Patents by Inventor Goetz Teschner
Goetz Teschner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9117637Abstract: A method is provided for coating a substrate with the aid of a magnetron cathode and two electrodes which are alternately impinged upon by a positive potential and a negative potential. Also disclosed is an assembly for coating a substrate, comprising a vacuum chamber, a magnetron cathode, two electrodes, and a voltage source. A negative potential is generated at a level that is no greater than the level of the cathode potential, thus preventing the electrode that is to be cleaned from being stripped to a greater extent than the same was coated in the previous half-wave. The magnetron cathode and the electrodes are connected to the voltage source via switching elements without being galvanically such that a negative and a positive voltage generated from the voltage source can be alternatively applied to the electrodes, the level of said voltage being no greater than the cathode voltage.Type: GrantFiled: November 6, 2006Date of Patent: August 25, 2015Assignee: VON ARDENNE GmbHInventors: Goetz Teschner, Falk Milde, Enno Mirring, Frank Meissner, Goetz Grosser
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Patent number: 8980072Abstract: In a method in which two anodes are operated alternately opposite each other as plasma discharge anodes and as cathodes for self-cleaning, and the cathodes of the plasma discharge are recurrently briefly reversed in polarity, and an arrangement comprising a cathode and a first and a second anode supplied with voltage by an H-bridge circuit, pole reversal of cathode voltage is effected by a pulse current supply, at least one anode is maintained at positive potential at all times and the other anode intermittently at negative potential during an etching time, and the H-bridge circuit is operationally connected to the pulse current supply, such that at least one anode is at positive potential at all times.Type: GrantFiled: September 25, 2008Date of Patent: March 17, 2015Assignee: VON ARDENNE Anlagentechnik GmbHInventors: Goetz Teschner, Enno Mirring, Johannes Struempfel, Andreas Heisig
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Patent number: 8828199Abstract: A support device for a magnetron arrangement with a rotating target includes a housing with a drive shaft mounted to rotate in the housing. An end of the drive shaft accessible from outside of the housing connects to the rotating target and another end lies within the housing for introduction of a torque. An electric motor with a stator and a rotor is arranged within the housing to generate a torque.Type: GrantFiled: November 30, 2010Date of Patent: September 9, 2014Assignee: VON ARDENNE Anlagentechnik GmbHInventors: Goetz Teschner, Hans-Jürgen Heinrich, Harald Grune, Sven Haehne
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Patent number: 8337681Abstract: To achieve an improved end block, in which heating by induction eddy currents, which may occur during AC sputtering, for example, is significantly reduced relative to known end blocks, an end block for a magnetron configuration having a rotating target comprises an end block housing having an attachment surface for attaching the end block on a support apparatus, a pivot bearing for rotatable mounting of the rotating target, and at least one current conduction apparatus which conducts current through the end block housing in operation of the end block. The end block housing is implemented so that each current path in the end block housing which encloses the current conduction apparatus has an interruption at least one point.Type: GrantFiled: November 18, 2009Date of Patent: December 25, 2012Assignee: Von Ardenne Anlagentechnik GMGHInventors: Hans-Juergen Heinrich, Ulf Seyfert, Goetz Teschner
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Publication number: 20110180390Abstract: A method is provided for coating a substrate with the aid of a magnetron cathode and two electrodes which are alternately impinged upon by a positive potential and a negative potential. Also disclosed is an assembly for coating a substrate, comprising a vacuum chamber, a magnetron cathode, two electrodes, and a voltage source. A negative potential is generated at a level that is no greater than the level of the cathode potential, thus preventing the electrode that is to be cleaned from being stripped to a greater extent than the same was coated in the previous half-wave. The magnetron cathode and the electrodes are connected to the voltage source via switching elements without being galvanically such that a negative and a positive voltage generated from the voltage source can be alternatively applied to the electrodes, the level of said voltage being no greater than the cathode voltage.Type: ApplicationFiled: April 5, 2011Publication date: July 28, 2011Applicant: VON ARDENNE ANLAGENTECHNIK GMBHInventors: Goetz TESCHNER, Falk MILDE, Enno MIRRING, Frank MEISSNER, Goetz GROSSER
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Publication number: 20110147209Abstract: A support device for a magnetron arrangement with a rotating target includes a housing with a drive shaft mounted to rotate in the housing. An end of the drive shaft accessible from outside of the housing connects to the rotating target and another end lies within the housing for introduction of a torque. An electric motor with a stator and a rotor is arranged within the housing to generate a torque.Type: ApplicationFiled: November 30, 2010Publication date: June 23, 2011Applicant: VON ARDENNE ANLAGENTECHNIK GMBHInventors: Goetz TESCHNER, Hans-Jürgen HEINRICH, Harald GRUNE, Sven HAEHNE
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Patent number: 7938943Abstract: A supply end block to supply a sputter cathode with a coolant and electrical voltage, includes a housing with a coolant connection and a current connection as well as a support shaft mounted to rotate, on which a target tube is fastened. The coolant connection and current connection are brought together directly at a feed site so that the coolant is brought to the potential of the applied electric voltage on entering the housing of the end block. Optimal cooling of the current feed is achieved, and optimal potential equalization of the coolant simultaneously occurs.Type: GrantFiled: October 17, 2007Date of Patent: May 10, 2011Assignee: Von Ardenne Anlagentechnic GmbHInventors: Hans-Juergen Heinrich, Goetz Teschner, Thorsten Sander, Cornell Weidelt, Joern Brueckner
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Publication number: 20100230275Abstract: In a method in which two anodes are operated alternately opposite each other as plasma discharge anodes and as cathodes for self-cleaning, and the cathodes of the plasma discharge are recurrently briefly reversed in polarity, and an arrangement comprising a cathode and a first and a second anode supplied with voltage by an H-bridge circuit, pole reversal of cathode voltage is effected by a pulse current supply, at least one anode is maintained at positive potential at all times and the other anode intermittently at negative potential during an etching time, and the H-bridge circuit is operationally connected to the pulse current supply, such that at least one anode is at positive potential at all times.Type: ApplicationFiled: September 25, 2008Publication date: September 16, 2010Applicant: VON ARDENNE ANLAGENTECHNIK GMBHInventors: Goetz Teschner, Enno Mirring, Johannes Struempfel, Andreas Heisig
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Publication number: 20100126855Abstract: To achieve an improved end block, in which heating by induction eddy currents, which may occur during AC sputtering, for example, is significantly reduced relative to known end blocks, an end block for a magnetron configuration having a rotating target comprises an end block housing having an attachment surface for attaching the end block on a support apparatus, a pivot bearing for rotatable mounting of the rotating target, and at least one current conduction apparatus which conducts current through the end block housing in operation of the end block. The end block housing is implemented so that each current path in the end block housing which encloses the current conduction apparatus has an interruption at at least one point.Type: ApplicationFiled: November 18, 2009Publication date: May 27, 2010Applicant: VON ARDENNE ANLAGENTECHNIK GMBHInventors: Hans-Juergen HEINRICH, Ulf SEYFERT, Goetz TESCHNER
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Publication number: 20080308410Abstract: A method is provided for coating a substrate with the aid of a magnetron cathode and two electrodes which are alternately impinged upon by a positive potential and a negative potential. Also disclosed is an assembly for coating a substrate, comprising a vacuum chamber, a magnetron cathode, two electrodes, and a voltage source. A negative potential is generated at a level that is no greater than the level of the cathode potential, thus preventing the electrode that is to be cleaned from being stripped to a greater extent than the same was coated in the previous half-wave. The magnetron cathode and the electrodes are connected to the voltage source via switching elements without being galvanically such that a negative and a positive voltage generated from the voltage source can be alternatively applied to the electrodes, the level of said voltage being no greater than the cathode voltage.Type: ApplicationFiled: November 6, 2006Publication date: December 18, 2008Applicant: Von Ardenne Anlagentechnik GmbHInventors: Goetz Teschner, Falk Milde, Enno Mirring, Frank Meissner, Goetz Grosser
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Publication number: 20080128276Abstract: A supply end block to supply a sputter cathode with a coolant and electrical voltage, includes a housing with a coolant connection and a current connection as well as a support shaft mounted to rotate, on which a target tube is fastened. The coolant connection and current connection are brought together directly at a feed site so that the coolant is brought to the potential of the applied electric voltage on entering the housing of the end block. Optimal cooling of the current feed is achieved, and optimal potential equalization of the coolant simultaneously occurs.Type: ApplicationFiled: October 17, 2007Publication date: June 5, 2008Applicant: VON ARDENNE Anlagentechnik GmbHInventors: Hans-Juergen Heinrich, Goetz Teschner, Thorsten Sander, Cornell Weidelt, Joern Brueckner
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Publication number: 20070235328Abstract: A high power supply device for a vacuum coating system with at least one magnetron disposed in a coating chamber comprises a line adapter for a DC power supply for converting a line voltage into a DC voltage, a line connection for supplying the line voltage, and a medium-frequency generator supplied by the DC power supply for providing a medium-frequency voltage with at least one load connection for supplying the magnetron with the medium-frequency voltage. The line adapter for the DC power supply in the medium-frequency generator are disposed in a common housing. Dimensions in the housing are adapted to dimensions of the coating chamber and the high frequency supply device is adapted to be mechanically and electrically connected to a magnetron by a connection which is direct and can be undone.Type: ApplicationFiled: March 22, 2007Publication date: October 11, 2007Applicant: VON ARDENNE ANLAGENTECHNIK GMBHInventors: Goetz TESCHNER, Goetz GROSSER, Wolfgang FRIEDEMANN, Dietmar SCHULZE
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Publication number: 20070193719Abstract: A coolable carrier plate for targets in vacuum atomization systems has a connection surface and at least one fastening support for connecting the carrier plate to a component provided for this purpose, at least one sealant for sealing the connection surface, at least one cavity for conveying a coolant with a coolant inlet and a coolant outlet, and a supporting surface for supporting a target. The cavity is formed by a coolant channel or network of coolant channels that runs inside the carrier plate.Type: ApplicationFiled: February 20, 2007Publication date: August 23, 2007Applicant: VON ARDENNE Anlagentechnik GmbHInventors: Michael Huhn, Carsten Deus, Goetz Teschner, Erwin Zschieschang
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Patent number: 6743341Abstract: A process gas source (16) is connected to the vacuum chamber (5), and a metering valve (12) actuated by an automatic controller is installed between the vacuum chamber (5) and the process gas source (16). A potentiometric measurement electrode compares the amount of a gas in the vacuum chamber (5) with a reference gas by way of a reference electrode or with a solid body substituting for the reference electrode and sends a signal to automatic control unit (14), which contains a signal amplifier. The control unit then drives the generator of the power supply or the metering valve for the process gas.Type: GrantFiled: April 22, 2002Date of Patent: June 1, 2004Assignee: Unaxis Deutschland Holding GmbHInventors: Joachim Szczyrbowski, Götz Teschner, Jürgen Bruch
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Patent number: 6511584Abstract: A sputtering electrode is switched between two power values at a constant reactive gas flow rate which is selected so that the target of the sputtering electrode is in the metallic mode at the first power value while in the oxide mode at a second power value.Type: GrantFiled: March 7, 1997Date of Patent: January 28, 2003Assignee: Unaxis Deutschland Holding GmbHInventors: Joachim Szczyrbowski, Götz Teschner, Anton Zmelty, Jürgen Bruch, Dietmar Marquardt
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Patent number: 6241824Abstract: In an apparatus for the coating of substrates in a vacuum with rotatable substrate carriers (15,16,20) and with a loading and an unloading station (8 or 9), two vacuum chambers (3,4) are provided with several coating stations (6,7 or 10 to 14), directly next to one another, wherein a rotatable transport arm (15 or 16) is accommodated in each of the two chambers (3, 4), and the transport planes of the two transport arms (15,16) are aligned with one another. In the separation area of the two chambers (3,4), an air lock is provided with a corresponding transfer apparatus (5) with two transport arms (15,16), whose rotary plate (20) is provided with substrate storage unit (21,22) and projects about halfway into one chamber (3) and halfway into the other chamber (4), wherein one chamber (3) has both the loading as well as the unloading station (8 or 9).Type: GrantFiled: August 4, 1999Date of Patent: June 5, 2001Assignee: Leybold Systems GmbHInventors: Günter Bräuer, Hermann Kloberdanz, Hans-Georg Lotz, Jochen Schneider, Alfons Zöller, Harro Hagedorn, Michael König, Jürgen Meinel, Götz Teschner
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Patent number: 6168698Abstract: Power supply lines (41, 42) connect poles of an alternating current power source (43) to respective cathodes (58, 59) in compartments (32, 39), included among a plurality of adjacent compartments (32-39′), which together form a vacuum chamber (31) and which are connected to each other by a passageway (60). The two compartments (32, 39) with the cathodes (58, 59) are separated from each other by intermediate compartments (32′-38′), at least some of which are equipped with additional sputter cathodes (61-66).Type: GrantFiled: October 22, 1996Date of Patent: January 2, 2001Assignee: Balzers und Leybold Deutschland Holding AGInventors: Joachim Szczyrbowski, Götz Teschner, Anton Zmelty
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Patent number: 5415757Abstract: Method and an apparatus for coating a substrate from electrically conductive targets (3, 4) in a reactive atmosphere, comprising a power source (12, 13, 14) which is connected to cathodes (1, 2) disposed in an evacuable coating chamber (15) and cooperating electrically with the targets (3, 4), two anodes (5, 6) electrically separated from one another and from the sputtering chamber (15) being provided, which lie in a plane between the cathodes (1, 2) and the substrate (7), the two output terminals (12a, 12b) of the secondary winding of a transformer (12) connected, with interposition of a choke coil (14), to a medium frequency generator (13) being connected each to a cathode (1 and 2, respectively) via two supply lines (20, 21) and the two supply lines (20, 21) being connected via a branch line (22) into which a resonant circuit is inserted, and each of the two supply lines (20, 21) being coupled both via a first network (16 and 17, respectively) to the coating chamber and via a corresponding second network (Type: GrantFiled: December 1, 1993Date of Patent: May 16, 1995Assignee: Leybold AktiengesellschaftInventors: Joachim Szcyrbowski, Goetz Teschner, Guenter Braeuer
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Patent number: 5286360Abstract: In a method and an apparatus for coating a substrate (26) with electrically nonconductive coatings from an electrically conductive target (25) in a reactive (e.g.Type: GrantFiled: July 7, 1992Date of Patent: February 15, 1994Assignee: Leybold AktiengesellschaftInventors: Joachim Szczyrbowski, Goetz Teschner, Siegfried Beisswenger