abstract: A polymer electrolyte composition including a metal salt and at least one polymer comprising a poly(glycidyl ether), where the at least one polymer is amorphous at ambient temperature. The poly(glycidyl ether) polymer can be a blend of poly(glycidyl ether) polymers, can be a poly(glycidyl ether) polymer blended with a mechanically strong solid polymer, and can be a block of a block copolymer that also includes a polymer block forming a mechanically strong solid polymer.
    Type: Grant
    Filed: December 16, 2011
    Date of Patent: December 16, 2014
    Assignee: The Regents of the University of California
    Inventors: Nathaniel A. Lynd, Glenn H. Fredrickson, Craig J. Hawker, Edward J. Kramer, Kate Barteau
  • Publication number: 20140197133
    Abstract: The invention provides compositions and methods for inducing and enhancing order and nanostructures in organosilicon block copolymers compositions by including certain organic additives in such compositions that include one or more moieties comprising a hydrogen bond acceptor or a hydrogen bond donor. Such block copolymer compositions may be used, for example, as a mask for lithographic patterning as is used, for example, during various stages of semiconductor device fabrication.
    Type: Application
    Filed: January 13, 2014
    Publication date: July 17, 2014
    Inventors: Damien Montarnal, Craig J. Hawker, Edward J. Kramer, Glenn H. Fredrickson
  • Patent number: 8552114
    Abstract: The present invention provides a block copolymer composition and method of making the same having the structures (A2-B)n-X-(A1) or (A2-B2)n-X-(B1A1), where A1 and A2 are each a polymer block of a monoalkenyl arene and B, B1, and B2 are each a polymer block of one or more conjugated dienes or a hydrogenated diene polymer, n is an integer from 2 to 30 and X is the residue of a coupling agent.
    Type: Grant
    Filed: November 30, 2012
    Date of Patent: October 8, 2013
    Assignee: Kraton Polymers U.S. LLC
    Inventors: Dale Lee Handlin, Jr., Peter Pasman, Glenn H. Fredrickson, Carl L. Willis, Robert C. Bening
  • Patent number: 8349950
    Abstract: The present invention provides a block copolymer composition and method of making the same having the structures (A2-B)n—X-(A1) or (A2-B2)n—X—(B1A1), where A1 and A2 are each a polymer block of a monoalkenyl arene and B, B1, and B2 are each a polymer block of one or more conjugated dienes or a hydrogenated diene polymer, n is an integer from 2 to 30 and X is the residue of a coupling agent.
    Type: Grant
    Filed: March 11, 2009
    Date of Patent: January 8, 2013
    Assignee: Kraton Polymers US LLC
    Inventors: Dale Lee Handlin, Jr., Peter Pasman, Glenn H. Fredrickson, Carl L. Willis, Robert C. Bening
  • Publication number: 20120326073
    Abstract: A polymer electrolyte composition including a metal salt and at least one polymer comprising a poly(glycidyl ether), where the at least one polymer is amorphous at ambient temperature. The poly(glycidyl ether) polymer can be a blend of poly(glycidyl ether) polymers, can be a poly(glycidyl ether) polymer blended with a mechanically strong solid polymer, and can be a block of a block copolymer that also includes a polymer block forming a mechanically strong solid polymer.
    Type: Application
    Filed: December 16, 2011
    Publication date: December 27, 2012
    Inventors: Nathaniel A. Lynd, Glenn H. Fredrickson, Craig J. Hawker, Edward J. Kramer, Kate Barteau