Abstract: A drawing apparatus includes: a plurality of charged particle optical systems arranged along a first direction; a storage configured to store drawing data shared by the plurality of charged particle optical systems with respect to each of sub-drawing regions obtained by dividing a drawing region on the substrate of each of the plurality of charged particle optical systems in the first direction; and a controller configured to determine a drawing region on the substrate by each of the plurality of charged particle optical systems as a set of the sub-drawing regions, and control each of the plurality of charged particle optical systems based on a corresponding set of the sub-drawing regions.

Abstract: The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, the apparatus comprising two blanker arrays each including a plurality of first blankers which blank a plurality of charged particle beams individually and a plurality of second blankers which blank a plurality of charged particle beams in common, wherein the plurality of first blankers and the plurality of second blankers in each of the two blanker arrays are arranged such that one of the plurality of charged particle beams passes through corresponding one of the plurality of first blankers of one of the two blanker arrays and corresponding one of the plurality of second blankers of the other of the two blanker arrays.

Abstract: The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, including an aperture array configured to include a plurality of apertures for shaping the respective charged particle beams, a deflection unit configured to include a plurality of first deflectors which are arranged on a side, with respect to the aperture array, of a charged particle source for radiating a charged particle beam and which deflect the respective charged particle beams, and to individually change irradiated positions of the respective charged particle beams on the aperture array by driving the respective first deflectors, and a controller configured to control deflection of the charged particle beams by the first deflectors to reduce a dispersion of intensities of the respective charged particle beams on the substrate.

Abstract: A lithography apparatus which performs writing on a substrate using a charged particle beam is provided. The apparatus comprises a plurality of column units each of which comprises a charged particle optical system, a plurality of stages each of which is movable while holding the substrate, and a controller. The controller moves the stages in synchronization with each other in a positional relationship corresponding to an arrangement of the column units, and performs writing on substrates held in the stages simultaneously.

Abstract: A drawing apparatus includes: a plurality of charged particle optical systems arranged along a first direction; a storage configured to store drawing data shared by the plurality of charged particle optical systems with respect to each of sub-drawing regions obtained by dividing a drawing region on the substrate of each of the plurality of charged particle optical systems in the first direction; and a controller configured to determine a drawing region on the substrate by each of the plurality of charged particle optical systems as a set of the sub-drawing regions and control each of the plurality of charged particle optical systems based on a corresponding set of the sub-drawing regions.

Abstract: A charged particle beam irradiation apparatus, which irradiates a substrate with a charged particle beam, includes a capacitance sensor and an optical sensor configured to measure a surface position of the substrate, a storage unit configured to store respective measurement values of the surface position of the substrate measured by the optical sensor and the capacitance sensor, and a calculation unit configured to obtain surface position data of the substrate, in which the calculation unit obtains a correction amount by using respective measurement values of the surface position measured by the capacitance sensor and the optical sensor in a region within a scribe line formed on the substrate, which are stored in the stored unit, and applies the correction amount to the measurement value of the surface position measured by the capacitance sensor, to obtain the surface position data of the substrate.

Abstract: An apparatus includes an optical system configured to irradiate a surface of a substrate with a beam, a control unit configured to control a position of the irradiation of the beam, and a first measurement unit and a second measurement unit each configured to measure a position of a mark formed on the substrate. The second measurement unit is placed at a position closer to an optical axis of the optical system than the first measurement unit is. Based on a position measurement value measured by the first measurement unit and position measurement values measured at different timings by the second measurement unit, the control unit controls the position of the beam irradiated to the substrate. The position measurement values measured at the different timings are values obtained from the same mark or values obtained from two marks adjacent to a common shot area.

Abstract: The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, including an aperture array configured to include a plurality of apertures for shaping the respective charged particle beams, a deflection unit configured to include a plurality of first deflectors which are arranged on a side, with respect to the aperture array, of a charged particle source for radiating a charged particle beam and which deflect the respective charged particle beams, and to individually change irradiated positions of the respective charged particle beams on the aperture array by driving the respective first deflectors, and a controller configured to control deflection of the charged particle beams by the first deflectors to reduce a dispersion of intensities of the respective charged particle beams on the substrate.

Abstract: The present invention provides a transmission apparatus for transmitting a light signal between an outside and an inside of a vacuum chamber, comprising a plurality of first transmission lines configured to transmit a plurality of light signals outside the vacuum chamber, a plurality of second transmission lines configured to transmit the plurality of light signals inside the vacuum chamber, and a light-transmissive member configured to transmit the light signals between the plurality of first transmission lines and the plurality of second transmission lines, wherein the light-transmissive member has a structure formed to isolate light paths of the plurality of light signals between the plurality of first transmission lines and the plurality of second transmission lines from each other.

Abstract: A scanning exposure apparatus which transfers, onto a substrate, a pattern on a reticle illuminated with pulse light whose light intensity distribution has an isosceles trapezoidal shape along a scanning direction of the substrate comprises a controller configured to obtain a relationship between a number of pulses received by the substrate while the substrate moves by a unit amount in the scanning direction and unevenness of exposure on the substrate which changes in accordance with the number of pulses received and the shape of the light intensity distribution.

Abstract: An exposure apparatus which exposes a substrate to pulsed light supplied from a light source, includes an input device, and a controller configured to periodically change a wavelength of the pulsed light emitted by the light source, wherein the controller is configured to calculate number of pulsed light required to expose each point on the substrate based on a parameter input from the input device, and configured to determine a changing period of the wavelength based on the calculated number.

Abstract: An exposure apparatus comprises a light source, a measuring instrument, a processor, and a controller, wherein the processor is configured to obtain a synthetic spectrum by synthesizing a spectrum of a first pulsed light and a spectrum of a second pulsed light, to obtain a central wavelength and light intensity of each of a plurality of spectrum elements included in the synthetic spectrum, and to calculate a central wavelength of the accumulated light based on the obtained central wavelength and light intensity of each of the plurality of spectrum elements, and the controller is configured to determine, based on the calculated central wavelength of the accumulated light, whether the substrate should be exposed to light.

Abstract: An exposure apparatus which exposes a substrate to pulsed light supplied from a light source, comprises an input device, and a controller configured to periodically change a wavelength of the pulsed light emitted by the light source, wherein the controller is configured to calculate number of pulsed light required to expose one shot region on the substrate based on a parameter input from the input device, and configured to determine a changing period of the wavelength based on the calculated number.