Patents by Inventor Glenn W. Heffner

Glenn W. Heffner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7579418
    Abstract: The present invention relates to the process of extruding melt drawing fluoropolymer onto conductor to form insulated conductor at a line speed of at least 533 m/min and having no more than 10 sparks and no more than 2 lumps/13.7 km of insulated conductor under conditions that comprise an adequate process window to allow for these results to be obtained at different conditions within the process window. The invention identifies the critical parameters for achieving this process window, namely melt flow rate of the fluoropolymer, preferably being 30±3 g/10 min, and the melt temperature of the extruding/melt-drawing step, preferably being 393° C.±6° C.
    Type: Grant
    Filed: April 27, 2004
    Date of Patent: August 25, 2009
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Patrick Anthony DeFeo, Glenn W. Heffner, Niall D. McKee, Sundar Kilnagar Venkataraman
  • Publication number: 20040232580
    Abstract: The present invention relates to the process of extruding melt drawing fluoropolymer onto conductor to form insulated conductor at a line speed of at least 533 m/min and having no more than 10 sparks and no more than 2 lumps/13.7 km of insulated conductor under conditions that comprise an adequate process window to allow for these results to be obtained at different conditions within the process window. The invention identifies the critical parameters for achieving this process window, namely melt flow rate of the fluoropolymer, preferably being 30±3 g/10 min, and the melt temperature of the extruding/melt-drawing step, preferably being 393° C.±6° C.
    Type: Application
    Filed: April 27, 2004
    Publication date: November 25, 2004
    Inventors: Patrick Anthony Defeo, Glenn W. Heffner, Niall D. Mckee, Sundar Kilnagar Venkataraman