Abstract: Methods and apparatus for fast and efficient verify recovery and array discharge for 3D NAND memory arrays and other 3D storage devices. The 3D storage device includes storage arrays including strings of memory cells stacked on top of one another and sharing a channel in a pillar for the string. The memory cells for a string occupy respective tiers in a 3D structure with each tier having an associated wordline. A controller is used to program charge levels in the memory cells. Programming is followed by a fast verify recovery where a voltage is applied to the wordlines to perform a program verify, followed by discharging wordlines. Erased wordlines are identified and discharged first, followed by programmed wordlines, which may employ staggered discharge sequences. Dummy wordlines are then discharged, with an optional timer delay. For multi-deck devices, wordlines in the deck with an active wordline are discharged before wordlines in one or more other decks.

Abstract: The gap width in a threshold voltage (Vt) distribution for a 3D NAND Flash cell is improved by performing touchup program on a selected portion of the word lines in a block after all of the word lines in the block have been programmed.

Abstract: A memory device comprising a memory array; and controller circuitry to apply a first pass voltage to a first plurality of unselected wordlines of the memory array during a string current sensing phase; and reduce the first pass voltage applied to the first plurality of unselected wordlines during a multistrobe sensing phase that follows the string current sensing phase.

Abstract: A memory device comprising a memory array; and controller circuitry to apply a first pass voltage to a first plurality of unselected wordlines of the memory array during a string current sensing phase; and reduce the first pass voltage applied to the first plurality of unselected wordlines during a multistrobe sensing phase that follows the string current sensing phase.

Abstract: Methods of depositing thin films of hafnium oxide possessing strong ferroelectric properties are described. A hafnium oxide monolayer is formed in a first process cycle comprising sequential exposure of a substrate to a hafnium precursor, purge gas, first oxidant and purge gas. A doped hafnium oxide monolayer is formed in a second process cycle comprising sequential exposure of the substrate to a hafnium precursor, purge gas, dopant precursor, purge gas, second oxidant and purge gas. Thin films of hafnium oxide are also described.