Patents by Inventor Glenn Holbrook

Glenn Holbrook has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240068098
    Abstract: A flow control arrangement includes a source conduit, a supply conduit, a shutoff valve, and a slow-close actuator. The shutoff valve connects the source conduit to the supply conduit. The slow-close actuator is connected to the shutoff valve to close the shutoff valve during a slow-close interval, the pyrophoric material detector is operably connected to the slow-close actuator to close the shutoff valve upon detection of a metastable mass of a pyrophoric material outside of the flow control arrangement, and the slow-close interval is sized to limit shock communicated to the metastable mass by closing of the shutoff valve and prevent rapid deflagration or detonation of the metastable mass of the pyrophoric material. Semiconductor processing systems including the flow control arrangement and related flow control methods are also described.
    Type: Application
    Filed: August 30, 2023
    Publication date: February 29, 2024
    Inventor: Glenn Holbrook
  • Publication number: 20240019879
    Abstract: A flow control arrangement is provided including a housing seating inlet and outlet conduits is provided. An isolation valve is arranged within the housing and is fluidly coupled to the inlet conduit. A first flow switch with a first shutoff trigger is arranged within the housing and fluidly couples the isolation valve to the outlet conduit. A second flow switch with a second shutoff trigger is arranged outside of the housing and is fluidly separated from the first flow switch. A controller operably connects the first and second flow switches to the isolation valve to close the isolation valve when (a) flow rate of a first fluid traversing the first flow switch is greater than the first shutoff trigger, or (b) flow rate of a second fluid traversing the second flow switch is less than the second shutoff trigger. Semiconductor processing systems and flow control methods are also described.
    Type: Application
    Filed: July 12, 2023
    Publication date: January 18, 2024
    Inventor: Glenn Holbrook
  • Publication number: 20240018656
    Abstract: A flow control arrangement includes a housing, an isolation valve, and a flow switch. The housing seats an inlet conduit and an outlet conduit. The isolation valve is arranged in the housing and is connected to the inlet conduit. The flow switch is arranged in the housing, is connected to the isolation valve, and fluidly couples the outlet conduit to the isolation valve. The flow switch further has a shutoff trigger and is operatively connected to the isolation valve to close the isolation valve when flow traversing the isolation valve is greater than the shutoff trigger. Semiconductor processing systems and flow control methods are also provided.
    Type: Application
    Filed: July 12, 2023
    Publication date: January 18, 2024
    Inventors: Glenn Holbrook, Mark Fessler
  • Publication number: 20240019880
    Abstract: A flow control arrangement includes a housing seating inlet and outlet conduits, an isolation valve arranged within the housing and is connected to the inlet conduit, a flow switch, and a bypass switch. The flow switch has a shutoff trigger, is arranged within the housing, and couples the isolation valve to the outlet conduit. The bypass switch is coupled to the isolation valve and has first and second positions. The flow switch is operably coupled to the isolation valve when the bypass switch is in the first position to close the isolation valve when flow rate of fluid traversing the flow switch rises above the shutoff trigger, and is operably decoupled from the isolation valve when the bypass switch is in the second position to flow fluid through the flow switch at flow rates greater than the shutoff trigger. Semiconductor processing systems and related flow control methods are also described.
    Type: Application
    Filed: July 12, 2023
    Publication date: January 18, 2024
    Inventors: Glenn Holbrook, Mark Fessler
  • Publication number: 20220380900
    Abstract: A gas system includes an enclosure, a process gas metering valve, a shutoff valve, and a flow switch. The process gas metering valve arranged within the enclosure to flow a process gas to a process chamber of a semiconductor processing system. The shutoff valve is connected to the process gas metering valve to fluidly separate the process gas metering valve from a process gas source. The flow switch is operably connected to the shutoff valve to cease flow of the process gas to the process chamber of the semiconductor processing system using the shutoff valve according to flow of a gas traversing the flow switch. Semiconductor processing systems, gas control methods, and gas system kits are also described.
    Type: Application
    Filed: May 23, 2022
    Publication date: December 1, 2022
    Inventors: Mark Fessler, Glenn Holbrook