Patents by Inventor Go Otani
Go Otani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11884813Abstract: There is provided an epoxy resin composition comprising a (meth)acrylic copolymer (A), an epoxy resin (B), and a curing agent (C), wherein the (meth)acrylic copolymer (A) has a constituent unit derived from a macromonomer (a) and a constituent unit derived from a vinyl monomer (b), and wherein a glass transition temperature (TgB) of a polymer obtained by polymerizing only the vinyl monomer (b) is 25° C. or less.Type: GrantFiled: March 2, 2020Date of Patent: January 30, 2024Assignee: Mitsubishi Chemical CorporationInventors: Eri Masuda, Junichi Nakamura, Kazuyoshi Odaka, Sora Tomita, Go Otani
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Publication number: 20230340259Abstract: The present invention relates to a resin composition containing a polycarbonate resin (A) and a polymer (B), in which the polymer (B) is a copolymer containing a polymer chain (B1) and a polymer chain (B2); the polymer chain (B1) has a glass transition temperature (Tg) of higher than 80° C.; the polymer chain (B2) has a glass transition temperature (Tg) of lower than 0° C.; and a refractive index difference between the polycarbonate resin (A) and the polymer chain (B2) is less than 0.026.Type: ApplicationFiled: May 25, 2023Publication date: October 26, 2023Applicant: Mitsubishi Chemical CorporationInventors: Go OTANI, Akikazu MATSUMOTO
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Publication number: 20230002528Abstract: Provided is a copolymer which has a mass average molecular weight (Mw) of 240,000 or greater and 3,500,000 or less, a structural unit derived from an acrylate (B1) and a structural unit derived from aromatic vinyl (B2), and a branched structure.Type: ApplicationFiled: August 26, 2022Publication date: January 5, 2023Applicant: Mitsubishi Chemical CorporationInventors: Go Otani, Yu Tokura, Akira Yamauchi
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Publication number: 20220041856Abstract: These vinyl-based polymerizable group-containing silane compounds may be used alone, or two or more thereof may be used in combination. The content of the vinyl-based polymerizable group-containing silane compound is 1% by mass or more and 10% by mass or less, and preferably 1% by mass or more and 5% by mass or less, in 100% by mass of the organosiloxane mixture. When the amount of the vinyl-based polymerizable group-containing silane compound is the lower limit value or more, the peeling force and impact resistance of the obtained cured product tend to be high. When the amount of the vinyl-based polymerizable group-containing silane compound is the upper limit value or less, the peeling force and impact resistance of the obtained cured product tend to be high.Type: ApplicationFiled: October 14, 2021Publication date: February 10, 2022Applicant: Mitsubishi Chemical CorporationInventors: Hiroshi ONOMOTO, Kazuyoshi ODAKA, Go OTANI, Iho KAMIMURA
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Patent number: 10793660Abstract: Provided is a macromonomer copolymer (Y) including a monomer unit of a specific macromonomer (A) and a monomer unit of a comonomer (B) copolymerizable with the macromonomer (A), in which a value of Hx represented by a specific expression is 0.05 to 0.40.Type: GrantFiled: November 14, 2018Date of Patent: October 6, 2020Assignee: Mitsubishi Chemical CorporationInventors: Go Otani, Taeko Oonuma, Yoshiko Irie
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Publication number: 20200199352Abstract: There is provided an epoxy resin composition comprising a (meth)acrylic copolymer (A), an epoxy resin (B), and a curing agent (C), wherein the (meth)acrylic copolymer (A) has a constituent unit derived from a macromonomer (a) and a constituent unit derived from a vinyl monomer (b), and wherein a glass transition temperature (TgB) of a polymer obtained by polymerizing only the vinyl monomer (b) is 25° C. or less.Type: ApplicationFiled: March 2, 2020Publication date: June 25, 2020Applicant: Mitsubishi Chemical CorporationInventors: Eri MASUDA, Junichi NAKAMURA, Kazuyoshi ODAKA, Sora TOMITA, Go OTANI
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Patent number: 10259149Abstract: A structure with a substrate, and a fine-unevenness-structure layer provided to at least one surface of the substrate, wherein the fine-unevenness-structure layer is disposed at a surface of the structure, the indentation elastic modulus of the structure is 1-1300 MPa, and the ratio (??) of the rate of change of the coefficient of kinetic friction of the surface of the structure is 0.15-1.05, wherein ??=??f/??s: ??s represents the rate of change of the coefficient of kinetic friction of the surface of the structure at an initial-abrasion stage of a reciprocating abrasion test; and ??f represents the rate of change of the coefficient of kinetic friction of the surface of the structure immediately prior to the end of the reciprocating abrasion test. This structure exhibits excellent scratch resistance without compromising on the optical performance thereof, such as the antireflection performance.Type: GrantFiled: September 18, 2014Date of Patent: April 16, 2019Assignee: Mitsubishi Chemical CorporationInventors: Seiichiro Mori, Kousuke Fujiyama, Go Otani, Yusuke Nakai, Tetsuya Jigami
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Publication number: 20190077898Abstract: Provided is a macromonomer copolymer (Y) including a monomer unit of a specific macromonomer (A) and a monomer unit of a comonomer (B) copolymerizable with the macromonomer (A), in which a value of Hx represented by a specific expression is 0.05 to 0.40.Type: ApplicationFiled: November 14, 2018Publication date: March 14, 2019Applicant: Mitsubishi Chemical CorporationInventors: Go OTANI, Taeko Oonuma, Yoshiko Irie
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Patent number: 9718910Abstract: Provided is an article having high scratch resistance and satisfactory fingerprint wipeability. Disclosed is an article having a microrelief structure containing a cured product of a resin composition on the surface, in which the indentation elastic modulus (X) [MPa] and the creep deformation ratio (Y) [%] of the cured product satisfy the following formulas (1) and (2): 80?X?560??(1) Y?(0.00022X?0.01)×100??(2).Type: GrantFiled: June 17, 2013Date of Patent: August 1, 2017Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Go Otani, Seiichiro Mori, Masashi Ikawa, Yusuke Nakai, Keiko Yasukawa, Shinji Makino
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Publication number: 20160229095Abstract: A structure with a substrate, and a fine-unevenness-structure layer provided to at least one surface of the substrate, wherein the fine-unevenness-structure layer is disposed at a surface of the structure, the indentation elastic modulus of the structure is 1-1300 MPa, and the ratio (??) of the rate of change of the coefficient of kinetic friction of the surface of the structure is 0.15-1.05, wherein ??=??f/??s: ??s represents the rate of change of the coefficient of kinetic friction of the surface of the structure at an initial-abrasion stage of a reciprocating abrasion test; and ??f represents the rate of change of the coefficient of kinetic friction of the surface of the structure immediately prior to the end of the reciprocating abrasion test. This structure exhibits excellent scratch resistance without compromising on the optical performance thereof, such as the antireflection performance.Type: ApplicationFiled: September 18, 2014Publication date: August 11, 2016Applicant: Mitsubishi Rayon Co., Ltd.Inventors: Seiichiro MORI, Kousuke FUJIYAMA, Go OTANI, Yusuke NAKAI, Tetsuya JIGAMI
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Publication number: 20160116642Abstract: Provided is a laminate including a substrate and a surface layer laminated onto the substrate. The surface layer of the laminate has a microscopic asperity structure formed on the surface thereof on the opposite side from the substrate, this surface layer being a cured material obtained by curing of an active energy beam-curing composition. This active energy beam-curing composition is an active energy beam-curing composition containing particles that, where the interval between adjacent convex portions of the microscopic asperity structure is 100%, have an average particle diameter equal to 80% or more of this interval.Type: ApplicationFiled: May 21, 2014Publication date: April 28, 2016Applicant: MITSUBISHI RAYON CO., LTD.Inventors: Kousuke FUJIYAMA, Tetsuya JIGAMI, Yusuke NAKAI, Seiichiro MORI, Go OTANI
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Publication number: 20160082688Abstract: A base, an intermediate layer and an outermost layer are sequentially laminated. The intermediate layer has a Martens hardness of 120 N/mm2 or more; outermost layer has an- elastic modulus recovery ratio of 70% or more; and surface of outermost layer is provided with microrelief structure that has pitch not more than the wavelength of visible light. A method for producing the multilayer structure, comprises an active energy ray curable resin composition having a polymerizable functional group arranged on a light-transmitting base, and active energy ray irradiation carried out, forming an intermediate layer with rate of reaction of the polymerizable functional group in the surface is 35-85% by moleStep; an active energy ray curable resin composition (Y) arranged between the intermediate layer and a mold for microrelief structure transfer Step; and second active energy ray irradiation is carried out from the base side, to form an outermost layer.Type: ApplicationFiled: April 4, 2014Publication date: March 24, 2016Applicant: MITSUBISHI RAYON CO., LTD.Inventors: Yusuke NAKAI, Go OTANI, Satoru OZAWA, Tetsuya JIGAMI
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Publication number: 20160054478Abstract: An article in which at least one surface of a base is provided with a microrelief structure layer that contains a cured product of an active energy ray curable resin composition. The active energy ray curable resin composition contains a polymerizable component (Z1), a photopolymerization initiator (D) and an additive (E). The additive (E) is not polymerizable, and the content of the additive (E) in the microrelief structure layer is 5 mg/m2 or less.Type: ApplicationFiled: March 31, 2014Publication date: February 25, 2016Applicant: Mitsubishi Rayon Co., Ltd.Inventors: Go OTANI, Yusuki NAKAI
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Patent number: 9234065Abstract: The present invention provides an active energy ray-curable resin composition comprising at least a multifunctional monomer having three or more radical polymerizable functional groups in the molecule in which the cured product of the composition exhibits anti-reflective function because of an uneven microstructure formed on the surface of the cured product, and provides a product having the uneven microstructure having high decontaminating properties such as fingerprint removal properties and high scratch resistance.Type: GrantFiled: June 27, 2014Date of Patent: January 12, 2016Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Tsuyoshi Takihara, Eiko Okamoto, Go Otani, Yusuke Nakai
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Patent number: 9138775Abstract: A method for preparing an article having an uneven microstructure on a surface thereof, including coating a surface of a mold having an uneven microstructure formed from an anodized alumina oxide on a surface with a release treatment solution including a mold release agent that includes one or more kinds of phosphoric ester compound and the pH of the aqueous solution when extracted with 50 mL of water with respect to 1 g of the mold release agent is 3.0 or more; and interposing an active energy ray curable resin composition including a polymerizable compound, a polymerization initiator, and an internal release agent between the mold and the substrate, and curing the active energy ray curable resin composition by the irradiation with active energy rays to form a cured resin layer having the uneven microstructure transferred on a surface of the substrate.Type: GrantFiled: May 25, 2012Date of Patent: September 22, 2015Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Go Otani, Yusuke Nakai, Satoru Ozawa
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Publication number: 20150231854Abstract: One aspect of the present invention provides a laminate structure having two or more layers laminated, wherein at least two layers have a fine relief structure on surfaces thereof, a concave portion and a convex portion of a fine relief structure of an arbitrary layer are differently disposed from a concave portion and a convex portion of a fine relief structure of another at least one layer, and an interface is not release treated. Another aspect of the present invention provides a laminate structure having two or more layers laminated, wherein an outermost layer is a layer which does not have a fine relief structure on a surface thereof, and at least one layer other than the outermost layer has a fine relief structure on a surface thereof.Type: ApplicationFiled: October 11, 2013Publication date: August 20, 2015Applicant: Mitsubishi Rayon Co., Ltd.Inventors: Yusuke Nakai, Go Otani, Tetsuya Jigami
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Patent number: 9062142Abstract: The present invention provides an active energy ray-curable resin composition comprising at least a multifunctional monomer having three or more radical polymerizable functional groups in the molecule in which the cured product of the composition exhibits anti-reflective function because of an uneven microstructure formed on the surface of the cured product, and provides a product having the uneven microstructure having high decontaminating properties such as fingerprint removal properties and high scratch resistance.Type: GrantFiled: January 12, 2012Date of Patent: June 23, 2015Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Tsuyoshi Takihara, Eiko Okamoto, Go Otani, Yusuke Nakai
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Publication number: 20150166704Abstract: Provided is an article having high scratch resistance and satisfactory fingerprint wipeability. Disclosed is an article having a microrelief structure containing a cured product of a resin composition on the surface, in which the indentation elastic modulus (X) [MPa] and the creep deformation ratio (Y) [%] of the cured product satisfy the following formulas (1) and (2): 80?X?560??(1) Y?(0.00022X?0.01)×100??(2).Type: ApplicationFiled: June 17, 2013Publication date: June 18, 2015Applicant: Mitsubishi Rayon Co., Ltd.Inventors: Go Otani, Seiichiro Mori, Masashi Ikawa, Yusuke Nakai, Keiko Yasukawa, Shinji Makino
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Publication number: 20150125659Abstract: The purpose of this embodiment is to provide a laminate equipped with a surface layer excellent in antifouling property that dirt can be easily removed and excoriation resistance. This embodiment is a laminate including a surface layer having a surface formed in a fine relief structure, wherein an elastic modulus of the surface layer is less than 250 MPa and a slope of a friction coefficient of the surface layer is 0.0018 or less.Type: ApplicationFiled: June 14, 2013Publication date: May 7, 2015Applicant: Mitsubishi Rayon Co., Ltd.Inventors: Kousuke Fujiyama, Seiichiro Mori, Go Otani, Masashi Ikawa, Yusuke Nakai, Tetsuya Jigami
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Publication number: 20140314993Abstract: The present invention provides an active energy ray-curable resin composition comprising at least a multifunctional monomer having three or more radical polymerizable functional groups in the molecule in which the cured product of the composition exhibits anti-reflective function because of an uneven microstructure formed on the surface of the cured product, and provides a product having the uneven microstructure having high decontaminating properties such as fingerprint removal properties and high scratch resistance.Type: ApplicationFiled: June 27, 2014Publication date: October 23, 2014Applicant: Mitsubishi Rayon Co., Ltd.Inventors: Tsuyoshi Takihara, Eiko Okamoto, Go Otani, Yusuke Nakai