Patents by Inventor Go Otani

Go Otani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200199352
    Abstract: There is provided an epoxy resin composition comprising a (meth)acrylic copolymer (A), an epoxy resin (B), and a curing agent (C), wherein the (meth)acrylic copolymer (A) has a constituent unit derived from a macromonomer (a) and a constituent unit derived from a vinyl monomer (b), and wherein a glass transition temperature (TgB) of a polymer obtained by polymerizing only the vinyl monomer (b) is 25° C. or less.
    Type: Application
    Filed: March 2, 2020
    Publication date: June 25, 2020
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Eri MASUDA, Junichi NAKAMURA, Kazuyoshi ODAKA, Sora TOMITA, Go OTANI
  • Patent number: 10545446
    Abstract: The present invention performs inplane uneven density correction that suppresses a number of tone correction properties and has few correction residuals. Accordingly, a holding unit of an apparatus of the present invention holds a plurality of tone correction properties respectively corresponding to a plurality of spot diameters that divide a range of a spot diameter of a light exposed on a surface of a photoreceptor by a predetermined interval. In addition a setting unit sets a tone correction property selected from the plurality of tone correction properties based on a spot diameter on the photoreceptor for a pixel corresponding to pixel data C. A correction unit corrects the pixel data C based on the set tone correction property, to generate tone correction data Cc.
    Type: Grant
    Filed: November 15, 2016
    Date of Patent: January 28, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Yoichi Takikawa, Ryosuke Otani, Hidenori Kanazawa, Go Araki, Hisashi Ishikawa
  • Patent number: 10259149
    Abstract: A structure with a substrate, and a fine-unevenness-structure layer provided to at least one surface of the substrate, wherein the fine-unevenness-structure layer is disposed at a surface of the structure, the indentation elastic modulus of the structure is 1-1300 MPa, and the ratio (??) of the rate of change of the coefficient of kinetic friction of the surface of the structure is 0.15-1.05, wherein ??=??f/??s: ??s represents the rate of change of the coefficient of kinetic friction of the surface of the structure at an initial-abrasion stage of a reciprocating abrasion test; and ??f represents the rate of change of the coefficient of kinetic friction of the surface of the structure immediately prior to the end of the reciprocating abrasion test. This structure exhibits excellent scratch resistance without compromising on the optical performance thereof, such as the antireflection performance.
    Type: Grant
    Filed: September 18, 2014
    Date of Patent: April 16, 2019
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Seiichiro Mori, Kousuke Fujiyama, Go Otani, Yusuke Nakai, Tetsuya Jigami
  • Publication number: 20190077898
    Abstract: Provided is a macromonomer copolymer (Y) including a monomer unit of a specific macromonomer (A) and a monomer unit of a comonomer (B) copolymerizable with the macromonomer (A), in which a value of Hx represented by a specific expression is 0.05 to 0.40.
    Type: Application
    Filed: November 14, 2018
    Publication date: March 14, 2019
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Go OTANI, Taeko Oonuma, Yoshiko Irie
  • Patent number: 9718910
    Abstract: Provided is an article having high scratch resistance and satisfactory fingerprint wipeability. Disclosed is an article having a microrelief structure containing a cured product of a resin composition on the surface, in which the indentation elastic modulus (X) [MPa] and the creep deformation ratio (Y) [%] of the cured product satisfy the following formulas (1) and (2): 80?X?560??(1) Y?(0.00022X?0.01)×100??(2).
    Type: Grant
    Filed: June 17, 2013
    Date of Patent: August 1, 2017
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Go Otani, Seiichiro Mori, Masashi Ikawa, Yusuke Nakai, Keiko Yasukawa, Shinji Makino
  • Publication number: 20160229095
    Abstract: A structure with a substrate, and a fine-unevenness-structure layer provided to at least one surface of the substrate, wherein the fine-unevenness-structure layer is disposed at a surface of the structure, the indentation elastic modulus of the structure is 1-1300 MPa, and the ratio (??) of the rate of change of the coefficient of kinetic friction of the surface of the structure is 0.15-1.05, wherein ??=??f/??s: ??s represents the rate of change of the coefficient of kinetic friction of the surface of the structure at an initial-abrasion stage of a reciprocating abrasion test; and ??f represents the rate of change of the coefficient of kinetic friction of the surface of the structure immediately prior to the end of the reciprocating abrasion test. This structure exhibits excellent scratch resistance without compromising on the optical performance thereof, such as the antireflection performance.
    Type: Application
    Filed: September 18, 2014
    Publication date: August 11, 2016
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Seiichiro MORI, Kousuke FUJIYAMA, Go OTANI, Yusuke NAKAI, Tetsuya JIGAMI
  • Publication number: 20160116642
    Abstract: Provided is a laminate including a substrate and a surface layer laminated onto the substrate. The surface layer of the laminate has a microscopic asperity structure formed on the surface thereof on the opposite side from the substrate, this surface layer being a cured material obtained by curing of an active energy beam-curing composition. This active energy beam-curing composition is an active energy beam-curing composition containing particles that, where the interval between adjacent convex portions of the microscopic asperity structure is 100%, have an average particle diameter equal to 80% or more of this interval.
    Type: Application
    Filed: May 21, 2014
    Publication date: April 28, 2016
    Applicant: MITSUBISHI RAYON CO., LTD.
    Inventors: Kousuke FUJIYAMA, Tetsuya JIGAMI, Yusuke NAKAI, Seiichiro MORI, Go OTANI
  • Publication number: 20160082688
    Abstract: A base, an intermediate layer and an outermost layer are sequentially laminated. The intermediate layer has a Martens hardness of 120 N/mm2 or more; outermost layer has an- elastic modulus recovery ratio of 70% or more; and surface of outermost layer is provided with microrelief structure that has pitch not more than the wavelength of visible light. A method for producing the multilayer structure, comprises an active energy ray curable resin composition having a polymerizable functional group arranged on a light-transmitting base, and active energy ray irradiation carried out, forming an intermediate layer with rate of reaction of the polymerizable functional group in the surface is 35-85% by moleStep; an active energy ray curable resin composition (Y) arranged between the intermediate layer and a mold for microrelief structure transfer Step; and second active energy ray irradiation is carried out from the base side, to form an outermost layer.
    Type: Application
    Filed: April 4, 2014
    Publication date: March 24, 2016
    Applicant: MITSUBISHI RAYON CO., LTD.
    Inventors: Yusuke NAKAI, Go OTANI, Satoru OZAWA, Tetsuya JIGAMI
  • Publication number: 20160054478
    Abstract: An article in which at least one surface of a base is provided with a microrelief structure layer that contains a cured product of an active energy ray curable resin composition. The active energy ray curable resin composition contains a polymerizable component (Z1), a photopolymerization initiator (D) and an additive (E). The additive (E) is not polymerizable, and the content of the additive (E) in the microrelief structure layer is 5 mg/m2 or less.
    Type: Application
    Filed: March 31, 2014
    Publication date: February 25, 2016
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Go OTANI, Yusuki NAKAI
  • Patent number: 9234065
    Abstract: The present invention provides an active energy ray-curable resin composition comprising at least a multifunctional monomer having three or more radical polymerizable functional groups in the molecule in which the cured product of the composition exhibits anti-reflective function because of an uneven microstructure formed on the surface of the cured product, and provides a product having the uneven microstructure having high decontaminating properties such as fingerprint removal properties and high scratch resistance.
    Type: Grant
    Filed: June 27, 2014
    Date of Patent: January 12, 2016
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Tsuyoshi Takihara, Eiko Okamoto, Go Otani, Yusuke Nakai
  • Patent number: 9138775
    Abstract: A method for preparing an article having an uneven microstructure on a surface thereof, including coating a surface of a mold having an uneven microstructure formed from an anodized alumina oxide on a surface with a release treatment solution including a mold release agent that includes one or more kinds of phosphoric ester compound and the pH of the aqueous solution when extracted with 50 mL of water with respect to 1 g of the mold release agent is 3.0 or more; and interposing an active energy ray curable resin composition including a polymerizable compound, a polymerization initiator, and an internal release agent between the mold and the substrate, and curing the active energy ray curable resin composition by the irradiation with active energy rays to form a cured resin layer having the uneven microstructure transferred on a surface of the substrate.
    Type: Grant
    Filed: May 25, 2012
    Date of Patent: September 22, 2015
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Go Otani, Yusuke Nakai, Satoru Ozawa
  • Publication number: 20150231854
    Abstract: One aspect of the present invention provides a laminate structure having two or more layers laminated, wherein at least two layers have a fine relief structure on surfaces thereof, a concave portion and a convex portion of a fine relief structure of an arbitrary layer are differently disposed from a concave portion and a convex portion of a fine relief structure of another at least one layer, and an interface is not release treated. Another aspect of the present invention provides a laminate structure having two or more layers laminated, wherein an outermost layer is a layer which does not have a fine relief structure on a surface thereof, and at least one layer other than the outermost layer has a fine relief structure on a surface thereof.
    Type: Application
    Filed: October 11, 2013
    Publication date: August 20, 2015
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Yusuke Nakai, Go Otani, Tetsuya Jigami
  • Patent number: 9062142
    Abstract: The present invention provides an active energy ray-curable resin composition comprising at least a multifunctional monomer having three or more radical polymerizable functional groups in the molecule in which the cured product of the composition exhibits anti-reflective function because of an uneven microstructure formed on the surface of the cured product, and provides a product having the uneven microstructure having high decontaminating properties such as fingerprint removal properties and high scratch resistance.
    Type: Grant
    Filed: January 12, 2012
    Date of Patent: June 23, 2015
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Tsuyoshi Takihara, Eiko Okamoto, Go Otani, Yusuke Nakai
  • Publication number: 20150166704
    Abstract: Provided is an article having high scratch resistance and satisfactory fingerprint wipeability. Disclosed is an article having a microrelief structure containing a cured product of a resin composition on the surface, in which the indentation elastic modulus (X) [MPa] and the creep deformation ratio (Y) [%] of the cured product satisfy the following formulas (1) and (2): 80?X?560??(1) Y?(0.00022X?0.01)×100??(2).
    Type: Application
    Filed: June 17, 2013
    Publication date: June 18, 2015
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Go Otani, Seiichiro Mori, Masashi Ikawa, Yusuke Nakai, Keiko Yasukawa, Shinji Makino
  • Publication number: 20150125659
    Abstract: The purpose of this embodiment is to provide a laminate equipped with a surface layer excellent in antifouling property that dirt can be easily removed and excoriation resistance. This embodiment is a laminate including a surface layer having a surface formed in a fine relief structure, wherein an elastic modulus of the surface layer is less than 250 MPa and a slope of a friction coefficient of the surface layer is 0.0018 or less.
    Type: Application
    Filed: June 14, 2013
    Publication date: May 7, 2015
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Kousuke Fujiyama, Seiichiro Mori, Go Otani, Masashi Ikawa, Yusuke Nakai, Tetsuya Jigami
  • Publication number: 20140314993
    Abstract: The present invention provides an active energy ray-curable resin composition comprising at least a multifunctional monomer having three or more radical polymerizable functional groups in the molecule in which the cured product of the composition exhibits anti-reflective function because of an uneven microstructure formed on the surface of the cured product, and provides a product having the uneven microstructure having high decontaminating properties such as fingerprint removal properties and high scratch resistance.
    Type: Application
    Filed: June 27, 2014
    Publication date: October 23, 2014
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Tsuyoshi Takihara, Eiko Okamoto, Go Otani, Yusuke Nakai
  • Publication number: 20140127463
    Abstract: Provided is an article having a micro uneven structure on a surface thereof, wherein the article is obtained by forming a micro uneven structure composed of a cured product of a solvent-free active energy ray curable resin composition on a substrate containing triacetylcellulose, wherein an average interval between two adjacent convex parts in the micro uneven structure is less than or equal to a visible light wavelength, and adhesion between the substrate containing triacetylcellulose and a layer composed of the cured product of the active energy ray curable resin composition is classified into any one of type 0 to 2 according to a crosscut method defined in ISO2409:1992 (JIS K 5600-5-6:1999).
    Type: Application
    Filed: July 4, 2012
    Publication date: May 8, 2014
    Applicant: MITSUBISHI RAYON CO., LTD.
    Inventors: Go Otani, Hiroshi Onomoto, Seiichiro Mori
  • Publication number: 20140077418
    Abstract: A method for preparing an article having an uneven microstructure on a surface thereof, including coating a surface of a mold having an uneven microstructure formed from an anodized alumina oxide on a surface with a release treatment solution including a mold release agent that includes one or more kinds of phosphoric ester compound and the pH of the aqueous solution when extracted with 50 mL of water with respect to 1 g of the mold release agent is 3.0 or more; and interposing an active energy ray curable resin composition including a polymerizable compound, a polymerization initiator, and an internal release agent between the mold and the substrate, and curing the active energy ray curable resin composition by the irradiation with active energy rays to form a cured resin layer having the uneven microstructure transferred on a surface of the substrate.
    Type: Application
    Filed: May 25, 2012
    Publication date: March 20, 2014
    Applicant: MITSUBISHI RAYON CO., LTD.
    Inventors: Go Otani, Yusuke Nakai, Satoru Ozawa
  • Publication number: 20130302564
    Abstract: The present invention provides an active energy ray-curable resin composition comprising at least a multifunctional monomer having three or more radical polymerizable functional groups in the molecule in which the cured product of the composition exhibits anti-reflective function because of an uneven microstructure formed on the surface of the cured product, and provides a product having the uneven microstructure having high decontaminating properties such as fingerprint removal properties and high scratch resistance.
    Type: Application
    Filed: January 12, 2012
    Publication date: November 14, 2013
    Applicant: MITSUBISHI RAYON CO., LTD.
    Inventors: Tsuyoshi Takihara, Eiko Okamoto, Go Otani, Yusuke Nakai